Patent classifications
H01L2224/8313
Panel level packaging for devices
Panel level packaging (PLP) with high accuracy and high scalability is disclosed. The PLP employs an alignment carrier with a low coefficient of expansion which is configured with die regions having local die alignment marks. For example, local die alignment marks are provided for each die attach region. Depending on the size of the panel, it may be segmented into blocks, each with die regions with local die alignment marks. In addition, a block includes an alignment die region configured for attaching an alignment die. Linear and non-linear positional errors are reduced due to local die alignment marks and alignment dies. The use of local die alignment marks and alignment dies results in increase yields as well as scaling, thereby improving throughput and decreasing overall costs.
DIE-TO-WAFER BONDING UTILIZING MICRO-TRANSFER PRINTING
Described herein is a die-to-wafer bonding process that utilizes micro-transfer printing to transfer die from a source wafer onto an intermediate handle wafer. The resulting intermediate handle wafer structure can then be bonded die-down onto the target wafer, followed by removal of only the intermediate handle wafer, leaving the die in place bonded to the target wafer.
METHOD OF MANUFACTURING SUBSTRATE LAYERED BODY AND LAYERED BODY
A method of manufacturing a substrate layered body includes: a step of applying a bonding material to the surface of at least one of a first substrate or a second substrate; a step of curing the bonding material applied on the surface to form a bonding layer having a reduced modulus at 23° C. of 10 GPa or less; and a step of bonding the first substrate and the second substrate via the bonding layer formed.
Wafer level integration including design/co-design, structure process, equipment stress management and thermal management
A method of manufacturing a multi-layer wafer is provided. Under bump metallization (UMB) pads are created on each of two heterogeneous wafers. A conductive means is applied above the UMB pads on at least one of the two heterogeneous wafers. The two heterogeneous wafers are low temperature bonded to adhere the UMB pads together via the conductive means. At least one stress compensating polymer layer may be applied to at least one of two heterogeneous wafers. The stress compensating polymer layer has a polymer composition of a molecular weight polymethylmethacrylate polymer at a level of 10-50% with added liquid multifunctional acrylates forming the remaining 50-90% of the polymer composition.
PATTERNING A TRANSPARENT WAFER TO FORM AN ALIGNMENT MARK IN THE TRANSPARENT WAFER
In some embodiments, the present disclosure relates to an integrated chip that includes bonding structure arranged directly between a first substrate and a second substrate. The first substrate includes a first transparent material and a first alignment mark. The first alignment mark is arranged on an outer region of the first substrate and also includes the first transparent material. The first alignment mark is defined by surfaces of the first substrate that are arranged between an uppermost surface of the first substrate and a lowermost surface of the first substrate. The second substrate includes a second alignment mark on an outer region of the second substrate. The second alignment mark directly underlies the first alignment mark, and the bonding structure is arranged directly between the first alignment mark and the second alignment mark.
SUBSTRATE BONDING APPARATUS AND SUBSTRATE BONDING METHOD
The present invention relates to a substrate bonding apparatus including: a chamber; a first chuck disposed inside the chamber to adhere a first substrate; a second chuck disposed facingly inside the chamber toward the first chuck to adhere a second substrate; and a camera located above or under the first chuck and the second chuck to recognize first alignment key disposed on the first substrate and second alignment key disposed on the second substrate.
Techniques for bonding multiple semiconductor lasers
Embodiments of the present disclosure include method for sequentially mounting multiple semiconductor devices onto a substrate having a composite metal structure on both the semiconductor devices and the substrate for improved process tolerance and reduced device distances without thermal interference. The mounting process causes “selective” intermixing between the metal layers on the devices and the substrate and increases the melting point of the resulting alloy materials.
THREE DIMENSIONAL INTEGRATED SEMICONDUCTOR ARCHITECTURE AND METHOD OF MANUFACTURING THE SAME
Provided is a semiconductor architecture including a carrier substrate, alignment marks provided in the carrier substrate, the alignment marks being provided from a first surface of the carrier substrate to a second surface of the carrier substrate, a first semiconductor device provided on the first surface of the carrier substrate based on the alignment marks, a second semiconductor device provided on the second surface of the carrier substrate based on the alignment marks and aligned with the first semiconductor device.
DISPLAY DEVICE AND METHOD OF FABRICATING DISPLAY DEVICE
A display device includes a display panel, a first film attached to the display panel, an adhesive member interposed between the display panel and the first film and extending in a first direction to attach the display panel to the first film, a first test electrode covered by the adhesive member; a second test electrode covered by the adhesive member and spaced apart from the first test electrode in a second direction perpendicular to the first direction, and test lines comprising a first test line electrically connected to the first test electrode and a second test line electrically connected to the second test electrode, where the adhesive member is disposed between the first test electrode and the second test electrode in the second direction.
METHODS AND APPARATUS FOR USE IN THE SPATIAL REGISTRATION OF OBJECTS
A method for use in the spatial registration of first and second objects comprises fixing the first and second objects to the same motion control stage in an unknown spatial relationship, using an imaging system to acquire an image of the first object, determining a position and orientation of the first object in a frame of reference of the motion control stage based at least in part on the acquired image of the first object, using the imaging system to acquire an image of the second object, and determining a position and orientation of the second object in the frame of reference of the motion control stage based at least in part on the acquired image of the second object. The method may be used in the spatial registration of first and second objects and, in particular though not exclusively, for use in the spatial registration of optical or electronic components relative to one another, or for use in the alignment of a first object such as an optical or electronic component relative to a second object such as a feature, a structure, a target area or a target region defined on a substrate or a wafer.