According to one embodiment, a semiconductor device includes a semiconductor member, a gate electrode, a source electrode, a drain electrode, a conductive member, a gate terminal, and a first circuit. The semiconductor member includes a first semiconductor layer including a first partial region and including Al.sub.x1Ga.sub.1x1N (0x11), and a second semiconductor layer including Al.sub.x2Ga.sub.1x2N (0<x21 and x1<x2). The first partial region is between the gate electrode and at least a portion of the conductive member in a first direction. The gate terminal is electrically connected to the gate electrode. The first circuit is configured to apply a first voltage to the conductive member based on a gate voltage applied to the gate terminal. The first voltage has a reverse polarity of a polarity of the gate voltage.

According to an embodiment, a semiconductor device includes a first electrically conductive portion, a first semiconductor chip of a reverse-conducting insulated gate bipolar transistor, a second electrically conductive portion, a third electrically conductive portion, a second semiconductor chip of an insulated gate bipolar transistor, and a fourth electrically conductive portion. The first semiconductor chip includes a first electrode and a second electrode. The first electrode is electrically connected to the first electrically conductive portion. The second electrically conductive portion is electrically connected to the second electrode. The third electrically conductive portion is electrically connected to the first electrically conductive portion. The second semiconductor chip includes a third electrode and a fourth electrode. The third electrode is electrically connected to the third electrically conductive portion. The fourth electrically conductive portion is electrically connected to the fourth electrode and the second electrically conductive portion.

A semiconductor device contains a Zener-triggered transistor having a Zener diode vertically integrated in a first current node of the Zener-triggered transistor. The first current node includes an n-type semiconductor material contacting a p-type semiconductor material in a substrate. The Zener diode includes an n-type cathode contacting the first current node, and a p-type anode contacting the n-type cathode and contacting the p-type semiconductor material. The semiconductor device may be formed using an implant mask, with an opening for the Zener diode. Boron and arsenic are implanted into the substrate in an area exposed by the opening in the implant mask. The substrate is subsequently heated to diffuse and activate the implanted boron and arsenic. The Zener-triggered transistor may be used in an ESD circuit or a snubber circuit.

Examples relate generally to the field of semiconductor memory devices. In an example, a memory cell may include an access device coupled to an access line and a gated diode coupled to the access device. The gated diode may include a gate stack structure that includes a direct tunneling material, a trapping material, and a blocking material.

A semiconductor device according to the present invention includes a semiconductor layer of SiC of a first conductivity type, a plurality of body regions of a second conductivity type formed in the surface portion of the semiconductor layer with each body region forming a unit cell, a source region of the first conductivity type formed in the inner portion of the body region, a gate electrode facing the body region across a gate insulating film, a drain region of the first conductivity type and a collector region of the second conductivity type formed in the rear surface portion of the semiconductor layer such that the drain region and the collector region adjoin each other, and a drift region between the body region and the drain region, wherein the collector region is formed such that the collector region covers a region including at least two unit cells in the x-axis direction along the surface of the semiconductor layer.

A metal-oxide semiconductor field effect transistor (MOSFET) includes a source region and a drain region of a first conductivity type. The MOSFET additionally include a body region of a second conductivity type, where the body region underlies at least a portion of the source region and the drain region. The MOSFET further includes a buried region of the first conductivity type, where the buried region is disposed between the body region and a substrate, where the buried region is configured to reduce a capacitance between the source region and the drain region in response to an indicated voltage applied between the body region and the buried region.

Provided is a semiconductor module comprising: a semiconductor chip; a cooling portion having a refrigerant passing portion through which a refrigerant passes; and a laminated substrate having: a first metal interconnection layer; a second metal interconnection layer; and an insulation provided between the first metal interconnection layer and the second metal interconnection layer, wherein the cooling portion has: a top plate; a bottom plate; and a plurality of protruding parts which are provided on a surface of the bottom plate, and are separated from each other in a flow direction of the refrigerant, and are respectively provided continuously in a direction orthogonal to the flow direction, wherein the plurality of protruding parts are provided at a position overlapping with one end of the second metal interconnection layer and at a position overlapping with the semiconductor chip in the flow direction.

Provided is a power semiconductor device including a signal terminal and a power semiconductor element. The power semiconductor element is arranged on a substrate. The signal terminal includes a main body portion and a joint portion, and a part of the signal terminal is held by a terminal block. The joint portion includes a distal end portion and a base portion. The distal end portion includes a pad portion that is exposed from the terminal block and connected to a signal line. The base portion includes a thin portion in which a thickness in a vertical direction is set to be smaller than that of the pad portion. The thin portion has an upper surface that is formed at a position lower than an upper surface of the pad portion and is covered with a resin material forming the terminal block.

A semiconductor module includes a plurality of semiconductor elements, a sealing resin body, a positive electrode side terminal, a negative electrode side terminal, and an output terminal. The positive electrode side terminal, the negative electrode side terminal, and the output terminal are each connected to any of the semiconductor elements, and project from a same surface of the sealing resin body. Projecting portions of the positive electrode side terminal, the negative electrode side terminal, and the output terminal are arranged next to each other in an arrangement direction so that the projecting portion of the output terminal is located at an end.

In order to provide a feature for processing an image of an object being photographed using photographic data having better quality, an image analyzer 1 is provided with a selection unit 104 and a bandwidth control request unit 105. The selection unit 104 selects a second photographing device associated with a first photographing device from among a plurality of photographing devices. The bandwidth control request unit 105 transmits, to a network control device, a request for change of the transmission data amount transmittable by the second photographing device.