A package structure includes a circuit element, a first semiconductor die, a second semiconductor die, a heat dissipating element, and an insulating encapsulation. The first semiconductor die and the second semiconductor die are located on the circuit element. The heat dissipating element connects to the first semiconductor die, and the first semiconductor die is between the circuit element and the heat dissipating element, where a sum of a first thickness of the first semiconductor die and a third thickness of the heat dissipating element is substantially equal to a second thickness of the second semiconductor die. The insulating encapsulation encapsulates the first semiconductor die, the second semiconductor die and the heat dissipating element, wherein a surface of the heat dissipating element is substantially leveled with the insulating encapsulation.

Disclosed are exemplary embodiments of compressible foamed thermal interface materials. Also disclosed are methods of making and using compressible foamed thermal interface materials.

A semiconductor device includes a wiring board; a first semiconductor chip including a first surface, a second surface, and a connection bump on the first surface, the first semiconductor chip coupled to the wiring board through the connection bump; a resin layer covering the connection bump between the first semiconductor chip and the wiring board, an upper surface of the resin layer parallel to the second surface of the first semiconductor chip; and a second semiconductor chip including a third surface, a fourth surface, and an adhesive layer on the third surface, the second semiconductor chip adhering to the second surface of the first semiconductor chip and the upper surface of the resin layer through the adhesive layer. The upper surface of the resin layer projects outside a portion of at least an outer edge of the second semiconductor chip when viewed from the top.

Disclosed are exemplary embodiments of compressible foamed thermal interface materials. Also disclosed are methods of making and using compressible foamed thermal interface materials.

The present disclosure provides a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes a substrate, a die and a first adhesive layer; a surface of the substrate is provided with an insulation layer; the die is arranged on a surface of the insulation layer via the first adhesive layer; the insulation layer is provided with at least one hole slot; a position of the at least one hole slot corresponds to at least a part of an edge of the first adhesive layer; a second adhesive layer is arranged in the at least one hole slot; at least a part of a surface of the second adhesive layer is connected with the first adhesive layer; and an elasticity modulus of the second adhesive layer is smaller than an elasticity modulus of the first adhesive layer.

The present disclosure provides a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes a substrate, a die and a first adhesive layer; a surface of the substrate is provided with an insulation layer; the die is arranged on a surface of the insulation layer via the first adhesive layer; the insulation layer is provided with at least one slot; a position of the at least one slot corresponds to at least a part of an edge of the first adhesive layer; a second adhesive layer is arranged in the at least one slot; at least a part of a surface of the second adhesive layer is connected with the first adhesive layer; and an elasticity modulus of the second adhesive layer is smaller than an elasticity modulus of the first adhesive layer.

Disclosed are exemplary embodiments of compressible foamed thermal interface materials. Also disclosed are methods of making and using compressible foamed thermal interface materials.

A dicing die attach film, including an adhesive layer and a temporary-adhesive layer, the adhesive layer and the temporary-adhesive layer being laminated, wherein
the adhesive layer is a film-like adhesive layer containing an epoxy resin (A), an epoxy resin curing agent (B), a phenoxy resin (C), and an inorganic filler (D);
an elastic modulus of the phenoxy resin (C) at 25° C. is 500 MPa or more; in the adhesive layer, a proportion of the phenoxy resin (C) in total content of the epoxy resin (A) and the phenoxy resin (C) is 10 to 60% by mass;
a peeling strength between the adhesive layer and the temporary-adhesive layer at a range of 25 to 80° C. is 0.40 N/25 mm or less; and
a thermal conductivity of the adhesive layer after thermal curing is 1.0 W/m.Math.K or more.

Embodiments disclosed herein include electronic packages. In an embodiment, an electronic package comprises a package substrate, and a die coupled to the package substrate. In an embodiment, a stiffener is around the die and over the package substrate. In an embodiment, an electrically non-conductive underfill is around first level interconnects (FLIs) between the package substrate and the die. In an embodiment, an electrically conductive layer is around the non-conductive underfill.

A semiconductor package includes a first semiconductor chip including a first chip body portion and a first chip rear bump disposed in a region recessed into the first chip body portion, and a second semiconductor chip stacked on the first semiconductor chip and including a second chip body portion and a second chip front bump protruding from the second chip body portion. The first chip rear bump includes a lower metal layer and a solder layer disposed on the lower metal layer. The second chip front bump is bonded to the solder layer. The second chip front bump is disposed to cover at least the solder layer on a bonding surface of the second chip front bump and the solder layer.