Multi-operation tools for photovoltaic cell processing are described. In an example, a multi-operation tool includes a conveyor system to move a photovoltaic (PV) cell continuously along a conveyor path through a laser scribing station and an adhesive printing station. Furthermore, the PV cell may be aligned to a laser head of the laser scribing station and a printer head of the adhesive printing station in a single alignment operation prior to being laser scribed and printed with an adhesive in a continuous process.

An apparatus automatically packages wafer cassettes in a shipping box. The apparatus includes: a loading station configured to take the shipping box for semiconductor wafers; a radio-frequency identification (RFID) reader/writer configured to read and write to an RFID tag affixed to the shipping box; a camera configured to optically examine attachments to the shipping box; an element configured for equipping the shipping box with a desiccant pouch; an element configured for sealing a bag that surrounds the shipping box with a weld seam; an element configured for checking the impermeability of a weld seam; an element configured for applying labels to the shipping box; a robot arm configured to automatically transport the shipping box; an element configured for storing packaging material; and an element configured to take the shipping box for semiconductor wafers and to store the shipping box for transportation.

A laser machining apparatus includes, a processing chamber, a window disposed in a surface of the processing chamber, a substrate carrier disposed inside the processing chamber and facing the window, a laser irradiator which irradiates a laser onto the substrate carrier through the window, a protector supplier disposed on a side of the processing chamber, a protector retriever disposed on an opposite side of the processing chamber opposite to the side of the processing chamber, and a protector which connects the protector supplier with the protector retriever, where at least a portion of the protector is disposed between the substrate carrier and the window in the processing chamber.

The invention relates to a method for marking wafers, in particular wafers for solar cell production: The method comprises the steps of manufacturing a position line (21a, 21b, 21c) on a peripheral surface of a silicon ingot or column, the ingot or column extending in an axial direction and having a longitudinal axis in the axial direction, wherein the position line extends in the axial direction along substantially the whole ingot or column and is inclined with respect to the longitudinal axis. By this position line it is possible to determine the position of a wafer cut from the ingot or column within the ingot or column, respectively. Further, an individual identification pattern (20a, 20b, 20c) of lines on the peripheral surface of the silicon ingot or column is manufactured, the individual identification pattern of lines extending in axial direction over substantially the whole ingot or column and providing an individual coding which allows to identify the silicon ingot or column.

In some embodiments, the present disclosure relates a lithographic substrate marking tool. The lithographic substrate marking tool has a first lithographic exposure tool arranged within a shared housing and configured to generate a first type of electromagnetic radiation during a plurality of exposures. A mobile reticle has a plurality of different reticle fields respectively configured to block a portion of the first type of electromagnetic radiation to expose a substrate identification mark within a photosensitive material overlying a semiconductor substrate. A transversal element is configured to move the mobile reticle so that separate ones of the plurality of reticle fields are exposed onto the photosensitive material during separate ones of the plurality of exposures. The mobile reticle therefore allows for different strings of substrate identification marks to be formed within the photoresistive material using a same reticle, thereby economically providing the benefits of lithographic substrate marking.

Apparatus and method for aligning a rotatable substrate. In some embodiments, a circumferentially extending timing pattern is formed on a substrate. The timing pattern nominally extends about a center point of the substrate at a selected radius. The substrate is mounted to a support mechanism which rotates the substrate about a central axis. Due to mechanical tolerances, the central axis will be offset from the center point of the substrate as a result of an alignment error during the mounting of the substrate. The offset between the support mechanism central axis and the center point of the substrate is determined using a detector that detects two opposing cross-over transitions of the timing pattern during each revolution of the substrate. A feature may be written to the substrate by positioning a write element with respect to the substrate responsive to the detected offset.

An automated module for assembly lines to assemble electronic devices includes a plurality of cells. Each cell includes a support structure, a control unit and at least one actuating system, operatively connected to the control unit for receiving commands and transmitting the results obtained as data to and from the control unit. The automated module includes at least one moving device, for moving at least one electronic device among the module's cells; and a supervision unit. The supervision unit interacts with each control unit of each cell, thus sending commands to control each single cell and receiving respective results from the respective control units as data; and to control the moving device for its activation, to move the electronic devices among the cells. The cells are independent and are assembled in a modular manner in the desired sequence, to perform a desired sequence of operations on the electronic device.

A method for manufacturing a semiconductor device is provided with: a step of preparing a semiconductor wafer (22) in a state where the circumference of the semiconductor wafer, which has been divided into semiconductor device parts, is adhered on a dicing sheet (21) supported by a wafer ring (23); a step of fixing the wafer ring (23) after transferring the wafer ring to a table (14) where laser printing is to be performed; and a step of marking on the main surface where the semiconductor material of the semiconductor device parts which configure the semiconductor wafer (22) is exposed, by radiating laser beams through the dicing sheet and an adhesive layer.

Disclosed are a laser processing method for cutting a semiconductor wafer having a metal layer formed thereon and a laser processing device. The disclosed laser processing method transmits a plurality of laser beams, which propagate coaxially, to the semiconductor wafer, thereby forming focusing points in positions adjacent to a surface of the metal layer, which constitutes a boundary with the semiconductor wafer, and to one surface of the semiconductor wafer, respectively.

The present disclosure relates to a laser marking device and a method thereof. The laser marking device comprises a laser system, a wafer leveling system, a first imaging system and a mobile system: the wafer leveling system carries and levels a warped wafer to be processed; the mobile system underneath properly adjusts a position of the wafer; the first imaging system detects the wafer to recognize a product category and positioning status; the laser system underneath labels laser marks on the wafer; all wafers are marked in the cyclic process.