A high-frequency power supply device, which outputs high-frequency pulses to a target device on the basis of a synchronous pulse and a clock pulse, and the output control method therefor are such that a period reference signal is generated from output timing information pertaining to the synchronous pulse, an output level signal is generated from output level information, an output stop time is timed on the basis of the period reference signal and an output stop signal is generated, and, when the period reference signal, the output level signal, and the clock pulse are received and a high-frequency pulse is formed on the basis of these signals, transmission of the output level signal is stopped while the output stop signal is being received.

Disclosed is a plasma device which includes: a base including a power supply unit configured to receive electric power and form an AC signal, a gas flow rate adjustment unit configured to receive gas and control a flow rate of output gas, an input unit configured to receive an input of a user, and a controller configured to control the power supply unit and the gas flow rate adjustment unit according to the input; and a handpiece including a boosting transformer configured to boost the AC signal, an electrode structure configured to receive the boosted AC signal and the gas and form plasma, a switch configured to receive a plasma discharge signal of the user, and a nozzle configured to discharge the formed plasma, wherein the handpiece is connected to the base via a connector and is exchangeable.

A plasma generator that detects whether a connector of a head is electrically connected to a power cable. The plasma generator includes the head including the connector with a terminal to supply electricity to electrodes that generate plasma by electrical discharge, and a first terminal and a second terminal that are connected to each other; a power cable to supply electricity to the terminal; a cable to transmit a signal to the first terminal; a first ground cable to ground the second terminal; and a detector to detect a signal current that flows in a path from the cable to the first ground cable in accordance with transmission of the signal.

Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. The anode and cathode of a DC plasma chamber are respectively connected to an adjustable DC voltage source and a DC current source. The anode potential is adjusted to shift a surface floating potential of a stage in a positive column of the DC plasma to a reference ground potential of the DC voltage/current sources. A control loop can be activated throughout various processing steps to maintain the surface floating potential of the stage to the reference ground potential. A signal generator referenced to the ground potential is capacitively coupled to the stage to control a surface potential at the stage for provision of kinetic energy to free electrons in the DC plasma.

Provided are a high-frequency power supply device and an output control method therefor which are capable of constantly keeping the phase of the outputted high-frequency pulse uniform even in a structure in which the synchronizing pulse and the clock pulse are generated separately. A high-frequency power supply device and an output control method therefor for outputting a high-frequency pulse to a target device on the basis of a synchronizing pulse and a clock pulse, wherein: the period interval of one period of the synchronizing pulse is detected; the phase difference between the synchronizing pulse and the clock pulse during the previous one period is determined; the number of pulses and oscillation frequency of oscillation in the subsequent period is calculated on the basis of the period interval and the phase difference; a clock pulse is generated on the basis of the oscillation frequency signal; and a number of pulses and oscillation frequency for the subsequent period which will cancel the phase difference in the previous one period are determined in a manner such that the phase remains constant after the period interval of the subsequent period elapses when forming a high-frequency pulse on the basis of the period reference signal, the level setting signal, the pulse number signal and the clock pulse.

An over-voltage protection system for an accelerator can include: a plurality of DC power supplies configured to provide a plurality of voltage levels up to a desired voltage level; and an acceleration tube electrically connected to the plurality of DC power supplies and configured to accelerate a charged particle. The acceleration tube can include a plurality of stages. Each stage can include a plurality of electrodes and a plurality of varistors configured to discharge energy in response to an overvoltage event. One electrode of the plurality of electrodes can be electrically coupled to a voltage level of the plurality of voltage levels. The plurality of electrodes and the plurality of varistors can be electrically coupled to each other and arranged in an alternating fashion.

A plasma processing apparatus includes: a high voltage power supply for supplying a high voltage power to a magnetron; and a detector for detecting a microwave output from the magnetron, wherein based on a result of comparing a signal, which is obtained by adding an output from the detector to an AC component of a current detected from an output of the high voltage power supply, with a setting value of the output of the high voltage power supply, the output of the high voltage power supply is adjusted.

A power supply apparatus includes a controller that performs the following action. The controller determines a target direct-current electric amount value in accordance with an external input. Then, the controller performs feedback control in such a manner that an amount of direct-current electric power input to an inverter reaches the target direct-current electric amount value.

Aspects of the present disclosure involve a power supply circuit for powering a plasma reactor and more specifically initiating and maintain a plasma therein, and that can operate with power from an intermittent power source. The power supply may include an auxiliary-power supply or trigger circuit, in addition to a primary-power supply circuit, which can reduce the need for high-voltage equipment in the high-power section of the power supply. In one particular use, the power supply includes a high-voltage power output that may be used for generating a plasma between electrodes, for example, in a nitrogen-fixation plasma system. The power supply circuit may provide the flexibility to power a plasma reactor using an intermittent power source, such as solar, wind, and/or a periodic low-cost power grid, while reducing wasteful power conditioning, lowering the cost of operation, and increasing the efficiency of chemical production from the renewable energy.

Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. The anode and cathode of a DC plasma chamber are respectively connected to an adjustable DC voltage source and a DC current source. The anode potential is adjusted to shift a surface floating potential of a stage in a positive column of the DC plasma to a reference ground potential of the DC voltage/current sources. A conductive plate in a same region of the positive column opposite the stage is used to measure the surface floating potential of the stage. A signal generator referenced to the ground potential is capacitively coupled to the stage to control a surface potential at the stage for provision of kinetic energy to free electrons in the DC plasma.