H05H1/0037

Asymmetric induction devices and systems and methods using them

Certain embodiments described herein are directed to devices, systems and methods that comprise asymmetric induction devices. In some instances, the device can include a plurality of plate electrodes which can be spaced asymmetrically or a plurality of coils which can be spaced asymmetrically.

PLASMA TORCH DEVICE COMPONENT MONITORING
20240179826 · 2024-05-30 ·

Aspects relate to monitorable plasma torch device components and in particular to monitoring and predictive maintenance of one or more such monitorable plasma torch device components. One aspect provides a monitorable plasma torch device component, the component comprising: a component body and a sacrificial component located in an erosion zone of the component body. The sacrificial component comprises material which differs from the plasma torch device component body and which, on exposure to a plasma torch in a plasma torch device, generates electromagnetic radiation distinct from that of the plasma torch device component body. The distinct electromagnetic radiation generated is indicative of erosion of the monitorable plasma torch device component in the erosion zone. Such a monitorable plasma torch device component can facilitate effective component monitoring which allows for ameliorative action to be taken in the event that degradation of the device component is detected.

Counterflow sample introduction and devices, systems and methods using it
10327319 · 2019-06-18 · ·

Devices, systems and methods using counterflow sample introduction are described. In certain examples, the devices, systems and methods may be configured to introduce a fluid flow comprising a sample into a torch comprising a plasma in a direction that opposes the flow of a gas used to sustain the plasma. Optical emission devices, optical absorption devices and mass spectrometers using the counterflow sample introduction are also described.

MICROWAVE PLASMA SOURCE
20190157045 · 2019-05-23 ·

The disclosure provides a plasma source and an excitation system for excitation of a plasma, and an optical monitoring system. In one embodiment the plasma source includes: (1) a coaxial resonant cavity body having an inner length, and including a first end, a second end, an inner electrode and an outer electrode, (2) a radio frequency signal interface electrically coupled to the inner and outer electrodes at a fixed position along the inner length and configured to provide a radio frequency signal to the coaxial resonant cavity body, (3) a window positioned at the first end of the coaxial resonant cavity body, and (4) a mounting flange positioned proximate the window at the first end of the coaxial resonant cavity body and defining a plasma cavity, wherein the window forms one side of the plasma cavity and isolates the coaxial resonant cavity body from plasma in the plasma cavity.

IMAGE ANALYSIS OF PLASMA CONDITIONS

Multi-pixel sensors such as camera sensors may be configured to capture two-dimensional and/or three-dimensional images of the interior of a process chamber or other fabrication tool. The sensors may be configured to capture pixelated electromagnetic radiation intensity information from within the interior of such process chamber before, during, and/or after processing of a substrate in the chamber. Such sensors may also be utilized for control, predictive, and/or diagnostic applications.

Laser Surface Treatment and Spectroscopic Analysis System

Systems, methods, and devices of the various embodiments may enable simultaneous preparation of a substrate for adhesive bonding and detection of minute contaminants on the substrate. Various embodiments may enable detection of contaminants on a surface of a substrate while the surface of the substrate is being prepared for adhesive bonding by laser ablation. Various embodiments may provide an integrated laser treatment and measurement system.

PLASMA CONTROL FOR SPARK OPTICAL EMISSION SPECTROSCOPY
20240284581 · 2024-08-22 ·

An apparatus for plasma control is disclosed. The apparatus comprises: a plasma generator comprising two electrodes, an anode and a cathode, configured to produce a plasma between the two electrodes; a solenoid coil disposed to surround the plasma and configured to produce a magnetic field parallel to a longitudinal axis between the two electrodes; and circuitry configured for allowing independent timing of the magnetic field with respect to the production of the plasma. A method for plasma control in a spectroscopy system and an optical emission spectrometer using said method are also disclosed.

Optical waveguide forming method and apparatus

An optical waveguide is formed using a gas-enclosed vessel that has an internal space in which a polyvalent ionizable gas is enclosed, a laser beam irradiation unit, and a discharge circuit that causes a pulse current to flow in the gas-enclosed vessel at an initial current value. The pulse current is increased from the initial current value to a subsequent current value greater than the initial current value, and a polyvalent ionization channel is formed in the internal space, while increasing the pulse current, by irradiating the internal space in the plasma state with a trigger laser beam generated by the pulse laser beam irradiation device. The polyvalent ionization channel expands by an inverse pinch effect after the internal space is irradiated with the trigger laser beam due to a concentration of the pulse current in the internal space.

Mass Spectrometer and Mass Spectrometry Method
20240347328 · 2024-10-17 ·

The method of operating a mass spectrometer includes: introducing precursor ions into a reaction chamber; generating radicals by generating plasma by supplying source gas and radio-frequency power to a radical generation chamber for a predetermined period by transmitting a predetermined control signal to a source gas supply part and a radio-frequency power supply part; generating product ions by introducing the radicals into the reaction chamber; measuring an intensity of light having a wavelength band including a wavelength of light emitted from the plasma inside the radical generation chamber; and determining and notifying an abnormality of the mass spectrometer on a basis of a fact that the intensity of the light exceeds a predetermined abnormality determination threshold value during a period other than the predetermined period.

Monitoring and Controlling Exothermic Reactions Using Photon Detection Devices
20180197643 · 2018-07-12 ·

A method includes vacuuming an environment containing a low energy nuclear reaction (LENR) system and flowing a gaseous material into the environment. The method includes heating the reactor to a first temperature range and applying a voltage to an electrode passing through a core of the LENR system. The method includes imaging one of the core or the system with a spectrometer and determining that the core is at a desired temperature based on the imaging.