H05H1/0037

PLASMA SOURCE CHAMBER FOR A SPECTROMETER

A plasma source chamber (10) for use in a spectrometer comprises an inner housing (11) for accommodating a plasma source (31) and an outer housing (12) accommodating the inner housing. The outer housing (12) comprises at least one outer air inlet opening (21) in a first wall and at least one outer air outlet opening (22) in a second wall. Walls of the inner housing and walls of the outer housing define a spacing (25) so as to allow a first air flow (1) from the at least one outer air inlet opening (21) to the at least one outer air outlet opening (22) through the spacing (25) between the inner housing and the outer housing. The inner housing (11) comprises at least one inner air inlet opening (23) in a first wall and at least one inner air outlet opening (24) in a second wall to allow a second air flow (2) from the at least one inner air inlet opening to the at least one inner air outlet opening through the inner housing. Thus, an improved cooling of the outer surfaces of the plasma source chamber is achieved.

SYSTEM AND METHOD FOR PUMPING LASER SUSTAINED PLASMA WITH AN ILLUMINATION SOURCE HAVING MODIFIED PUPIL POWER DISTRIBUTION

A system for generating pump illumination for laser sustained plasma (LSP) is disclosed. The system may include an illumination source configured to output a pump beam, one or more focusing optics, and one or more beam shapers configured to reshape the pump beam to provide a shaped pupil power distribution at an illumination pupil plane of the one or more focusing optics. The shaped pupil power distribution may include at least one of a flat-top distribution or an inverted distribution with a central local intensity minimum. Further, the one or more focusing optics may receive the pump beam from the one or more beam shapers and direct the pump beam to a plasma-forming material, whereby the pump beam at least one of forms or maintains a plasma that emits broadband illumination.

Electron capture dissociation (ECD) utilizing electron beam generated low energy electrons

Electron capture dissociation (ECD) is performed by transmitting an electron beam through a cell along an electron beam axis, generating plasma in the cell by energizing a gas with the electron beam, and transmitting an ion beam through the interaction region along an ion beam axis to produce fragment ions. Generating the plasma forms an interaction region in the cell spaced from and not intersecting the electron beam, and including low-energy electrons effective for ECD. The ion beam axis may be at an angle to and offset from the ion beam axis, such that the electron beam does not intersect the ion beam.

PROCESS CONTROL FOR ATMOSPHERIC PLASMA TREATMENT OF SURFACES
20210339034 · 2021-11-04 ·

Disclosed is a system and method for delivering reactive species from a plasma to a treatment area by scanning a linear array of stacked plasma elements across the treatment area. Reactive species output from each plasma element is calibrated, and during scanning each plasma element is modulated with a uniformity modulation and a dose modulation, enabling a predetermined contour dose distribution of reactive species to be delivered to the treatment area.

Probe for measuring plasma parameters

A probe for measuring plasma parameters by means of active plasma resonance spectroscopy comprises an external coupling, a balun, an internal coupling, and a probe head. It is provided that the couplings, the balun, and the probe head are integrated in an electrically-insulating substrate cylinder, and the substrate cylinder has a layered structure made from multiple substrate layers along its rotational axis. In this way, a probe for measuring plasma parameters is provided which enables an improved measurement of the plasma parameters, wherein the plasma is influenced as little as possible during the measurement of the plasma parameters.

Feedback detection for a treatment device

A system includes a focus optic configured to converge an electromagnetic radiation (EMR) beam to a focal region located along an optical axis. The system also includes a detector configured to detect a signal radiation emanating from a predetermined location along the optical axis. The system additionally includes a controller configured to adjust a parameter of the EMR beam based in part on the signal radiation detected by the detector. The system also includes a window located a predetermined depth away from the focal region, between the focal region and the focus optic along the optical axis, wherein the window is configured to make contact with a surface of a tissue.

GLOW PLASMA GAS MEASUREMENT SIGNAL PROCESSING
20210310956 · 2021-10-07 · ·

Provided are methods, apparatuses and systems for enhanced determination of the gas composition of a sample gas using glow discharge optical emission spectroscopy (GD-OES) for gas analysis. A first method comprises: generating one or more oscillating electromagnetic fields within a plasma cell to excite particles within the cell, to produce a glow discharge plasma in the plasma cell, and controlling the operating conditions for the plasma cell while flowing a gas mixture through the plasma cell to maintain glow discharge optical emissions from the plasma within a desired operating range; and monitoring one or more glow discharge optical emissions from the plasma in the plasma cell; wherein said monitoring of the optical emissions comprises measuring the optical emissions, or measuring a signal that correlates with the optical emissions, at twice the plasma excitation frequency; and processing the signal during each excitation cycle of the electromagnetic excitation, to determine the concentration of a gas within a gas mixture flowing through the plasma cell.

Air Leak Detection In Plasma Processing Apparatus With Separation Grid
20210307151 · 2021-09-30 ·

Plasma processing apparatus and associated methods for detecting air leak are provided. In one example implementation, the plasma processing apparatus can include a processing chamber to process a workpiece, a plasma chamber separated from the processing chamber by a separation grid, and an inductive coupling element to induce an oxygen plasma using a process gas in the plasma chamber. The plasma processing apparatus can detect afterglow emission strength from reaction between nitric oxide (NO) and oxygen radical(s) in a process space downstream to an oxygen plasma to measure nitrogen concentrations due to presence of air leak.

Apparatus and method for optically detecting the emissions of a plasma produced in a conductive liquid by means of electrodes with different areas in contact with the liquid

An apparatus comprises: a chamber (100) configured to be filled with electrically conductive liquid (102); a first electrode (104) and a second electrode (106) located within the chamber (100); an optical radiation receiver (126); and an electrically conductive contact area (108) of the first electrode (104) and an electrically conductive contact area (110) of the second electrode (106) are configured to be in contact with the liquid (102) of the chamber (100) wherein the electrically conductive contact area (108) of the first electrode (104) is configured to be smaller than the electrically conductive contact area (110) of the second electrode (106). The first electrode (104) and the second electrode (106) are configured to receive electric energy and output the electric energy to the liquid (102) in order to cause substance of the liquid (102) to emit optical radiation at the electrically conductive contact area (108) of the first electrode (104) on the basis of densification of the electric energy due to the smaller electrically conductive contact area (108) of the first electrode (104). The optical radiation receiver (126) is configured to receive the optical radiation for analysis of the liquid (102).

Probe for Measuring Plasma Parameters
20210251067 · 2021-08-12 ·

A probe for measuring plasma parameters by means of active plasma resonance spectroscopy comprises an external coupling, a balun, an internal coupling, and a probe head. It is provided that the couplings, the balun, and the probe head are integrated in an electrically-insulating substrate cylinder, and the substrate cylinder has a layered structure made from multiple substrate layers along its rotational axis. In this way, a probe for measuring plasma parameters is provided which enables an improved measurement of the plasma parameters, wherein the plasma is influenced as little as possible during the measurement of the plasma parameters.