A foldable display device includes a display panel including a front surface and a rear surface opposite the front surface, the front surface including a first component area including a first transmissive portion, a second component area including a second transmissive portion, and a main display area at least partially surrounding the first component area and the second component area, wherein, in a state in which the foldable display device is folded about a first folding axis that crosses the main display area such that two areas of the front surface or two areas of the rear surface face each other, the first component area and the second component area overlap each other on a plane.

A display device includes a substrate, a first active pattern, a first gate electrode, a second active pattern, a second gate electrode, a first connecting pattern, and a second connecting pattern. The first connecting pattern is disposed on the second active pattern and is electrically connected to the first gate electrode, and the second connecting pattern is disposed on the first connecting pattern and is electrically connected to the first connecting pattern and the second active pattern.

A display device includes pixels, scan lines, and data lines. A first driving gate electrode is disposed at a first pixel of the display device. A second driving gate electrode is disposed at a second pixel of the display device. A first driving voltage line includes a first extending part that overlaps a first driving gate electrode. A second driving voltage line includes a second extending part that overlaps a second driving gate electrode. A first pixel electrode of the first pixel overlaps the second driving gate electrode. The second extending part includes a first recess portion. A center line of the first recess portion is offset in a direction away from the first pixel electrode with respect to a center line of the second driving gate electrode.

An array substrate includes a substrate, a protection layer, and a photodiode. The protection layer is disposed over the substrate, has a single layer-structure, and is provided with a through-hole therein. The photodiode includes a lower electrode, a PN junction and an upper electrode, which are sequentially over the substrate. The PN junction is within the through-hole. The protection layer and the PN junction of the photodiode have a substantially same thickness. The array substrate further includes a thin-film transistor over the substrate. An orthographic projection of an active layer of the thin-film transistor on the substrate does not overlap with an orthographic projection of the PN junction of the photodiode on the substrate.

To provide a semiconductor device, a liquid crystal display device, and an electronic device which have a wide viewing angle and in which the number of manufacturing steps, the number of masks, and manufacturing cost are reduced compared with a conventional one. The liquid crystal display device includes a first electrode formed over an entire surface of one side of a substrate; a first insulating film formed over the first electrode; a thin film transistor formed over the first insulating film; a second insulating film formed over the thin film transistor; a second electrode formed over the second insulating film and having a plurality of openings; and a liquid crystal over the second electrode. The liquid crystal is controlled by an electric field between the first electrode and the second electrode.

A method of manufacturing, with high mass productivity, liquid crystal display devices having highly reliable thin film transistors with excellent electric characteristics is provided. In a liquid crystal display device having an inverted staggered thin film transistor, the inverted staggered thin film transistor is formed as follows: a gate insulating film is formed over a gate electrode; a microcrystalline semiconductor film which functions as a channel formation region is formed over the gate insulating film; a buffer layer is formed over the microcrystalline semiconductor film; a pair of source and drain regions are formed over the buffer layer; and a pair of source and drain electrodes are formed in contact with the source and drain regions so as to expose a part of the source and drain regions.

Embodiments of the invention provide an array substrate, a display device and a manufacturing method of the array substrate. The array substrate comprises a substrate (10) and a plurality of electrostatic discharge short-circuit rings (20) provided on the substrate. Each of the electrostatic discharge short-circuit rings (20) comprises a gate electrode (22), a gate insulating layer (26), an active layer (21), a source electrode (23), a drain electrode (24) and a passivation layer (30). Each of the electrostatic discharge short-circuit ring (20) further comprises a transparent conductive layer (25) for connecting the gate electrode (22) and the drain electrode (24), and the transparent conductive layer (25) is provided below the passivation layer (30).

A slicing micro-light emitting diode (LED) wafer includes a driver circuit substrate, a plurality of micro-LEDs formed on the driver circuit substrate, the plurality of micro-LEDs being made from a plurality of epitaxial layer slices arranged side-by-side on the driver circuit substrate, and a bonding layer, formed at bottoms of the plurality of epitaxial layer slices and on a top surface of the driver circuit substrate, for bonding the micro-LEDs and the driver circuit substrate.

Some embodiments of the present disclosure are directed to a device. The device includes a substrate comprising a silicon layer disposed over an insulating layer. The substrate includes a transistor device region and a radio-frequency (RF) region. An interconnect structure is disposed over the substrate and includes a plurality of metal layers disposed within a dielectric structure. A handle substrate is disposed over an upper surface of the interconnect structure. A trapping layer separates the interconnect structure and the handle substrate.

A method of forming a light emitting device includes forming a semiconductor light emitting diode, forming a metal layer stack including a first metal layer and a second metal layer on the light emitting diode, and oxidizing the metal layer stack to form transparent conductive layer including at least one conductive metal oxide.