Systems and methods for highly reproducible and focused plasma jet printing and patterning of materials using appropriate ink containing aerosol through nozzles with narrow orifice and tubes with controlled dielectric constant connected to high voltage power supply, in the presence of electric field and plasma, that enables morphological and/or bulk chemical modification and/or surface chemical modification of the material in the aerosol and/or the substrate prior to printing, during printing and post printing.

An atmospheric pressure linear RF plasma source having an enclosure enclosing a chamber in the form of an extended slot having a width W, a length L, and a thickness T, with W≥20T, the enclosure having a top opening for receiving a flow of a working gas in the direction of the length L and a bottom opening for delivering a flow of plasma, with the bottom opening being open to atmospheric pressure. Then walls of the enclosure comprise a dielectric material. Two mutually opposing pancake coils are positioned on opposite sides of the enclosure and are capable of being driven by an RF power source in an opposing phase relationship. Alternatively, an elongated solenoid coil may surround the enclosure.

A plasma system is provided. The plasma system includes a low-temperature atmospheric-pressure plasma source and a water-mist supplying source. The low-temperature atmospheric-pressure plasma source has a nozzle. The nozzle is configured to eject a plasma. The water-mist supplying source is configured to deliver a water mist to the plasma ejected from the nozzle.

Provided is a plasma device for applying a cold atmospheric plasma to a surface to be treated, in particular on textiles, leather and/or plastic fibers. The plasma device includes a housing, a plasma source in the housing, and a voltage source in the housing for applying a voltage to the plasma source, wherein the plasma device is configured to enable activation of the plasma source and/Oor to selectively switch the plasma source on only if a distance between the plasma source and the surface to be treated is within a predetermined distance.

A water treatment device includes: an electrode structure installed in a storage space in which water is stored or in a flow space in which water flows so as to cause an underwater plasma discharge; and a gas supply module for supplying a gas to the storage space or the flow space such that bubbles are supplied underwater, as a discharge gas, to the electrode structure, wherein the electrode structure includes: a first electrode; a second electrode disposed opposite the first electrode; and a dielectric member disposed in a space between the first electrode and the second electrode.

The present invention relates to a medical device for generating a plasma-activated liquid, a system for generating plasma-activated liquids comprising said device, and a method for generating a plasma-activated liquid. It also relates to a method for prophylaxis and treatment of postoperative adhesions.

An electrode arrangement is described that is configured to be coupled to a high voltage source for a dielectric barrier discharge plasma treatment of an irregularly three-dimensionally shaped surface of an electrically conducting body. The three-dimensionally shaped surface is used as a counter electrode. A first planar electrode is coupled to the high voltage source via a first lead, fitted to the object to be treated and brought in contact with a dielectric. A second electrode is contacted with the surface to be treated as reference electrode. The second electrode is provided in an edge portion that is circumferential to the first planar electrode and configured to be coupled to a reference voltage source via a second lead. An isolating cover layer covers the electrode and a third electrode covers the isolating cover layer as a ground electrode.

The object of the present disclosure is to efficiently generate plasma. In the plasma device of the present disclosure, a dielectric barrier discharger and an arc discharger are included, but the arc discharger is provided downstream from the dielectric barrier discharger in a discharge space where a gas for generating plasma is supplied. Dielectric barrier discharge occurs at the dielectric barrier discharger, and arch discharge occurs at the arc discharger. As a result of the gas for generating plasma being activated in the dielectric barrier discharge, the aforementioned gas can be adequately converted to plasma in the arc discharger.

A submerged plasma generator includes: a reactor inside of which a flow path, through which a working fluid passes, is formed along a lengthwise direction; and a dielectric insert which is disposed in the flow path so as to define the flow path into one space and the other space, and has formed therein a through-hole to generate micro-nano bubbles by cavitation in the working fluid fed into the one space of the flow path, and includes, a metallic catalyst which undergoes friction with the working fluid flowing through the through-hole and releases electric charges of the same polarity to the micro-nano bubbles to collapse the micro-nano bubbles and generate plasma; in which the other space of the flow path in which the working fluid ionized by exposure to the plasma travels is formed in an oval structure.

Plasma applications are disclosed that operate with argon or helium at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species in the effluent stream. Laminar gas flow is developed prior to forming the plasma and at least one of the electrodes can be heated which enables operation at conditions where the argon or helium plasma would otherwise be unstable and either extinguish, or transition into an arc. The techniques can be employed to clean and activate a metal substrate, including removal of oxidation, thereby enhancing the bonding of at least one other material to the metal.