Patent classifications
H
H01
H01L
29/00
H01L29/66
H01L29/66007
H01L29/66075
H01L29/66227
H01L29/66409
H01L29/66848
H01L29/66856
H01L29/66863
H01L29/66878
H01L29/66878
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
A substrate (1) having a GaN surface (2) is immersed in a catalyst metal solution (4) containing potassium hydroxide and a plating catalyst metal salt while being irradiated with ultraviolet light to deposit a catalyst metal (5) on the GaN surface (2). A metal film (7) is formed on the GaN surface (2) having the catalyst metal (5) deposited thereon by electroless plating.