Examples described in this disclosure relate to superconducting devices, including reciprocal quantum logic (RQL) compatible devices. A superconducting device including at least one superconducting element having a first coefficient of thermal expansion is provided. The at least one superconducting element is formed on a dielectric layer having a second coefficient of thermal expansion and the first coefficient of thermal expansion is different from the second coefficient of thermal expansion causing a strain mismatch between the at least one superconducting element and the dielectric layer when the superconducting device is operating in a cryogenic environment. The superconducting device may also include at least one dummy element configured to lower stress at an interface between the at least one superconducting element and the dielectric layer when the at least one superconducting device is operating in the cryogenic environment.

An integrated circuit is provided that comprises a first ground plane associated with a first set of circuits that have a first operational temperature requirement, and a second ground plane associated with a second set of circuits that have a second operational temperature requirement that is higher than the first operational temperature requirement. The second ground plane is substantially thermally isolated from the first ground plane. A superconducting coupler electrically couples the first ground plane and the second ground plane while maintaining relative thermal isolation between the first ground plane and the second ground plane.

A method is provided of forming a superconductor interconnect structure. The method comprises forming a dielectric layer overlying a substrate, forming an interconnect opening in the dielectric layer, and moving the substrate to a deposition chamber. The method further comprises performing a cleaning process on the top surface of the dielectric layer and in the interconnect opening while in the deposition chamber, and depositing a superconducting metal in the interconnect opening while in the deposition chamber to form a superconducting element in the superconductor interconnect structure.

Methods and structures corresponding to superconducting apparatus including superconducting layers and traces are provided. A method for forming a superconducting apparatus includes forming a first dielectric layer on a substrate by depositing a first dielectric material on the substrate and curing the first dielectric material at a first temperature. The method further includes forming a first superconducting layer comprising a first set of patterned superconducting traces on the first dielectric layer. The method further includes forming a second dielectric layer on the first superconducting layer by depositing a second dielectric material on the first superconducting layer and curing the second dielectric material at a second temperature, where the second temperature is lower than the first temperature. The method further includes forming a second superconducting layer comprising a second set of patterned superconducting traces on the second dielectric layer.

A low-noise wide band amplifier is realized utilizing a superconductor-insulator-superconductor (SIS) junction, quasiparticle frequency mixers connected in tandem or in cascade, a first quasiparticle mixer performs first frequency mixing with use of a first local signal having a frequency not less than twice a frequency of an input signal to the first quasiparticle mixer, a second quasiparticle mixer performs second frequency mixing with use of a second local signal having a frequency not more than twice a frequency of an input signal to the second quasiparticle mixer, and signal amplification is performed through frequency conversion by extracting, from among a plurality of signals generated with the first and the second frequency mixing, a signal in a frequency band not more than a frequency band of the signal before the first frequency mixing and the second frequency mixing, using a transmission line or a filter.

A cryogenic electronic package includes at least two superconducting and/or conventional metal semiconductor structures. Each of the semiconductor structures includes a substrate and a superconducting trace. Additionally, each of the semiconductor structures includes a passivation layer and one or more under bump metal (UBM) structures. The cryogenic electronic package also includes one or more superconducting and/or conventional metal interconnect structures disposed between selected ones of the at least two superconducting semiconductor structures. The interconnect structures are electrically coupled to respective ones of the UBM structures of the semiconductor structures to form one or more electrical connections between the semiconductor structures. A method of fabricating a cryogenic electronic package is also provided.

A method of fabrication of a superconducting device includes forming a first portion of the superconducting device on a first chip, a second portion of the superconducting device on a second chip, and bonding the first chip to the second chip, arranged in a flip-chip configuration. The first portion of the superconducting device on the first chip includes a dissipative portion of the superconducting device. A multi-layer superconducting integrated circuit is implemented so that noise-susceptible superconducting devices are positioned in wiring layers formed from a low-noise superconductive material and that underlie wiring layers that are formed from a different superconductive material. A superconducting integrated circuit has a first stack with a first superconducting wiring layer formed from a first high kinetic inductance material and a second superconducting wiring layer communicatively coupled to the first superconducting wiring layer to form a first control circuit, a second stack comprising a third superconducting wiring layer formed from a second high kinetic inductance material and a fourth superconducting wiring layer communicatively coupled the third superconducting wiring layer to form a second control circuit. The superconducting integrated circuit also has a third stack with a controllable device, and at least one of the first control circuit and the second control circuit is communicatively coupled to the controllable device.

Electrical, mechanical, computing, and/or other devices that include components formed of extremely low resistance (ELR) materials, including, but not limited to, modified ELR materials, layered ELR materials, and new ELR materials, are described.

A semiconductor structure and methods of forming the semiconductor structure generally includes providing a thermocompression bonded superconducting metal layer sandwiched between a first silicon substrate and a second silicon substrate. The second substrate includes a plurality of through silicon vias to the thermocompression bonded superconducting metal layer. A second superconducting metal is electroplated into the through silicon vias using the thermocompression bonded superconducting metal layer as a bottom electrode during the electroplating process, wherein the filling is from the bottom upwards.

A method of forming a superconductor interconnect structure is disclosed. The method includes forming a dielectric layer overlying a substrate, forming an interconnect opening in the dielectric layer, and moving the substrate to a deposition chamber. The method further includes depositing a superconducting metal in the interconnect opening, by performing a series of superconducting deposition and cooling processes to maintain a chamber temperature at or below a predetermined temperature until the superconducting metal has a desired thickness, to form a superconducting element in the superconductor interconnect structure.