An embodiment relates to a device having a SiC substrate, a well region, a source region, and a first sinker region, wherein the first sinker region has a depth that is equal to or greater than a depth of the well region, the source region is within the well region, the first sinker region is within the source region, and the first sinker region is located between a source interconnect metallization region and the SiC substrate. Another embodiment relates to a device having a SiC substrate, a drift layer on the SiC substrate, a well region on the drift layer, a source region within the well region, and a plug within the well region.

An embodiment relates to a device comprising a first section and a second section. The first section comprises a first metal oxide semiconductor (MOS) interface comprising a first portion and a second portion. The first portion comprises a first contact with a horizontal surface of a semiconductor substrate and the second portion comprises a second contact with a trench sidewall of a trench region of the semiconductor substrate. The second section comprises one of a second metal oxide semiconductor (MOS) interface and a metal region. The second MOS interface comprises a third contact with the trench sidewall of the trench region. The metal region comprises a fourth contact with a first conductivity type drift layer. The first section and the second section are located contiguously within the device along a lateral direction.

An improved inverted field-effect-transistor semiconductor device and method of making thereof may comprise a source layer on a bottom and a drain disposed on a top of a semiconductor substrate and a vertical current conducting channel between the source layer and the drain controlled by a trench gate electrode disposed in a gate trench lined with an insulating material. A heavily doped drain region is disposed near the top of the substrate surrounding an upper portion of a shield trench and the gate trench. A doped body contact region is disposed in the substrate and surrounding a lower portion of the shield trench. A shield electrode extends upward from the source layer in the shield trench for electrically shorting the source layer and the body region wherein the shield structure extends upward to a heavily doped drain region and is insulated from the heavily doped drain region to act as a shield electrode.

A transistor device comprises at least one gate electrode, a gate runner connected to the at least one gate electrode and arranged on top of a semiconductor body, a plurality of gate pads arranged on top of the semiconductor body, and a plurality of resistor arrangements. Each gate pad is electrically connected to the gate runner via a respective one of the plurality of resistor arrangements, and each of the resistor arrangements has an electrical resistance, wherein the resistances of the plurality of resistor arrangements are different.

An embodiment relates to a device having a SiC substrate, a well region, a source region, and a first sinker region, wherein the first sinker region has a depth that is equal to or greater than a depth of the well region, the source region is within the well region, the first sinker region is within the source region, and the first sinker region is located between a source interconnect metallization region and the SiC substrate. Another embodiment relates to a device having a SiC substrate, a drift layer on the SiC substrate, a well region on the drift layer, a source region within the well region, and a plug within the well region.

A vertical MOSFET having a trench gate structure includes an n.sup.-type drift layer and a p-type base layer formed by epitaxial growth. In the n.sup.-type drift layer, an n-type region, a first p.sup.+-type region, and a second p.sup.+-type region are provided. A metal film of a trench SBD is connected to a source electrode; and a p.sup.+-type region is provided between the source electrode and the p-type base layer.

The power device is formed by a D-mode HEMT and by a MOSFET in cascade to each other and integrated in a chip having a base body and a heterostructure layer on the base body. The D-mode HEMT includes a channel area formed in the heterostructure layer; the MOSFET includes a first and a second conduction region formed in the base body, and an insulated-gate region formed in the heterostructure layer, laterally and electrically insulated from the D-mode HEMT. A first metal region extends through the heterostructure layer, laterally to the channel area and in electrical contact with the channel area and the first conduction region.

A silicon carbide (SiC) semiconductor device may include a CB layer defined in a first epitaxial (epi) layer having a first conductivity type. The CB layer may include a plurality of CB regions having a second conductivity type. The SiC semiconductor device may further include a device epi layer having the first conductivity type disposed on the CB layer. The device epi layer may include a plurality of regions having the second conductivity type. Additionally, the SiC semiconductor device may include an ohmic contact disposed on the device epi layer and a rectifying contact disposed on the device epi layer. A field-effect transistor (FET) of the device may include the ohmic contact, and a diode of the device may include the rectifying contact, where the diode and the FET are integrated in the device.

In an embodiment, a semiconductor device is provided that includes a semiconductor body having a first conductivity type, a first major surface and a second major surface opposite the first major surface, a gate arranged on the first major surface, a body region having a second conductivity type opposite the first conductivity type, the body region extending into the semiconductor body from the first major surface, a source region having the first conductivity type, the source region being arranged in the body region, a buried channel shielding region having the second conductivity type, a contact region having the second conductivity type, and a field plate arranged in a trench extending into the semiconductor body from the first major surface.

A vertical isolated gate FET transistor integrated in the front end of line of a semiconductor chip is disclosed. In one aspect, the transistor includes a modified version of a buried power rail and back side TSV (through semiconductor via) connection for connecting the front end of line to a back side signal delivery network, such as a power delivery network (PDN), the PDN being arranged on the backside of the semiconductor substrate that carries the active devices of the FEOL on its front side. In contrast to standard power rail/TSV combinations, the TSV is not electrically connected to the rail, but isolated therefrom by a dielectric plug at the bottom of the rail. The TSV is isolated from the semiconductor substrate by a dielectric liner. Well regions are furthermore provided on the front side, enveloping the rail and the dielectric plug, and on the backside, surrounding the TSV and liner. On the back side, the well includes a contact area adjacent the TSV. The TSV thereby acts as the gate of the transistor, while the rail and the contact area respectively act as source and drain or vice versa.