A chemically amplified resist composition is provided comprising (A) a polymer P comprising repeat units having an acid labile group containing a fluorinated aromatic ring, repeat units having a phenolic hydroxy group, and repeat units adapted to generate an acid upon exposure, (B) an onium salt type quencher, and (C) a solvent. The resist composition exhibits a high sensitivity, low LWR and improved CDU when processed by photolithography.

A chemically amplified resist composition is provided comprising (A) a polymer P comprising repeat units having an acid labile group containing a fluorinated aromatic ring, repeat units having a phenolic hydroxy group, and repeat units adapted to generate an acid upon exposure, (B) an onium salt type quencher, and (C) a solvent. The resist composition exhibits a high sensitivity, low LWR and improved CDU when processed by photolithography.

IR-sensitive lithographic printing plate precursors provide a stable print-out image using a unique IR radiation-sensitive composition in an infrared radiation-sensitive image-recording layer. This IR radiation-sensitive composition includes: (1) a free radical initiator composition that comprises an electron-donating agent; (2) a free radically polymerizable composition; and (3) a color-changing compound that is represented by the Structure (I) having an indene ring in the conjugated chain between the aromatic terminal groups. The compound can also have a —C(═O)—OR.sup.7, —SO.sub.2—R.sup.3, or —SO.sub.2NR.sup.8R.sup.9 group wherein R.sup.7 represents a substituted or unsubstituted alkyl group having a secondary or tertiary connecting carbon that connects to the rest of the —C(═O)—OR.sup.7 group; and R.sup.8, R.sup.9, and R.sup.10 independently represent substituted or unsubstituted alkyl, aryl, or heteroaryl groups. After IR imaging, these precursors exhibit desirable printout images both fresh and after dark storage. The precursors can be developed off-press or on-press.

IR-sensitive lithographic printing plate precursors provide a stable print-out image using a unique IR radiation-sensitive composition in an infrared radiation-sensitive image-recording layer. This IR radiation-sensitive composition includes: (1) a free radical initiator composition that comprises an electron-donating agent; (2) a free radically polymerizable composition; and (3) a color-changing compound that is represented by the Structure (I) having an indene ring in the conjugated chain between the aromatic terminal groups. The compound can also have a —C(═O)—OR.sup.7, —SO.sub.2—R.sup.3, or —SO.sub.2NR.sup.8R.sup.9 group wherein R.sup.7 represents a substituted or unsubstituted alkyl group having a secondary or tertiary connecting carbon that connects to the rest of the —C(═O)—OR.sup.7 group; and R.sup.8, R.sup.9, and R.sup.10 independently represent substituted or unsubstituted alkyl, aryl, or heteroaryl groups. After IR imaging, these precursors exhibit desirable printout images both fresh and after dark storage. The precursors can be developed off-press or on-press.

The present invention relates to a new photo-initiating composition for red and near infrared-induced photopolymerization, method of using same in photopolymerization reactions and polymers obtained by such method.

A lithographic printing plate precursor is disclosed including a coating comprising a polymerisable compound, an infrared absorbing dye, a photoinitiator including a trihaloalkyl group and a borate compound.

A negative resist composition is provided comprising a base polymer, a quencher in the form of a sulfonium salt of a weaker acid than a sulfonic acid which is fluorinated at α- and/or β-position of the sulfo group, the sulfonium salt having at least two polymerizable double bonds in the molecule, and an acid generator capable of generating a sulfonic acid which is fluorinated at α- and/or β-position of the sulfo group. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.

A negative resist composition is provided comprising a base polymer, a quencher in the form of a sulfonium salt of a weaker acid than a sulfonic acid which is fluorinated at α- and/or β-position of the sulfo group, the sulfonium salt having at least two polymerizable double bonds in the molecule, and an acid generator capable of generating a sulfonic acid which is fluorinated at α- and/or β-position of the sulfo group. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.

A negative resist composition is provided comprising a base polymer and an acid generator in the form of a sulfonium salt consisting of a sulfonate anion having a maleimide group and a cation having a polymerizable double bond. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.

A negative resist composition is provided comprising a base polymer and an acid generator in the form of a sulfonium salt consisting of a sulfonate anion having a maleimide group and a cation having a polymerizable double bond. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.