Electron capture dissociation (ECD) is performed by transmitting an electron beam through a cell along an electron beam axis, generating plasma in the cell by energizing a gas with the electron beam, and transmitting an ion beam through the interaction region along an ion beam axis to produce fragment ions. Generating the plasma forms an interaction region in the cell spaced from and not intersecting the electron beam, and including low-energy electrons effective for ECD. The ion beam axis may be at an angle to and offset from the ion beam axis, such that the electron beam does not intersect the ion beam.

A method for non-invasively imaging plasma parameters has been invented. Crossed dipole pairs are used to differentiate changes in the measured complex self- and mutual impedances due to plasma density and magnetic field. Measurements of the complex self-impedance and mutual impedance between pairs of antennas over a wide range of frequencies provide spatial information to create an image of the plasma density and magnetic field. The spectral information is acquired simultaneously using a Gaussian monopulse as the driver signal.

Disclosed herein is a multi-channel device for detecting plasma at an ultra-fast speed, including: a first antenna module connected to a first output terminal in contact with a substrate on a chuck of a process chamber and extending to ground, and receiving a first leakage current leaking through the substrate to increase reception sensitivity of the leakage current; a first current detection module detecting the first leakage current; a current measurement module receiving the first leakage current output from the first current detection module, and extracting the received first leakage current for each predetermined period to generate a first leakage current measurement information; and a control module comparing the first leakage current measurement information with a reference value to generate first arcing occurrence information.

Provided is a detecting device of gas components that includes a gas component detecting unit for detection of a light emission of plasma that is formed by re-excitation downstream of an arrangement position of an object to be processed. The gas component detecting unit includes an introduced gas supply portion that supplies an introduced gas, a nozzle portion that is provided with a hole through which the introduced gas that is supplied from the introduced gas supply portion passes through and an opening through which a part of a gas to be analyzed flowing through an exhaust pipe portion is introduced into an inside of the hole, the opening being provided in an intermediate portion of the hole, a discharge electrode portion that generates plasma inside the nozzle portion by causing the gas to be analyzed that is introduced from the opening into an inside of the nozzle portion and the introduced gas that is supplied into the inside of the hole to discharge, and a light emission detecting unit that detects a light emission of the plasma generated inside the nozzle portion by the discharge electrode portion.

A method for non-invasively imaging plasma parameters has been invented. Crossed dipole pairs are used to differentiate changes in the measured complex self- and mutual impedances due to plasma density and magnetic field. Measurements of the complex self-impedance and mutual impedance between pairs of antennas over a wide range of frequencies provide spatial information to create an image of the plasma density and magnetic field. The spectral information is acquired simultaneously using a Gaussian monopulse as the driver signal.

An RF sensing apparatus configured for use with a plasma processing chamber includes a penetration unit opened in an up/down direction, a main return path unit surrounding all or a portion of the penetration unit, and a secondary return path unit located between the penetration unit and the main return path unit, spaced apart from the main return path unit, and surrounding all or a portion of the penetration unit. The main return path unit and the secondary return path unit include a path through which a current flows in one of the up/down directions.

An RF sensing apparatus configured for use with a plasma processing chamber includes a penetration unit opened in an up/down direction, a main return path unit surrounding all or a portion of the penetration unit, and a secondary return path unit located between the penetration unit and the main return path unit, spaced apart from the main return path unit, and surrounding all or a portion of the penetration unit. The main return path unit and the secondary return path unit include a path through which a current flows in one of the up/down directions.

Disclosed herein is a multi-channel device for detecting plasma at an ultra-fast speed, including: a first antenna module connected to a first output terminal in contact with a substrate on a chuck of a process chamber and extending to ground, and receiving a first leakage current leaking through the substrate to increase reception sensitivity of the leakage current; a first current detection module detecting the first leakage current; a current measurement module receiving the first leakage current output from the first current detection module, and extracting the received first leakage current for each predetermined period to generate a first leakage current measurement information; and a control module comparing the first leakage current measurement information with a reference value to generate first arcing occurrence information.

A microelectronic module for altering the electromagnetic signature of a surface. The microelectronic module includes at least one voltage converter for converting a first voltage provided into a higher, lower or identical second voltage. Furthermore, the microelectronic module includes at least one actuator. The actuator includes at least one generator for generating an electrical plasma from the second voltage provided by the voltage converter. At least the voltage converter and the actuator are arranged on a thin-layered planar substrate. The electrical plasma generated by the actuator interacts with an electromagnetic radiation impinging on the surface, as a result of which the electromagnetic signature is altered.

Electron capture dissociation (ECD) is performed by transmitting an electron beam through a cell along an electron beam axis, generating plasma in the cell by energizing a gas with the electron beam, and transmitting an ion beam through the interaction region along an ion beam axis to produce fragment ions. Generating the plasma forms an interaction region in the cell spaced from and not intersecting the electron beam, and including low-energy electrons effective for ECD. The ion beam axis may be at an angle to and offset from the ion beam axis, such that the electron beam does not intersect the ion beam.