A method of fabricating a semiconductor device, including performing the following steps in the following sequence: providing a substrate including first and second gate regions separated by a trench formed in the substrate and growing a thin oxide layer on each of the first and second gate regions. The method further includes removing the thin oxide layer from the second gate region, and growing a thick oxide layer on the second gate region.

An array substrate, a manufacturing method thereof, and display panel are provided. Gate scanning lines and Light-shielding conductive layer are electrically connected, so that a width of the gate scanning line is substantially unchanged from the conventional technology to ensure an aperture ratio of a display panel. Therefore, an impedance of the wire used to transmit the scanning electrical signal is reduced, so that the display panel driving power consumption is reduced to increase the corresponding speed of pixel charging and discharging.

A thin film transistor array substrate and an electronic device including the thin film transistor array are disclosed. The thin film transistor comprises a substrate, a first active layer on the substrate, a gate electrode on the first active layer, a second active layer on the gate electrode such that the gate electrode is between the first active layer and the second active layer. The gate electrode is configured to drive the first active layer and the second active layer. Thereby, it is possible to provide the thin film transistor array substrate including one or more thin film transistors having high current characteristics in a small area, and the electronic device including the thin film transistor array substrate.

An array substrate, a manufacturing method thereof, and a display panel. The array substrate includes a light-emitting area and a non-light-emitting area. The array substrate comprises: a substrate; a gate insulating layer comprising a first gate insulating layer and a second gate insulating layer disposed on the substrate in sequence; and a storage capacitor disposed in the light-emitting area and comprising a first transparent electrode and a second transparent electrode. Wherein the first transparent electrode is disposed between the first gate insulating layer and the second gate insulating layer, and the second transparent electrode is disposed on the second gate insulating layer.

A display device includes a substrate, a first semiconductor pattern, a first gate insulating film covering the first semiconductor pattern, a first conductive layer and a second semiconductor pattern are on the first gate insulating film, a second gate insulating film on the second semiconductor pattern, a third gate insulating film covering the first gate insulating film and the second gate insulating film, a second conductive layer on the third gate insulating film, an interlayer insulating film covering the second conductive layer, and a third conductive layer on the interlayer insulating film, wherein the first and second semiconductor patterns respectively form semiconductor layers of the first and second transistors, wherein the first conductive layer includes a gate electrode of the first transistor and a first electrode of the capacitor, and wherein the second conductive layer includes a gate electrode of the second transistor and a second electrode of the capacitor.

A display device includes: a substrate including a display region and a peripheral region, wherein the peripheral region is adjacent to the display region; a first transistor disposed on the peripheral region, wherein the first transistor includes a first semiconductor layer and the first semiconductor layer is a silicon semiconductor layer; and a second transistor disposed on the display region, wherein the second transistor includes a second semiconductor layer and the second semiconductor layer is an oxide semiconductor layer, wherein the first transistor is electrically connected to the second transistor.

A display apparatus includes a lower substrate, first to third light-emitting devices arranged on the lower substrate, where the first to third light-emitting devices each includes a color emission layer, an upper substrate arranged above the lower substrate with the first to third light-emitting devices therebetween, a first insulating layer arranged on a lower surface of the upper substrate in a direction to the lower substrate, the first insulating layer defining a (1-1).sup.st opening corresponding to the first light-emitting device, a (1-2).sup.nd opening corresponding to the second light-emitting device, and a (1-1).sup.st groove connecting the (1-1).sup.st opening to the (1-2).sup.nd opening, a first color quantum dot layer arranged in the (1-1).sup.st opening, and a second color quantum dot layer arranged in the (1-2).sup.nd opening.

The present invention provides a low-latency thin film transistor, an array substrate, and a display panel. The low-latency thin film transistor includes a gate, an active layer disposed on a side of the gate, and a source and a drain disposed above the gate, and the source and the drain are respectively connected to the active layer, wherein in a direction perpendicular to the active layer, at least part of an orthographic projection of the drain is located outside an orthographic projection of the gate.

The present disclosure relates to an array substrate, a manufacturing method thereof, and a display panel, the array substrate including: a substrate, and a low temperature polysilicon layer, an inorganic film group layer, and a source/drain layer disposed on the substrate in sequence. The substrate includes a display region, the low temperature polysilicon layer located at the display region, the inorganic film group layer provided with a through hole, and an angle between a sidewall and a bottom wall of the through hole is not less than 100 degrees; the source/drain layer covering the sidewall and the bottom wall of the through hole to be connected to the low temperature polysilicon layer.

The present disclosure provides a display substrate, a manufacturing method thereof, and a display device. The display substrate comprises a base substrate, and a first thin film transistor and a second thin film transistor formed on the base substrate, wherein a first active layer of the first thin film transistor is made of low-temperature polysilicon, and a second active layer of the second thin film transistor is made of a metal oxide. The display substrate further comprises a first barrier layer on a side of the second active layer close to the base substrate and a second barrier layer on a side of the second active layer away from the base substrate. The orthographic projection of the second active layer onto the base substrate falls within the orthographic projections of the first barrier layer and the second barrier layer onto the base substrate.