The present invention is a substrate for a display, the substrate having a film B including a polysiloxane resin on at least one surface of a film A including a polyimide resin, wherein the film B contains inorganic oxide particles therein, and the present invention has an object to provide a substrate for a display: being able to be applied to a color filter, an organic EL element, or the like without the need to carry out any complex operations; allowing high-definition displays to be manufactured; and being provided with a low CTE, a low birefringence, and flexibility.

A resist underlayer composition and a method of forming patterns, the composition including a polymer including at least one of a first moiety represented by Chemical Formula 1-1 and a second moiety represented by Chemical Formula 1-2; a thermal acid generator including a salt composed of an anion of an acid and a cation of a base, the base having pKa of greater than or equal to about 7; and a solvent, ##STR00001##

Techniques for making fluid flow devices are described. The technique is based on radiation-induced conversion of a radiation-sensitive substance from a first state to a second state. With adjustment of the radiation parameters such as power and scan speed we can control the depths of barriers that are formed within a substrate which can produce 3D flow paths. We have used this depth-variable patterning protocol for stacking and sealing of multilayer substrates, for assembly of backing layers for two-dimensional (2D) lateral flow devices and for fabrication of 3D devices. Since the 3D flow paths can be formed via a single laser-writing process by controlling the patterning parameters, this is a distinct improvement over other methods that require multiple complicated and repetitive assembly procedures.

The present disclosure relates to a manufacturing method of a quantum dot layer, a quantum dot color filter, a color filter substrate, a display panel, and a display device. The manufacturing method includes: performing lyophobic treatment on a first specified region of a first transparent layer, the first transparent layer including regions corresponding to a plurality of pixel regions, each pixel region of the plurality of pixel regions comprising a first subpixel region and a region other than the first subpixel region, the first specified region corresponding to the region other than the first subpixel region; and preparing a lyophilic first quantum dot solution on the first transparent layer to form a first quantum dot sublayer in a region that corresponds to the first subpixel region and is not subjected to the lyophobic.

A photosensitive resin constituent for a flexographic printing plate includes at least a support, a photosensitive resin composition layer, and a particle layer. The photosensitive resin composition layer contains a photosensitive resin composition containing a binder, a monomer, and a polymerization initiator. The particle layer contains a resin composition containing a binder having a crosslinkable group and a particle having a pore structure, and the particle having a pore structure has an average particle size of 1 m or more and 10 m or less, and a specific surface area of 350 m.sup.2/g or more and 1000 m.sup.2/g or less.

A resin composition including a polysiloxane (A) and a solvent (B), wherein the polysiloxane (A) contains at least one partial structure represented by any of the general formulae (1) to (3), and the relationship between the film thickness X and the film thickness Y, which respectively represent the thickness of a film produced by application of the resin composition and subsequent drying at 100 C. for 3 minutes and the thickness of the film after subsequent heating at 230 C. for 5 minutes, satisfies the following inequation: (XY)/x0.05. The resin composition exhibits excellent coating properties on rugged surface and has excellent planarization properties even if the resin composition is in a form of thin film.

##STR00001##

(R.sup.1 represents a single bond or a C.sub.1-4 alkyl group; R.sup.2 represents a C.sub.1-4 alkyl group; and R.sup.3 represents an organic group.)

In a transfer film including a temporary support having a thickness of 38 m or less; and a curable transparent resin layer disposed on the temporary support in a direct-contact manner, in which a thickness of the curable transparent resin layer is 5 m or more, the curable transparent resin layer includes a binder polymer, a polymerizable compound, and a polymerization initiator, and a melt viscosity c of the curable transparent resin layer measured at 100 C. is 1.010.sup.3 Pa.Math.s or more, the temporary support and the curable transparent resin layer are in direct contact with each other, and it is possible to prevent the incorporation of air bubbles during lamination on base materials having an elevation difference; a method for manufacturing a laminate; a laminate; an electrostatic capacitance-type input device; and an image display device.

A photosensitive resin printing plate precursor includes at least a substrate and a photosensitive resin layer, the photosensitive resin layer containing: (A) a partially saponified polyvinyl acetate, (B) a polyamide having basic nitrogen, (C) a compound having an ethylenic double bond, and (D) a photopolymerization initiator; the photosensitive resin layer including at least an underlayer and a printing surface layer; the substrate, the underlayer, and the printing surface layer being included in this order; and the photosensitive resin layer containing, as the partially saponified polyvinyl acetate (A), those (A1) having an average polymerization degree of 1,200 to 2,600 in the printing surface layer and those (A2) having an average polymerization degree of 400 to 800 in the underlayer.

A three-dimensional (3D) structure for handling fluids, a fluid handling device containing the 3D structure, and a method of making the 3D structure. The method includes providing a composite photoresist material that includes: (a) a first photoresist layer derived from a photoresist resin having a first chemical property selected from the group consisting of epoxide equivalent weight, aromatic content, and crosslink density and (b) at least a second photoresist layer derived from a photoresist resin having a second chemical property selected from the group consisting of epoxide equivalent weight, aromatic content, and crosslink density different from the first chemical property. The composite photoresist material is devoid of an adhesion promotion layer between layers of the composite photoresist material and the composite photoresist material has varying mechanical and/or physical properties through a thickness of the 3D structure.

A transfer film includes a temporary support, a first transparent resin layer, and a second transparent resin layer in this order, the second transparent resin layer includes metal oxide particles and an organic component, and, in a case in which an area of a profile of a thickness-direction distribution of a ratio of metal atoms constituting the metal oxide particles to carbon atoms constituting the organic component in the second transparent resin layer is represented by A, and a peak height of the profile is represented by P, Expression (1) is satisfied.

0.01 (nm).sup.1P/A0.08 (nm).sup.1 Expression (1)