A semiconductor device with a novel structure is provided. The semiconductor device includes a plurality of arithmetic blocks each including an arithmetic circuit portion and a memory circuit portion. The arithmetic circuit portion and the memory circuit portion are electrically connected to each other. The arithmetic circuit portion and the memory circuit portion have an overlap region. The arithmetic circuit portion includes, for example, a Si transistor, and the memory circuit portion includes, for example, an OS transistor. The arithmetic circuit portion has a function of performing product-sum operation. The memory circuit portion has a function of retaining weight data. A first driver circuit has a function of writing the weight data to the memory circuit portion. The weight data is written to all the memory circuit portions included in the same column with the use of the first driver circuit.

Provided is a display panel fabricated with a hybrid semiconductor circuit in a substrate, including a c-Si circuits and a compound semiconductor circuit arranged in separate regions on the substrate. Row scanning circuits of the display panel are fabricated with the c-Si transistors and pixel array of the display panel is fabricated with the compound semiconductor transistors.

This arrangement allows low voltage driven CMOS circuit and high voltage driven pixel circuits being integrated together in one substrate.

Provided is a Complementary Metal Oxide Semiconductor (CMOS) logic element. The CMOS logic element includes a substrate including a PMOS area, a circuit wiring structure including an insulating layer and a wiring layer alternately stacked on the substrate, wherein the circuit wiring structure includes an NMOS area vertically spaced apart from the PMOS area, a first transistor disposed on the PMOS area, and a second transistor disposed on the NMOS area and complementarily connected to the first transistor, wherein the first transistor includes a first gate electrode, source/drain areas formed on the PMOS area on both sides of the first gate electrode, and a first channel connecting the source and drain areas to each other, wherein the second transistor includes a second gate electrode and a second channel vertically overlapping the second gate electrode, wherein the first channel includes silicon, wherein the second channel includes an oxide semiconductor.

The present disclosure relates to semiconductor structures and, more particularly, to switches in a bulk substrate and methods of manufacture. The structure includes: at least one active device having a channel region of a first semiconductor material; a single air gap under the channel region of the at least one active device; and a second semiconductor material being coplanar with and laterally bounding at least one side of the single air gap, the second semiconductor material being different material than the first semiconductor material.

A semiconductor device having favorable electrical characteristics is provided. The semiconductor device includes a transistor including a gate electrode, a source electrode, and a drain electrode; a first insulator over the transistor; a second insulator over the first insulator; a third insulator over the second insulator; a first electrode in contact with the top surface of the source electrode; and a second electrode in contact with the top surface of the drain electrode. The second insulator includes a first opening portion overlapping with the source electrode and a second opening portion overlapping with the drain electrode. The third insulator is in contact with the side surface of the second insulator and the top surface of the first insulator inside the first opening portion and the second opening portion. The first electrode is positioned through the first opening portion. The second electrode is positioned through the second opening portion.

An electronic device is disclosed. The electronic device includes: a first doped region of a first doping type arranged in a first semiconductor layer of a second doping type complementary to the first doping type; an insulation layer formed on top of the first semiconductor layer and adjoining the first doped region; at least two active device regions arranged in a second semiconductor layer formed on top of the insulation layer; and an electrical connection between one of the at least two active device regions and the first doped region. Each of the at least two active device regions is arranged adjacent to the first doped region and separated from the first doped region by the insulation layer.

A minute transistor is provided. A transistor with low parasitic capacitance is provided. A transistor having high frequency characteristics is provided. A semiconductor device including the transistor is provided. A semiconductor device includes an oxide semiconductor, a first conductor, a second conductor, a third conductor, a first insulator, and a second insulator. The first conductor overlaps with the oxide semiconductor with the first insulator positioned therebetween. The second insulator has an opening and a side surface of the second insulator overlaps with a side surface of the first conductor in the opening with the first insulator positioned therebetween. Part of a surface of the second conductor and part of a surface of the third conductor are in contact with the first insulator in the opening. The oxide semiconductor overlaps with the second conductor and the third conductor.

A stacked transistor architecture has a fin structure that includes lower and upper portions separated by an isolation region built into the fin structure. Upper and lower gate structures on respective upper and lower fin structure portions may be different from one another (e.g., with respect to work function metal and/or gate dielectric thickness). One example methodology includes depositing lower gate structure materials on the lower and upper channel regions, recessing those materials to re-expose the upper channel region, and then re-depositing upper gate structure materials on the upper channel region. Another example methodology includes depositing a sacrificial protective layer on the upper channel region. The lower gate structure materials are then deposited on both the exposed lower channel region and sacrificial protective layer. The lower gate structure materials and sacrificial protective layer are then recessed to re-expose upper channel region so that upper gate structure materials can be deposited.

An integrated circuit device includes a semiconductor substrate, an active area in a surface of the semiconductor substrate, a gate electrode, source and drain regions in the active area on opposite sides of the gate electrode to form a transistor, an active conductive pattern connected to a first plurality of electrical contacts for applying electrical signals to the transistor, and a dummy conductive pattern connected to a first plurality of thermal contacts for removing heat from the first active area, where the thermal contacts are electrically isolated from receiving the electrical signals applied to the electrical contacts.

A circuit includes a P-channel transistor formed in a P-well and an N-channel transistor formed in an N-well. The first P-channel transistor has a control electrode connected to the P-well. The N-channel transistor is coupled in series with the P-channel transistor and has a control electrode connected to the N-well. Connecting the control electrodes of the P-channel and N-channel transistors to respective P-well and N-well effectively reduces crowbar current in the circuit.