A paint brush cleaning system includes a housing and a paint brush cleaner attached to the housing. The housing contains solvent that helps clean a paint brush. The paint brush cleaner rotates a wire brush against the bristles of the paint brush and actuates a pump to eject solvent drawn from the housing as the paint brush is moved in translation. The wire brush is coupled to a retractable cord, which rotates the wire brush. A holder is simultaneously coupled to the retractable cord and the pump. When force is exerted on the holder, the retractable cord rotates the wire brush and the pump ejects solvent. A user can insert a paint brush handle through the holder, thus actuating the pump and rotating the wire brush by applying force to the handle. The housing attaches to a user's belt, providing easy access to the paint brush cleaning system.

A paint brush cleaning system includes a housing and a paint brush cleaner attached to the housing. The housing contains solvent that helps clean a paint brush. The paint brush cleaner rotates a wire brush against the bristles of the paint brush and actuates a pump to eject solvent drawn from the housing as the paint brush is moved in translation. The wire brush is coupled to a retractable cord, which rotates the wire brush. A holder is simultaneously coupled to the retractable cord and the pump. When force is exerted on the holder, the retractable cord rotates the wire brush and the pump ejects solvent. A user can insert a paint brush handle through the holder, thus actuating the pump and rotating the wire brush by applying force to the handle. The housing attaches to a user's belt, providing easy access to the paint brush cleaning system.

The present disclosure relates to an apparatus and a method for wafer cleaning. The apparatus can include a wafer holder configured to hold a wafer; a cleaning nozzle configured to dispense a cleaning fluid onto a first surface (e.g., front surface) of the wafer; and a cleaning brush configured to clean a second surface (e.g., back surface) of the wafer. Using the cleaning fluid, the cleaning brush can clean the second surface of the wafer with a scrubbing motion and ultrasonic vibration.

A system includes a dome, a wiper assembly, a position sensor and a control device. The wiper assembly includes a wiper blade configured to rotate around the dome. The position sensor may be configured to send a signal to a control device when a wiper blade passes the position sensor. The control device may include one or more processors configured to receive the signal from the position sensor and determine a location of the wiper blade relative to the dome based on the received signal.

A system includes a dome, a wiper assembly, a position sensor and a control device. The wiper assembly includes a wiper blade configured to rotate around the dome. The position sensor may be configured to send a signal to a control device when a wiper blade passes the position sensor. The control device may include one or more processors configured to receive the signal from the position sensor and determine a location of the wiper blade relative to the dome based on the received signal.

A handheld snow removing system includes an intake scoop with a rotating intake auger, a discharge chute configured to direct a flow of material to a point outside of the handheld snow removing system, a fan chamber disposed between the intake scoop and the discharge chute, and an energy-conversion device configured to drive elements of the fan chamber and the rotating intake auger. The fan chamber includes a fan configured to create a suction force within the fan chamber to create the flow of material from the intake scoop, through the fan chamber, and out through the discharge chute.

A handheld snow removing system includes an intake scoop with a rotating intake auger, a discharge chute configured to direct a flow of material to a point outside of the handheld snow removing system, a fan chamber disposed between the intake scoop and the discharge chute, and an energy-conversion device configured to drive elements of the fan chamber and the rotating intake auger. The fan chamber includes a fan configured to create a suction force within the fan chamber to create the flow of material from the intake scoop, through the fan chamber, and out through the discharge chute.

A self-cleaning and anti-adhesion apparatus for marine instruments includes an installation frame. A first end of the installation frame is fixed with an installation base, and a second end of the installation frame is movable with a screw rod. The upper end of the installation base is movable with a first rotation base. A wire netting ball used for holding a sensor is installed above the first rotation base. The wire netting ball is fixedly connected with the installation base. The top end of the screw rod is fixedly connected with a first end of the flexible connector, and a second end of the flexible connector is fixedly connected with a floating bladder. The screw rod is screwed with an inner wheel of an internal meshing ratchet mechanism, and an outer wheel of the internal meshing ratchet mechanism is fixed inside the mounting ring.

A self-cleaning and anti-adhesion apparatus for marine instruments includes an installation frame. A first end of the installation frame is fixed with an installation base, and a second end of the installation frame is movable with a screw rod. The upper end of the installation base is movable with a first rotation base. A wire netting ball used for holding a sensor is installed above the first rotation base. The wire netting ball is fixedly connected with the installation base. The top end of the screw rod is fixedly connected with a first end of the flexible connector, and a second end of the flexible connector is fixedly connected with a floating bladder. The screw rod is screwed with an inner wheel of an internal meshing ratchet mechanism, and an outer wheel of the internal meshing ratchet mechanism is fixed inside the mounting ring.

Automatic emitter point cleaners are disclosed. An automatic emitter point cleaning system includes: a fan configured to direct a stream of air through an air path; a point emitter configured to produce at least one of positive ions or negative ions within or proximate to the air path; a brush; a first gear coupled to the brush and configured to move the brush into contact with the point emitter; a second gear to engage the first gear; and a motor to actuate the second gear such that the second gear actuates the first gear to move the brush past the point emitter.