Patent classifications
H01L29/72
Avalanche diode along with vertical PN junction and method for manufacturing the same field
An embodiment method of manufacturing an avalanche diode includes forming a first trench in a substrate material, filling the first trench with a first material that comprises a dopant, and causing the dopant to diffuse from the first trench to form part of a PN junction. An avalanche diode array can be formed to include a number of the avalanche diodes.
TWO-TERMINAL DEVICE AND LIGHTING DEVICE USING THE SAME
A two-terminal device (TTD) capable of preventing leakage current by using diffusion current having bidirectionality and generated due to a potential barrier by an insulator, and a lighting device using the TTD are disclosed.
TWO-TERMINAL DEVICE AND LIGHTING DEVICE USING THE SAME
A two-terminal device (TTD) capable of preventing leakage current by using diffusion current having bidirectionality and generated due to a potential barrier by an insulator, and a lighting device using the TTD are disclosed.
Transistor with fluorinated graphene spacer
An integrated circuit (IC) device may include a semiconductor structure. The semiconductor structure may include a source contact, a drain contact, and a gate. A first fluorocarbon spacer may be between the gate and the source contact. A second fluorocarbon spacer may be between the gate and the drain contact.
Transistor with fluorinated graphene spacer
An integrated circuit (IC) device may include a semiconductor structure. The semiconductor structure may include a source contact, a drain contact, and a gate. A first fluorocarbon spacer may be between the gate and the source contact. A second fluorocarbon spacer may be between the gate and the drain contact.
SENSOR
A sensor includes a semiconductor substrate, a detector disposed above the semiconductor substrate and configured to output a signal in accordance with a physical quantity, an electrostatic discharge protection circuit including a metal-oxide-semiconductor transistor, and a dummy pattern formed above the semiconductor substrate and formed of a same material as a material of a gate electrode, the gate electrode being included in the electrostatic discharge protection circuit.
Electrostatic discharge protection apparatus having at least one junction and method for operating the same
An ESD protection apparatus includes a semiconductor substrate, a first well, a second well, a first doping region, a second doping region, a third doping region, a fourth doping region and at least one junction formed by different conductivities. The first well and the second well respectively having a first conductivity and a second conductivity are disposed in the semiconductor substrate. The first doping region having the first conductivity is disposed in the first well. The second doping region having the second conductivity is disposed in the first well. The third doping region and the fourth doping region respectively having the first conductivity and the second conductivity are disposed in the second well. The at least one junction is formed by the first doping region and the second doping region, or formed by the third doping region and the fourth doping region.
Schottky device and method of manufacture
A Schottky device includes a plurality of mesa structures where one or more of the mesa structures includes a doped region having a multi-concentration dopant profile. In accordance with an embodiment, the Schottky device is formed from a semiconductor material of a first conductivity type. Trenches having sidewalls and floors are formed in the semiconductor material to form a plurality of mesa structures. A doped region having a multi-concentration impurity profile is formed in at least one trench, where the impurity materials of the doped region having the multi-concentration impurity profile are of a second conductivity type. A Schottky contact is formed to at least one of the mesa structures having the doped region with the multi-concentration impurity profile.
Stretchable Form of Single Crystal Silicon for High Performance Electronics on Rubber Substrates
The present invention provides stretchable, and optionally printable, semiconductors and electronic circuits capable of providing good performance when stretched, compressed, flexed or otherwise deformed. Stretchable semiconductors and electronic circuits of the present invention preferred for some applications are flexible, in addition to being stretchable, and thus are capable of significant elongation, flexing, bending or other deformation along one or more axes. Further, stretchable semiconductors and electronic circuits of the present invention may be adapted to a wide range of device configurations to provide fully flexible electronic and optoelectronic devices.
Stretchable Form of Single Crystal Silicon for High Performance Electronics on Rubber Substrates
The present invention provides stretchable, and optionally printable, semiconductors and electronic circuits capable of providing good performance when stretched, compressed, flexed or otherwise deformed. Stretchable semiconductors and electronic circuits of the present invention preferred for some applications are flexible, in addition to being stretchable, and thus are capable of significant elongation, flexing, bending or other deformation along one or more axes. Further, stretchable semiconductors and electronic circuits of the present invention may be adapted to a wide range of device configurations to provide fully flexible electronic and optoelectronic devices.