Solder bumps are placed in direct contact with the silicon substrate of an amplifier integrated circuit having a flip chip configuration. A plurality of amplifier transistor arrays generate waste heat that promotes thermal run away of the amplifier if not directed out of the integrated circuit. The waste heat flows through the thermally conductive silicon substrate and out the solder bump to a heat-sinking plane of an interposer connected to the amplifier integrated circuit via the solder bumps.

A semiconductor device includes a semiconductor substrate, a transistor, and a first harmonic termination circuit. The transistor is formed at the semiconductor substrate. The transistor amplifies an input signal supplied to an input end and outputs an amplified signal through an output end. The first harmonic termination circuit attenuates a harmonic component included in the amplified signal. The first harmonic termination circuit is formed at the semiconductor substrate such that one end of the first harmonic termination circuit is connected to the output end of the transistor and the other end of the first harmonic termination circuit is connected to a ground end of the transistor.

A semiconductor device includes an IGBT as a switching element, and a diode. The IGBT includes: a p type channel doped layer formed in a surface layer part on a front side of a semiconductor substrate; a p.sup.+ type diffusion layer and an n.sup.+ type source layer individually selectively formed in a surface layer part of the p type channel doped layer; and an emitter electrode connected to the n.sup.+ type source layer and the p.sup.+ type diffusion layer. A part of the p type channel doped layer reaches a front-side surface of the semiconductor substrate and is connected to the emitter electrode. On the front-side surface of the semiconductor substrate, the p.sup.+ type diffusion layer is interposed between the p type channel doped layer and an n.sup.+ type source layer, and the p type channel doped layer and the n.sup.+ type source layer are not adjacent to each other.

An embodiment of a semiconductor device includes a plurality of transistor sections separated from each other and a plurality of diode sections separated from each other. Each transistor section includes an emitter electrode and a collector electrode. Each diode section includes an anode electrode and a cathode electrode. Each transistor section is electrically coupled to a common gate pad. A ratio between an active transistor part and an active diode part of the semiconductor device is adjustable by activating a first number of the transistor sections by selectively contacting the emitter electrodes and the collector electrodes of the first number of transistor sections, and by activating a second number of the diode sections by selectively contacting the anode electrodes and the cathode electrodes of the second number of diode sections.

The present disclosure relates to semiconductor structures and, more particularly, to heterojunction bipolar transistors (HBTs) with a buried trap rich isolation region and methods of manufacture. The structure includes: a first heterojunction bipolar transistor; a second heterojunction bipolar transistor; and a trap rich isolation region embedded within a substrate underneath both the first heterojunction bipolar transistor and the second heterojunction bipolar transistor.

A diode linearizer according to the present invention has parallelly mounting linearizer core units on a RF signal path via capacitors between the RF signal path and a ground, thus does not need a switch using an FET, for example, at a time of selectively operating a plurality of linearizer core units. Moreover, the diode linearizer does not need a capacitor in series for blocking a direct current between RF signal input and output terminals. Thus, a range of a gain which can be compensated by the diode linearizer can be increased. Furthermore, an insertion loss of the RF signal path in a state where the diode linearizer is off can be reduced, and a range of a gain expansion in operation can be increased. The switch is not used, or the number of elements of the capacitors which are needed is small, thus a circuit size is also small.

Solder bumps are placed in direct contact with the silicon substrate of an amplifier integrated circuit having a flip chip configuration. A plurality of amplifier transistor arrays generate waste heat that promotes thermal run away of the amplifier if not directed out of the integrated circuit. The waste heat flows through the thermally conductive silicon substrate and out the solder bump to a heat-sinking plane of an interposer connected to the amplifier integrated circuit via the solder bumps.

A main Insulated Gate Bipolar Transistor (IGBT) and a sense IGBT may have a sense resistor connected between a sense emitter of the sense IGBT and a main emitter of the main IGBT. Back-to-back Zener diodes may be connected between a sense gate of the sense IGBT and the sense emitter, and configured to clamp a voltage between the sense gate and the sense emitter during an electrostatic discharge (ESD) event.

A semiconductor device includes a semiconductor substrate including a principal surface parallel to a plane defined by a first direction and a second direction substantially orthogonal to the first direction, and the principal surface having a first side parallel to the first direction; first unit transistors, each amplifying a first signal in a first frequency band to output a second signal; and second unit transistors, each amplifying the second signal to output a third signal and aligned in the second direction between the first side and a substrate center line in the first direction in plan view of the principal surface. A first center line in the first direction of a region in which the first unit transistors are aligned is farther from the first side than a second center line in the first direction of a region in which the second unit transistors are aligned.

A semiconductor device includes a semiconductor substrate, a transistor, and a first harmonic termination circuit. The transistor is formed at the semiconductor substrate. The transistor amplifies an input signal supplied to an input end and outputs an amplified signal through an output end. The first harmonic termination circuit attenuates a harmonic component included in the amplified signal. The first harmonic termination circuit is formed at the semiconductor substrate such that one end of the first harmonic termination circuit is connected to the output end of the transistor and the other end of the first harmonic termination circuit is connected to a ground end of the transistor.