A semiconductor integratd circuit device includes fuse elements formed on an element isolation insulating film, and an insulating film, an interlayer insulating film and a silicon nitride film successively formed over the fuse elements. An opening region extends through the silicon nitride film into the interlayer insulating film above the fuse elements, and openings formed in the interlayer insulating film are positioned on both sides of middle portions of the fuse elements. The openings facilitate blowing off of the insulating film during laser cutting of the fuse elements, reducing physical damage to the element isolation insulating film under the fuse elements.

Provided is a semiconductor device in which a fuse element, which is cuttable by a laser, can be stably cut. The fuse element includes an upper fuse element, a lower fuse wiring line, and a fuse connecting contact such that, in cutting the fuse element by a laser, the lower fuse wiring line is protected by an inter-layer film, and only the upper fuse element is efficiently melted and evaporated. In addition, the contact for connecting the upper fuse element and the lower fuse wiring line to each other is formed at a center of a laser irradiation region, and hence the connection portion receives the energy of the laser most efficiently.

A semiconductor device includes a fuse pattern disposed over a semiconductor substrate, an epoxy mold compound (EMC) layer disposed over the fuse pattern, a first package substrate disposed over the EMC layer, an insulating film disposed over the first package substrate, and a second package substrate disposed over the insulating film. To the first package substrate, a Vss voltage or a negative voltage lower than the Vss voltage is applied to prevent impurities from migrating to the fuse pattern.

Provided is a semiconductor device preventing readhesion of conductive body which forms fuse elements and breakage of the fuse elements. The semiconductor device includes a first insulating film formed on a semiconductor substrate, a plurality of fuse elements formed on the first insulating film adjacent to one another, a protective insulating film covering at least side surfaces of the fuse elements, and a second insulating film formed of one of a BPSG film and a PSG film to cover the fuse elements and the protective insulating film. The protective insulating film is higher in mechanical strength than the second insulating film.

Embodiments of the present disclosure provide apparatuses and methods for balancing parasitic capacitances between metal tracks in an integrated circuit chip. Specifically, additional capacitances in the form of, for example, tab capacitors, are attached to the metal tracks with the intention of detaching a select number of the attached capacitances for the purpose of balancing the parasitic capacitances between the metal tracks. The attached capacitances may be structural metal elements. Further, the attached structural metal elements may be detachable at thin-film resistive material associated with each of the attached structural metal elements.

For simplifying the dual-damascene formation steps of a multilevel Cu interconnect, a formation step of an antireflective film below a photoresist film is omitted. Described specifically, an interlayer insulating film is dry etched with a photoresist film formed thereover as a mask, and interconnect trenches are formed by terminating etching at the surface of a stopper film formed in the interlayer insulating film. The stopper film is made of an SiCN film having a low optical reflectance, thereby causing it to serve as an antireflective film when the photoresist film is exposed.

A corrosion resistant semiconductor device includes fuse elements that can be cut by laser light. An upper portion of the fuse elements is covered with a porous insulating film so that, when laser light irradiated from a rear surface of a semiconductor substrate is collected at selected fuse elements, the fuse elements generate heat, expand, and rupture. A metal lattice having a plurality of windows is disposed over the fuse elements to permit rapid expansion of the fuse elements when irradiated with the laser light. Alternatively, a metal array having a plurality of independent light-shielding portions may be disposed over the fuse elements to prevent the laser light from adversely affecting circuitry on the front surface side of the semiconductor device.

The present application relates to a semiconductor structure, a method for forming the semiconductor structure, and a fuse array. The semiconductor structure includes at least two first through holes located above a substrate, a first conductive layer located above and electrically connected with the first through holes, at least two second through holes located above the first conductive layer, and a second conductive layer located above the second through holes and electrically connected with the first conductive layer through the second through holes, wherein projections of the first through holes and the second conductive layer on the substrate are non-overlapping. The semiconductor structure requires relatively low fusing energy.

A parallel redundant system comprises a substrate, a first circuit disposed over the substrate, a first conductor disposed at least partially in a first layer over the substrate and wire routed to the first circuit, a second circuit disposed over the substrate, the second circuit redundant to the first circuit, a second conductor disposed in a second layer over the substrate and electrically connected to the second circuit, the second conductor disposed at least partially over the first conductor, a dielectric layer disposed at least partially between the first layer and the second layer, and a laser weld electrically connecting the first conductor to the second conductor.

A semiconductor structure and a method for forming the semiconductor structure are disclosed. The method includes receiving a first integrated circuit component having a seal ring and a fuse structure, wherein the fuse structure is electrically connected to a ground through the seal ring; receiving a second integrated circuit component having a first capacitor; bonding the second integrated circuit component to the first integrated circuit component; electrically connecting the first capacitor to the fuse structure, wherein the first capacitor is electrically connected to the ground through the fuse structure; and blowing the fuse structure after a treatment.