A method includes providing a structure including a carrier wafer, and a first device wafer with an adhesion layer between the carrier wafer and the first device wafer; and forming a plurality of first ablation structures in the structure, each of the plurality of first ablation structures extending through the first device wafer, the adhesion layer and a portion of the carrier wafer. Each of the plurality of first ablation structures has a portion inside the carrier wafer with a depth no greater than one half of a thickness of the carrier wafer. The first device wafer includes a plurality of first dies, each pair of adjacent first dies being separated by one of the plurality of first ablation structures. The plurality of first ablation structures are formed by either laser grooving or mechanical sawing.

A semiconductor storage device includes first and second chips and first and second power supply electrodes. The first chip includes conductive layers arranged in a first direction, a semiconductor pillar extending in the first direction and facing the conductive layers, first contacts extending in the first direction and connected to the conductive layers, second contacts extending in the first direction and connected to a first power supply electrode, third contacts extending in the first direction, facing the second contacts in a direction crossing the first direction, and connected to the second power supply electrode, and first bonding electrodes connected to the first contacts. The second chip includes a semiconductor substrate, transistors provided on the semiconductor substrate, fourth contacts connected to the transistors, and second bonding electrodes connected to the fourth contacts. The first and second chips are bonded together so that respective first and second bonding electrodes are connected together.

In a TSC structure, a first dielectric layer is formed over a first main surface of a substrate. A TSC is formed in the first dielectric layer and the substrate so that the TSC passes through the first dielectric layer and extends into the substrate. A conductive plate is formed over the first dielectric layer and electrically coupled with the TSC. A second dielectric layer is formed on an opposing second main surface of the substrate. A first via is formed in the second dielectric layer, and a first end of the first via extends into the substrate to be in contact with the TSC. A second via is formed in the second dielectric layer and a first end of the second via extends into the substrate. A metal line is formed over the second dielectric layer so as to be coupled to the first via and the second via.

In a TSC structure, a first dielectric layer is formed over a first main surface of a substrate. A TSC is formed in the first dielectric layer and the substrate so that the TSC passes through the first dielectric layer and extends into the substrate. A conductive plate is formed over the first dielectric layer and electrically coupled with the TSC. A second dielectric layer is formed on an opposing second main surface of the substrate. A first via is formed in the second dielectric layer, and a first end of the first via extends into the substrate to be in contact with the TSC. A second via is formed in the second dielectric layer and a first end of the second via extends into the substrate. A metal line is formed over the second dielectric layer so as to be coupled to the first via and the second via.

A device is disclosed which includes, in one illustrative example, an integrated circuit die having an active surface and a molded body extending around a perimeter of the die, the molded body having lips that are positioned above a portion of the active surface of the die. Another illustrative example includes an integrated circuit die having an active surface, a molded body extending around a perimeter of the die and a CTE buffer material formed around at least a portion of the perimeter of the die adjacent the active surface of the die, wherein the CTE buffer material is positioned between a portion of the die and a portion of the molded body and wherein the CTE buffer material has a coefficient of thermal expansion that is intermediate a coefficient of thermal expansion for the die and a coefficient of thermal expansion for the molded body.

A device is disclosed which includes, in one illustrative example, an integrated circuit die having an active surface and a molded body extending around a perimeter of the die, the molded body having lips that are positioned above a portion of the active surface of the die. Another illustrative example includes an integrated circuit die having an active surface, a molded body extending around a perimeter of the die and a CTE buffer material formed around at least a portion of the perimeter of the die adjacent the active surface of the die, wherein the CTE buffer material is positioned between a portion of the die and a portion of the molded body and wherein the CTE buffer material has a coefficient of thermal expansion that is intermediate a coefficient of thermal expansion for the die and a coefficient of thermal expansion for the molded body.

An integrated circuit (IC) comprising an enhanced passivation scheme for pad openings and trenches is provided. In some embodiments, an interlayer dielectric (ILD) layer covers a substrate and at least partially defines a trench. The trench extends through the ILD layer from a top of the ILD layer to the substrate. A conductive pad overlies the ILD layer. A first passivation layer overlies the ILD layer and the conductive pad, and further defines a pad opening overlying the conductive pad. A second passivation layer overlies the ILD layer, the conductive pad, and the first passivation layer, and further lines sidewalls of the first passivation layer in the pad opening and sidewalls of the ILD layer in the trench. Further, the second passivation layer has a low permeability for moisture or vapor relative to the ILD layer.

An integrated circuit (IC) comprising an enhanced passivation scheme for pad openings and trenches is provided. In some embodiments, an interlayer dielectric (ILD) layer covers a substrate and at least partially defines a trench. The trench extends through the ILD layer from a top of the ILD layer to the substrate. A conductive pad overlies the ILD layer. A first passivation layer overlies the ILD layer and the conductive pad, and further defines a pad opening overlying the conductive pad. A second passivation layer overlies the ILD layer, the conductive pad, and the first passivation layer, and further lines sidewalls of the first passivation layer in the pad opening and sidewalls of the ILD layer in the trench. Further, the second passivation layer has a low permeability for moisture or vapor relative to the ILD layer.

A semiconductor chip includes a front surface and a back surface, a source pad, a drain pad and a gate pad on the front surface; a die pad under the semiconductor chip and bonded to the semiconductor chip; a source lead, electrically connected to the die pad; a drain lead and a gate lead, disposed on a periphery of the die pad; and a sealing resin. A plurality of vias for external connection are formed to connect to the source pad. A first subset of the plurality of vias for external connection is disposed along a first side of the source pad, and a second subset of the plurality of vias for external connection is disposed along a second side of the source pad, wherein the first and second sides are arranged adjacent to each other to form a first edge of the source pad.

A semiconductor chip includes a front surface and a back surface, a source pad, a drain pad and a gate pad on the front surface; a die pad under the semiconductor chip and bonded to the semiconductor chip; a source lead, electrically connected to the die pad; a drain lead and a gate lead, disposed on a periphery of the die pad; and a sealing resin. A plurality of vias for external connection are formed to connect to the source pad. A first subset of the plurality of vias for external connection is disposed along a first side of the source pad, and a second subset of the plurality of vias for external connection is disposed along a second side of the source pad, wherein the first and second sides are arranged adjacent to each other to form a first edge of the source pad.