A semiconductor device includes: three or more transistors, which are formed on a semiconductor substrate and arranged in one direction; and a PN junction diode, which is formed in a part of a region between the transistors, wherein each of the transistors includes: a trench: a conductive region; and an insulating film, wherein a first thickness of a first insulating film is a thickness between an end portion of a first conductive region on a bottom surface side of the first trench and a bottom surface of the first trench, wherein a second thickness of a second insulating film is a thickness between an end portion of a second conductive region on a bottom surface side of the second trench and a bottom surface of the second trench and wherein the first thickness is thicker than the second thickness.

Semiconductor devices and methods of forming the same include forming vertical semiconductor channels on a bottom source/drain layer in a first-type region and a second-type region. A gate dielectric layer is formed on sidewalls of the vertical semiconductor channels. A first-type work function layer is formed in the first-type region. A second-type work function layer is formed in both the first-type region and the second-type region. A thickness matching layer is formed in the second-type region such that a stack of layers in the first-type region has a same thickness as a stack of layers in the second-type region. Top source/drain regions are formed on a top portion of the vertical channels.

Methods of forming semiconductor devices include forming vertical semiconductor channels on a bottom source/drain layer in a first-type region and a second-type region. A gate dielectric layer is formed on sidewalls of the vertical semiconductor channels. A first-type work function layer is formed in the first-type region. A second-type work function layer is formed in both the first-type region and the second-type region. A thickness matching layer is formed in the second-type region such that a stack of layers in the first-type region has a same thickness as a stack of layers in the second-type region. Top source/drain regions are formed on a top portion of the vertical channels.

A circuit element is formed on a substrate made of a compound semiconductor. A bonding pad is disposed on the circuit element so as to at least partially overlap the circuit element. The bonding pad includes a first metal film and a second metal film formed on the first metal film. A metal material of the second metal film has a higher Young's modulus than a metal material of the first metal film.

Semiconductor devices and methods of forming the same include forming vertical semiconductor channels on a bottom source/drain layer in a first-type region and a second-type region. A gate dielectric layer is formed on sidewalls of the vertical semiconductor channels. A first-type work function layer is formed in the first-type region. A second-type work function layer is formed in both the first-type region and the second-type region. A thickness matching layer is formed in the second-type region such that a stack of layers in the first-type region has a same thickness as a stack of layers in the second-type region. Top source/drain regions are formed on a top portion of the vertical channels.

A biased-transistor-module comprising: a module-input-terminal; a module-output-terminal; a reference-terminal; a module-supply-terminal configured to receive a supply voltage; a module-reference-voltage-terminal configured to receive a module reference voltage; a main-transistor having a main-control-terminal, a main-first-conduction-channel-terminal and a main-second-conduction-channel-terminal, wherein the main-first-conduction-channel-terminal is connected to the module-output-terminal, and the main-second-conduction-channel-terminal is connected to the reference-terminal, and the main-control-terminal is connected to an input-signal-node, wherein the input-signal-node is connected to the module-input-terminal; and a bias-circuit. The bias-circuit comprises: a first-bias-transistor; a first-bias-resistor; a second-bias-transistor; and a second-bias-resistor.

A semiconductor device comprises a vertical power device, such as a superjunction MOSFET, an IGBT, a diode, and the like, and a surface device that comprises one or more lateral devices that are electrically active along a top surface of the semiconductor device.