An animal water container has a container with an inlet opening and an outlet opening in which the inlet opening is positioned below the outlet opening, a water hose connected to the inlet opening and adapted to pass fresh water into an interior of the container, and a nozzle affixed to the inlet opening. The nozzle is positioned adjacent the bottom of the container. The nozzle is adapted to direct an unobstructed pressurized flow of water toward the bottom of the container so as to pressure wash, clean and remove debris from the interior of the container. The outlet opening is adapted to allow water from the interior of the container to be released outwardly of the container.

A vehicle mounted garbage bin cleaning system including power takeoff includes a pair of arms configured for lifting a garbage bin, the pair of arms rotatably coupled to a mount on the vehicle, a hopper configured for accepting the garbage bin when the pair of arms lifts the garbage bin into the hopper, at least one spray rod extending upwards from the hopper, said spray rod including a water nozzle, wherein when the pair of arms lifts the garbage bin into the hopper, the spray rod is situated within the garbage bin, a hydraulic pump mechanically coupled with a transmission of the vehicle, such that the transmission drives the hydraulic pump, a pressure washer pump mechanically coupled to the hydraulic pump, the spray rod is fluidically coupled with the pressure washer pump.

Methods of semiconductor processing may include performing a process on a semiconductor substrate. The semiconductor substrate may be seated on a substrate support positioned within a processing region of a semiconductor processing chamber. The methods may include flowing a first backside gas through the substrate support at a first flow rate. The methods may include removing the semiconductor substrate from the processing region of the semiconductor processing chamber. The methods may include performing a plasma cleaning operation within the processing region of the semiconductor processing chamber. The methods may include flowing a second backside gas through the substrate support at a second flow rate. At least a portion of the second backside gas may flow into the processing region through accesses in the substrate support.

An inverting and cleaning device includes a positioning mechanism, an inverting mechanism, and a cleaning mechanism. The positioning mechanism is adapted to move a drum to a first position. The inverting mechanism includes a holding member. When the drum is located at the first position, the holding member clamps a drum body of the drum and inverts the drum to a second position where an opening on a top of the drum faces downward. The cleaning mechanism includes a cleaning tool. When the drum is located at the second position, the cleaning tool enters the drum through the opening of the drum for cleaning an inside of the drum.

In one example there is disclosed, an apparatus (10) for vacuum cleaning a tank (11). The apparatus (10) includes a main body (12) coupled to a working arm (14) and a plurality of support legs (16) coupled to the main body (12). The main body (12) includes a main conduit (40) extending lengthwise therethrough and a common central actuator (32) fitted about by the main conduit (40). The working arm (14) includes a vacuum conduit (50) in fluid communication with the main conduit (40). The plurality of support legs (16) are operatively coupled to the common central actuator (32) so as to be simultaneously moveable at least between a collapsed condition so as to fit through an opening 18 of the tank 11, and an extended condition in which the plurality of support legs (16) are moved relatively outwardly so as to be telescopically extendable within the tank (11) to engage a side wall (20) of the tank to support the main body (12). Other examples of the apparatus, a system and related methods are also disclosed.

The present application discloses a method for purge clean of a low pressure furnace, comprising: step 1, providing a process chamber of the low pressure furnace in a standby state, wherein an inner wall thin film formed by a furnace deposition process is accumulated on the surface of an inner wall of the process chamber; step 2, performing temperature ramp-up or temperature ramp-down treatment on the process chamber to generate first thermal stress in the inner wall thin film, wherein thin film particles with poor adhesion in the inner wall thin film peels off; step 3, introducing a cleaning gas in a pulse manner to perform cycle purge clean on the process chamber, so as to remove the peeling thin film particles from the process chamber; and step 4, switching a state of the process chamber to the standby state after the cycle purge clean ends.

An automated refurbishment system for cleaning and testing recycled child-safe containers. The system takes in durable, child-safe container bodies and caps after usage, washes the container parts reduce an amount of contaminants, and then dries the washed parts. The system then assembles the child-safe container bodies to caps, and tests the assembled child-safe containers, to assess the functionality of the child-safe features. The clean and tested refurbished child-safe containers can then be reused to dispense controlled substances (e.g., pharmaceuticals). Specific modules of the system can be interchanged to allow compatibility with different styles and designs of child-safe containers. The refurbishment system facilitates the recycling and reuse of durable, child-safe containers as an alternative to the current practice of using single-use, disposable plastic child-safe containers to dispense prescription pills and other controlled substances.

The present disclosure provides a method for cleaning a vacuum system used in the manufacture of OLED devices. The method includes performing pre-cleaning for cleaning at least a portion of the vacuum system, and performing plasma cleaning using a remote plasma source.

A washing device for washing objects for stalling animals includes: a rod extending along a main axis and connectable to a source of pressurized washing fluid; a fluid conveying device connected to the source and associated with the rod; nozzles for emitting jets of the fluid, the nozzles being connected to the device and supported by the rod; a translation mechanism for translating the rod along a stroke extending along a translation axis transversal to the main axis, and a rotation mechanism for alternately rotating the rod about a rotation axis parallel to the main axis. The translation and rotation mechanisms are selectively operable for moving the rod inside an operating plane defined by the main axis and by the translation axis to direct the jets against the surfaces to be washed.

A method for operating a food processing device includes an irradiation step. The food processing device includes a reaction vessel and a catalyst reactor. The reaction vessel receives a mixture in a liquid form including a raw material for a food product and water. The catalyst reactor is disposed in the reaction vessel. The catalyst reactor includes a reaction tube and a light source disposed in the reaction tube. The reaction tube has an outer surface on which a photocatalyst is provided, and transmits light emitted from the light source. The method for operating the food processing device includes the irradiation step of performing irradiation with light from the light source while water is in contact with the outer surface of the reaction tube in a period after a reaction product is removed from the reaction vessel and before a raw material is subsequently introduced into the reaction vessel.