A method of manufacturing a parallel structure of semiconductor devices includes: disposing a semiconductor stack, which includes source/drain layers disposed vertically in sequence and channel layers therebetween, on a substrate; patterning the semiconductor stack into a predetermined shape to define an active region; forming gate stacks around at least part of peripheries of the channel layers; forming an isolation layer on peripheries of the active region and the gate stack; forming first to third conductive channels on a sidewall of the isolation layer; determining the pre-determined shape and a shape of the gate stacks, such that one of the source/drain layers on two sides of the channel layer passes through the isolation layer to contact the first conductive channel, while the other one passes through the isolation layer to contact the second conductive channel, and the gate stack passes through the isolation layer to contact the third conductive channel.

An exemplary device includes a channel layer, a first epitaxial source/drain feature, and a second epitaxial source/drain feature disposed over a substrate. The channel layer is disposed between the first epitaxial source/drain feature and the second epitaxial source/drain feature. A metal gate is disposed between the first epitaxial source/drain feature and the second epitaxial source/drain feature. The metal gate is disposed over and physically contacts at least two sides of the channel layer. A source/drain contact is disposed over the first epitaxial source/drain feature. A doped crystalline semiconductor layer, such as a gallium-doped crystalline germanium layer, is disposed between the first epitaxial source/drain feature and the source/drain contact. The doped crystalline semiconductor layer is disposed over and physically contacts at least two sides of the first epitaxial source/drain feature. In some embodiments, the doped crystalline semiconductor layer has a contact resistivity that is less than about 1×10.sup.−9 Ω-cm.sup.2.

Disclosed is technology that is driven using a positive feedback loop of a feedback field-effect transistor and is capable of performing a logic-in memory function. The logic-in-memory inverter includes a metal oxide semiconductor field-effect transistor, and a feedback field-effect transistor in which a drain region of a nanostructure is connected in series to a drain region of the metal oxide semiconductor field-effect transistor, wherein the logic-in-memory inverter performs a logical operation is performed based on an output voltage V.sub.OUT that changes depending on a level of an input voltage V.sub.IN that is input to a gate electrode of the feedback field-effect transistor and a gate electrode of the metal oxide semiconductor field-effect transistor while a source voltage V.sub.SS is input to a source region of the nanostructure and a drain voltage V.sub.DD is input to a source region of the metal oxide semiconductor field-effect transistor.

Provided are an inverter including a first source and drain, an interlayer insulating film on the first source, a second source on the interlayer insulating film, a second drain on the first drain, a first channel between the first source and drain, a second channel over the first channel between the second source and drain, a gate insulating film covering outer surfaces of the first and second channel, a part of a surface of the first source in the direction to the first drain, a part of a surface of the second source in the direction to the second drain, a part of a surface of the first drain in the direction to the first source, and a part of a surface of the second drain in the direction to the second source, and a gate electrode between the first source and drain and between the second source and drain.

A tunnel field effect transistor includes a source region and a drain region, positioned on a substrate, a channel region positioned between the source region and the drain region and having a first length in a first direction, a gate electrode positioned on the channel region, and a gate insulating layer positioned between the channel region and the gate electrode, wherein the source region is doped with impurities of a first conductivity type and the drain region is doped with impurities of a second conductivity type that is different from the first conductivity type, and one of the source region and the drain region includes an extension region extending toward the other region, the extension region being positioned under the channel region to form a constant current independent of a gate voltage of the gate electrode.

A trench in a semiconductor substrate is lined with a first insulation layer. A hard mask layer deposited on the first insulation layer is used to control performance of an etch that selectively removes a first portion of the first insulating layer from an upper trench portion while leaving a second portion of first insulating layer in a lower trench portion. After removing the hard mask layer, an upper portion of the trench is lined with a second insulation layer. An opening in the trench that includes a lower open portion delimited by the second portion of first insulating layer in the lower trench portion and an upper open portion delimited by the second insulation layer at the upper trench portion, is then filled by a single deposition of polysilicon material forming a unitary gate/field plate conductor of a field effect rectifier diode.

A field effect transistor (FET), a method of fabricating a field effect transistor, and an electronic device, the field effect transistor comprises: a source and a drain, the source being made of a first graphene film; a channel disposed between the source and the drain, and comprising a laminate of a second graphene film and a material layer having semiconductor properties, the second graphene film being formed of bilayer graphene; and a gate disposed on the laminate and electrically insulated from the laminate.

A substrate has an active area including first and second doped regions separated by portions of the substrate. Gates are located over the active area, each gate formed extending over a portion of the substrate separating adjacent first and second doped regions. A length of the doped regions is greater than other devices within the substrate that have a same gate oxide thickness. A first metallization layer has first electrical connectors between each of the first doped regions and a gate immediately adjacent thereto, and second electrical connectors connected to each of the second doped regions. A second metallization layer has a first electrical connector connected to each first electrical connector of the first metallization layer, and a second electrical connector connected to each second electrical connector of the first metallization layer, with the second electrical connector of the second metallization layer not overlapping the gates.

A tunneling transistor is implemented in silicon, using a FinFET device architecture. The tunneling FinFET has a non-planar, vertical, structure that extends out from the surface of a doped drain formed in a silicon substrate. The vertical structure includes a lightly doped fin defined by a subtractive etch process, and a heavily-doped source formed on top of the fin by epitaxial growth. The drain and channel have similar polarity, which is opposite that of the source. A gate abuts the channel region, capacitively controlling current flow through the channel from opposite sides. Source, drain, and gate terminals are all electrically accessible via front side contacts formed after completion of the device. Fabrication of the tunneling FinFET is compatible with conventional CMOS manufacturing processes, including replacement metal gate and self-aligned contact processes. Low-power operation allows the tunneling FinFET to provide a high current density compared with conventional planar devices.

The present description relates to the fabrication of microelectronic transistor source and/or drain regions using angled etching. In one embodiment, a microelectronic transistor may be formed by using an angled etch to reduce the number masking steps required to form p-type doped regions and n-type doped regions. In further embodiments, angled etching may be used to form asymmetric spacers on opposing sides of a transistor gate, wherein the asymmetric spacers may result in asymmetric source/drain configurations.