A display device and a manufacturing method thereof are disclosed. The display device includes a base substrate and at least one pixel circuit provided on the base substrate. The pixel circuit includes a driving transistor, a first transistor, and a second transistor; the base substrate includes a semiconductor body that can be doped, and a first conductive layer and a second conductive layer that are on the semiconductor body; the first transistor includes a first doped region in contact with the first electrode of the first transistor, and a second doped region in contact with a second electrode of the first transistor, and the first doped region of the first transistor and the second doped region of the first transistor are spaced apart from each other, have a same doping type, and are both in the semiconductor body.

The present disclosure relates to a display device which includes: a substrate; a semiconductor layer disposed on the substrate and including a driving transistor and a second transistor each of which including a channel, a first region, and a second region; a first gate insulating layer disposed on the semiconductor layer, a gate electrode of the second transistor disposed on the first gate insulating layer and overlapping the channel of the second transistor; a second gate insulating layer disposed on the gate electrode of the gate electrode of the second transistor; and a gate electrode of the first driving transistor disposed on the second gate insulating layer and overlapping the channel of the driving transistor.

The present invention discloses an array substrate, a manufacturing method thereof, and a display device thereof. The array substrate includes a substrate; a plurality of first thin film transistors, the first thin film transistors including a first gate electrode layer and a second gate electrode layer; a plurality of second thin film transistors, the second thin film transistors including a third gate electrode layer; and a gate electrode insulation layer disposed between the first gate electrode layer and the second gate electrode layer, and the third gate electrode layer located near a surface of a side of the substrate. The gate electrode insulation layer is silicon nitride material.

A display device is disclosed that includes a substrate, a semiconductor layer, a first conductive layer, and a first gate insulating layer. The semiconductor layer is disposed on the substrate and includes a first area and a second area. The first conductive layer is disposed on the semiconductor layer and includes a first gate pattern overlapping the first area and a second gate pattern overlapping the second area. The first gate insulating layer is disposed between the semiconductor layer and the first conductive layer and includes a first insulating layer overlapping the first area and the second area, a second insulating layer overlapping the first area and the second area, and a third insulating layer not overlapping the first area but overlapping the second area. The second insulating layer is disposed between the first insulating layer and the third insulating layer, and has a dielectric constant greater than that of the third insulating layer.

A display device includes: a substrate; a first active layer of a first transistor and a second active layer of a second transistor on the substrate; a first gate insulating layer on the first active layer; a first gate electrode on the first gate insulating layer; a second gate insulating layer on the second active layer; and a second gate electrode on the second gate insulating layer, wherein a hydrogen concentration of the first gate insulating layer is lower than a hydrogen concentration of the second gate insulating layer.

In an electro-optical device, a first opening and a second opening are provided in an interlayer insulating layer provided in a layer between a transistor and a scanning line, with a semiconductor layer interposed between the first opening and the second opening in plan view. A portion of a gate electrode is provided inside the first opening, and the gate electrode is electrically connected to the scanning line via the first opening. The second opening does not overlap with the gate electrode, and a portion of a first capacitance electrode of a capacitance element is provided in the second opening, the first capacitance electrode having light shielding properties. Therefore, the width of the scanning line can be made narrower than in a case in which the gate electrode and the scanning line are electrically connected to each other via both the first opening and the second opening.

A driving thin film transistor includes an insulation layer disposed on a substrate and including a first groove; a first active layer corresponding to the first groove and including a channel region and source and drain regions at both sides of the channel region; first source and first drain electrodes spaced apart from each other and being in contact with the source and drain regions, respectively; and a gate electrode overlapping the channel region, wherein the channel region is disposed on a bottom surface and inner side surfaces of the first groove, and the source and drain regions are disposed on a top surface of the insulation layer.

A method for fabricating a semiconductor device includes the steps of: providing a substrate having a first region, a second region, and a third region; forming a first gate oxide layer on the first region, the second region, and the third region; and performing an etching process and an infrared treatment process at the same time to completely remove the first gate oxide layer on the second region for exposing the substrate.

A preparation method of a thin film transistor (TFT) array substrate includes a step of providing a substrate to prepare a light shielding layer and a buffer layer in sequence on the substrate; and a step of preparing an active layer, a gate insulation layer, a gate, an interlayer insulation layer, and a source/drain metal layer in sequence on the buffer layer; wherein a light absorption layer is prepared on one side of the active layer. Absorbing light prevents most of the light from being reflected to the active layer by disposing a black photoresist below a source and a drain or over the light shielding layer, thereby improving performance of TFT devices.

An antenna device is provided. The antenna device includes a first substrate, a multilayer electrode, a second substrate, and a liquid-crystal layer. The multilayer electrode is disposed on the first substrate, and the multilayer electrode includes a first conductive layer, a second conductive layer, and a third conductive layer. The second conductive layer is disposed on the first conductive layer. The third conductive layer is disposed on the second conductive layer. The liquid-crystal layer is disposed between the first substrate and the second substrate. In addition, the third conductive layer includes a first portion that extends beyond the second conductive layer.