An electro-optic assembly includes a layer of electro-optic material configured to switch optical states upon application of an electric field and an anisotropically conductive layer having one or more moisture-resistive polymers and a conductive material, the moisture-resistive polymer having a WVTR less than 5 g/(m.sup.2*d).

An electro-optic assembly includes a layer of electro-optic material configured to switch optical states upon application of an electric field and an anisotropically conductive layer having one or more moisture-resistive polymers and a conductive material, the moisture-resistive polymer having a WVTR less than 5 g/(m.sup.2*d).

Methods for die attachment of multichip and single components may involve printing a sintering paste on a substrate or on the back side of a die. Printing may involve stencil printing, screen printing, or a dispensing process. Paste may be printed on the back side of an entire wafer prior to dicing, or on the back side of an individual die. Sintering films may also be fabricated and transferred to a wafer, die or substrate. A post-sintering step may increase throughput.

Methods for die attachment of multichip and single components may involve printing a sintering paste on a substrate or on the back side of a die. Printing may involve stencil printing, screen printing, or a dispensing process. Paste may be printed on the back side of an entire wafer prior to dicing, or on the back side of an individual die. Sintering films may also be fabricated and transferred to a wafer, die or substrate. A post-sintering step may increase throughput.

A method for manufacturing a member to be treated includes: a first bonding step of bonding a member to be treated containing metal oxide and a first support to each other with a first adhesive layer; a first surface processing step of forming a first processed surface on the member to be treated; a first surface contact step of bringing a support having adhesiveness, an adsorption support which adsorbs the member to be treated, or a second adhesive layer, into contact with the first processed surface; a second bonding step of bonding the member to be treated and a second support with the second adhesive layer; and a second surface processing step of forming a second processed surface on a rear surface of the first processed surface of the member to be treated. In a case where the support having adhesiveness or the adsorption support and the first processed surface are in contact with each other, the support having adhesiveness or the adsorption support is removed in the first surface contact step. A first adhesive layer removing step of removing the first adhesive layer from the member to be treated is included between the first surface contact step and the second surface processing step.

A copper paste for pressureless bonding is a copper paste for pressureless bonding, containing: metal particles; and a dispersion medium, in which the metal particles include sub-micro copper particles having a volume average particle diameter of greater than or equal to 0.01 m and less than or equal to 0.8 m, and micro copper particles having a volume average particle diameter of greater than or equal to 2.0 m and less than or equal to 50 m, and the dispersion medium contains a solvent having a boiling point of higher than or equal to 300 C., and a content of the solvent having a boiling point of higher than or equal to 300 C. is greater than or equal to 2 mass % on the basis of a total mass of the copper paste for pressureless bonding.

A copper paste for pressureless bonding is a copper paste for pressureless bonding, containing: metal particles; and a dispersion medium, in which the metal particles include sub-micro copper particles having a volume average particle diameter of greater than or equal to 0.01 m and less than or equal to 0.8 m, and micro copper particles having a volume average particle diameter of greater than or equal to 2.0 m and less than or equal to 50 m, and the dispersion medium contains a solvent having a boiling point of higher than or equal to 300 C., and a content of the solvent having a boiling point of higher than or equal to 300 C. is greater than or equal to 2 mass % on the basis of a total mass of the copper paste for pressureless bonding.

In an embodiment, a method includes attaching a first package component to a first carrier, the first package component comprising: an aluminum pad disposed adjacent to a substrate; a sacrificial pad disposed adjacent to the substrate, the sacrificial pad comprising a major surface opposite the substrate, a protrusion of the sacrificial pad extending from the major surface; and a dielectric bond layer disposed around the aluminum pad and the sacrificial pad; attaching a second carrier to the first package component and the first carrier, the first package component being interposed between the first carrier and the second carrier; removing the first carrier; planarizing the dielectric bond layer to comprise a top surface being coplanar with the protrusion; and etching a portion of the protrusion.

A semiconductor structure and methods of forming the semiconductor structure include a solder bump self-aligned to a through-substrate-via, wherein the solder bump and the through-substrate-via are formed of a conductive metal material, and wherein the through-substrate-via is coupled to a buried metallization layer, which is formed of a different conductive metal material.

A semiconductor structure and methods of forming the semiconductor structure include a solder bump self-aligned to a through-substrate-via, wherein the solder bump and the through-substrate-via are formed of a conductive metal material, and wherein the through-substrate-via is coupled to a buried metallization layer, which is formed of a different conductive metal material.