A gate driver on array (GOA) array substrate, a method for fabricating the same, and a display device including the same, which include a GOA driving circuit. The GOA driving circuit includes a plurality of GOA units. Each of the GOA units includes a thin film transistor array layer, a first metal layer, an insulating layer, and a second metal layer. The first metal layer has a patterned signal line at a position crossing the second metal layer. The signal line includes a trunk portion and side walls formed of two opposite sides of the trunk portion. The side walls are shaped as arc-shaped grooves.

There is provided an array substrate, a manufacturing method therefor, a display panel, and a display device. The array substrate includes: a base substrate, and a gate metal pattern, a gate insulating layer and a source-drain metal pattern which are sequentially disposed on the base substrate. The gate metal pattern includes a signal line and a gate electrode, the signal line is in the peripheral area, the gate insulating layer is provided with a first via hole penetrating the gate insulating layer, the orthogonal projection of the first via hole on the base substrate and the orthogonal projection of the signal line on the base substrate have an overlapping area, the source-drain metal pattern includes a source-drain electrode wire, and the source-drain electrode wire is electrically connected to the signal line through the first via hole. The present disclosure achieves the function of protecting the signal line.

A semiconductor device with high aperture ratio is provided. The semiconductor device includes a transistor and a capacitor having a pair of electrodes. An oxide semiconductor layer formed over the same insulating surface is used for a channel formation region of the transistor and one of the electrodes of the capacitor. The other electrode of the capacitor is a transparent conductive film. One electrode of the capacitor is electrically connected to a wiring formed over the insulating surface over which a source electrode or a drain electrode of the transistor is provided, and the other electrode of the capacitor is electrically connected to one of the source electrode and the drain electrode of the transistor.

The present application discloses a display panel preparation method and a display panel. The display panel preparation method includes: forming a first metal layer, a buffer layer, an oxide film layer, and a gate insulating layer on a substrate; and etching on a second layer of metal by using a same mask process, to obtain a gate layer, a source layer, and a drain layer.

A display device can include a pixel driver disposed on a substrate; and a display element electrically connected with the pixel driver, in which the pixel driver includes a first thin film including a first semiconductor layer, a first gate electrode, at least a part of the first gate electrode overlapping with the first semiconductor layer, and a first source electrode and a first drain electrode respectively connected with the first semiconductor layer; and a second thin film including a second semiconductor layer, a second gate electrode, at least a part of the second gate electrode overlapping with the second semiconductor layer, and a second source electrode and a second drain electrode respectively connected with the second semiconductor layer, in which the first semiconductor layer and the second semiconductor layer are disposed in different layers, and the first source electrode, the first drain electrode, the second gate electrode, the second source electrode, and the second drain electrode are disposed in a same layer.

Discloses are a display panel, a method of manufacturing the same and a display device. The display panel includes: a first substrate; a second substrate disposed opposite to the first substrate; and a reflective structure group disposed on the first substrate, the reflective structure group includes a plurality of reflective structures in one-to-one correspondence with visual fields of view, and a reflective surface of each reflective structure of the reflective structures faces the second substrate, and the reflective structure is configured to reflect light from the second substrate in a predetermined direction to a corresponding field of view.

The present disclosure provides an array substrate and a manufacturing method of the array substrate. The method includes sequentially forming an active layer and an insulating layer on a substrate; forming a common electrode layer and a first metal layer on the insulating layer using a same photomask, wherein the common electrode layer includes touch electrodes; and forming a second metal layer on the pixel electrode layer, wherein the second metal layer includes touch signal lines, and the touch signal lines electrically are electrically connected to the touch electrodes.

The present application discloses a display panel preparation method and a display panel. The display panel preparation method includes: forming a first metal layer, a buffer layer, an oxide film layer, and a gate insulating layer on a substrate; and etching on a second layer of metal by using a same mask process, to obtain a gate layer, a source layer, and a drain layer.

Provided are a display panel and manufacturing method thereof, control method and display apparatus. The display panel includes a first substrate including first base substrate and driving structure layer, and a second substrate including second base substrate and black matrix layer, driving structure layer includes multiple switching transistors, the display panel includes multiple pixel units, each pixel unit includes a switching transistor. One side of black matrix layer close to first substrate is provided with multiple groove structures corresponding to multiple pixel units one-to-one. Orthographic projection of black matrix layer on first base substrate covers those of multiple switching transistors on first base substrate, and orthographic projection of the groove structure on first base substrate at least partially overlaps with that of a channel region of switching transistor in corresponding pixel unit on first base substrate to enable light meeting preset wavelength condition to be incident into the display panel.

The present disclosure provides an array substrate and a manufacturing method of the array substrate. The method includes sequentially forming an active layer and an insulating layer on a substrate; forming a common electrode layer and a first metal layer on the insulating layer using a same photomask, wherein the common electrode layer includes touch electrodes; and forming a second metal layer on the pixel electrode layer, wherein the second metal layer includes touch signal lines, and the touch signal lines electrically are electrically connected to the touch electrodes.