A display device includes a substrate, a first active pattern, a first gate electrode, a second active pattern, a second gate electrode, a first connecting pattern, and a second connecting pattern. The first connecting pattern is disposed on the second active pattern and is electrically connected to the first gate electrode, and the second connecting pattern is disposed on the first connecting pattern and is electrically connected to the first connecting pattern and the second active pattern.

A semiconductor-on-insulator (SOI) transistor includes a semiconductor layer situated over a buried oxide layer, the buried oxide layer being situated over a substrate. The SOI transistor is situated in the semiconductor layer and includes a transistor body, gate fingers, source regions, and drain regions. The transistor body has a first conductivity type. The source regions and the drain regions have a second conductivity type opposite to the first conductivity type. A heavily-doped body-implant region has the first conductivity type and overlaps at least one source region. A common silicided region electrically ties the heavily-doped body-implant region to the at least one source region. The common silicided region can include a source silicided region, and a body tie silicided region situated over the heavily-doped body-implant region. The source silicided region can be separated from a drain silicided region by the gate fingers.

A thin film transistor, an array substrate and a display device. The thin film transistor includes a gate electrode, a first electrode, and a second electrode on the base substrate. The gate electrode includes a first body portion and a first extension portion extending along the first direction, electrically connected with the first body portion, and spaced apart from the first body portion by a first spacing. The first electrode includes a first overlapping end, an orthographic projection of the first overlapping end on the base substrate at least partially overlaps with an orthographic projection of the first body portion on the base substrate; a first compensation end at a side of the first overlapping end away from the first body portion; and a first intermediate portion connecting the first overlapping end and the first compensation end.

A display substrate, a manufacturing method therefor and a pixel driving circuit, the display substrate includes: a base substrate; a first conductive layer, which includes a first signal line, a second signal line, and an additional pad layer, on the base substrate; a pixel defining layer on the first conductive layer and having an opening; and an electroluminescent material layer in the opening and including a first end portion and a second end portion, an orthographic projection of the first end portion on the base substrate falls within that of the first signal line, an orthographic projection of the second end portion on the base substrate falls within that of the additional pad layer, and the orthographic projections of the first end portion and the second end portion are respectively located on both sides of an orthographic projection of the second signal line on the base substrate.

An electrostatic discharge protection circuit, a display substrate and a display apparatus are disclosed. The electrostatic discharge protection circuit includes: a first conductive portion, having an end portion; and at least one electrostatic discharge portion, arranged on a same layer as the first conductive portion and spaced from the end portion of the first conductive portion, the at least one electrostatic discharge portion being configured to discharge electrostatic charges generated at the end portion of the first conductive portion.

An electronic circuit includes a first electronic component formed above a buried insulating layer of a substrate and a second electronic component formed under the buried insulating layer. The insulating layer is thoroughly crossed by a semiconductor well. The semiconductor well electrically couples a terminal of the first electronic component to a terminal of the second electronic component.

A transistor with small parasitic capacitance can be provided. A transistor with high frequency characteristics can be provided. A semiconductor device including the transistor can be provided. Provided is a transistor including an oxide semiconductor, a first conductor, a second conductor, a third conductor, a first insulator, and a second insulator. The first conductor has a first region where the first conductor overlaps with the oxide semiconductor with the first insulator positioned therebetween; a second region where the first conductor overlaps with the second conductor with the first and second insulators positioned therebetween; and a third region where the first conductor overlaps with the third conductor with the first and second insulators positioned therebetween. The oxide semiconductor including a fourth region where the oxide semiconductor is in contact with the second conductor; and a fifth region where the oxide semiconductor is in contact with the third conductor.

Provided herein are encoded microcarriers for analyte detection in multiplex assays. The microcarriers are encoded with an analog code for identification and include a capture agent for analyte detection. Also provided are methods of making the encoded microcarriers disclosed herein. Further provided are methods and kits for conducting a multiplex assay using the microcarriers described herein.

A pressure sensor element and a receiving circuit are formed on an IC chip. A transmitting circuit and a piezoelectric element of an actuator are respectively formed on a transmitting chip and a piezoelectric chip. The piezoelectric chip and the pressure sensor face each other separated by a distance in an airtight first space surrounded by a package main body and a base substrate. Dielectric breakdown voltage of signal transmission from the primary side to the secondary side is set by the distance. The first space is a pressure propagation region including an insulating medium capable of transmitting vibrations of the piezoelectric element as pressure. The signal transmission is performed with high insulation by the pressure generated in the pressure propagation region between components integrated in a single module by insulating the primary side and the secondary side from each other by the insulating medium of the pressure propagation region.

An active matrix substrate is provided with a plurality of oxide semiconductor TFTs including a plurality of first TFTs. An oxide semiconductor layer of each oxide semiconductor TFT includes a channel region, a source contact region, and a drain contact region. In a view from a normal direction of the substrate, the channel region is a region located between the source contact region and the drain contact region and overlapping a gate electrode, and the channel region includes a first end portion and a second end portion that oppose each other and extend in a first direction from the source contact region side toward the drain contact region side, a source side end portion that is located on the source contact region side of the first and second end portions and extends in a second direction that intersects the first direction, and a drain side end portion that is located on the drain contact region side of the first and second end portions and extends in the second direction. Each first TFT further includes a light blocking layer located between the oxide semiconductor layer and the substrate. In a view from the normal direction of the substrate, the light blocking layer includes an opening region that overlaps part of the channel region and a light blocking region that overlaps another part of the channel region. In a view from the normal direction of the substrate, the light blocking region includes a first light blocking portion that extends in the first direction over the first end portion of the channel region and a second light blocking portion that extends in the first direction over the second end portion of the channel region; each of the first light blocking portion and the second light blocking portion includes a first edge portion and a second edge portion that oppose each other and extend in the first direction; at least part of the first edge portion overlaps the channel region; and the second edge portion is located on an outer side of the channel region and does not overlap the channel region.