H01L29/66878

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

A substrate (1) having a GaN surface (2) is immersed in a catalyst metal solution (4) containing potassium hydroxide and a plating catalyst metal salt while being irradiated with ultraviolet light to deposit a catalyst metal (5) on the GaN surface (2). A metal film (7) is formed on the GaN surface (2) having the catalyst metal (5) deposited thereon by electroless plating.