The disclosed technology relates to semiconductors, and more particularly to a junction field effect transistor (JFET). In one aspect, a method of fabricating a JFET includes forming a well of a first dopant type in a substrate, wherein the well is isolated from the substrate by an isolation region of a second dopant type. The method additionally includes implanting a dopant of the second dopant type at a surface of the well to form a source, a drain and a channel of the JFET, and implanting a dopant of the first dopant type at the surface of the well to form a gate of the JFET. The method additionally includes, prior to implanting the dopant of the first type and the dopant of the second type, forming a pre-metal dielectric (PMD) layer on the well and forming contact openings in the PMD layer above the source, the drain and the gate. The PMD layer has a thickness such that the channel is formed by implanting the dopant of the first type and the dopant of the second type through the PMD layer. The method further includes, after implanting the dopant of the first type and the dopant of the second type, siliciding the source, the drain and the gate, and forming metal contacts in the contact openings.

A nitride semiconductor device includes: a substrate; a nitride semiconductor layer above the substrate; a high-resistance layer above the nitride semiconductor layer; a p-type nitride semiconductor layer above the high-resistance layer; a first opening penetrating through the p-type nitride semiconductor layer and the high-resistance layer to the nitride semiconductor layer; an electron transport layer and an electron supply layer covering an upper portion of the p-type nitride semiconductor layer and the first opening; a gate electrode above the electron supply layer; a source electrode in contact with the electron supply layer; a second opening penetrating through the electron supply layer and the electron transport layer to the p-type nitride semiconductor layer; a potential fixing electrode in contact with the p-type nitride semiconductor layer at a bottom part of the second opening; and a drain electrode.

A SiC junction field effect transistor includes a SiC substrate, a first conductivity type channel region formed in the principal surface of the SiC substrate, a second conductivity type embedded gate region formed below the channel region on the principal surface side in the SiC substrate, and first conductivity type source region and drain region formed with the channel region interposed therebetween in the principal surface of the SiC substrate.

A semiconductor device is provided. The semiconductor device may include a silicon carbide substrate, a silicon layer formed at a first side of the silicon carbide substrate, a gate oxide layer formed on the silicon layer, a gate terminal formed on the gate oxide layer, a drain terminal formed at a second side of the silicon carbide substrate opposite the first side, and a source terminal formed at the first side of the silicon carbide substrate, and at opposite ends of the silicon layer.

A high-voltage device includes: a diode; a junction field-effect transistor (JFET) adjoining the diode and electrically coupled to the diode; a high-voltage junction termination (HVJT) element electrically connected with the diode and the junction field-effect transistor, wherein the high-voltage junction termination element is a ring shape from top view, and a high-side region and a low-side region are respectively defined inside the ring shape and outside the ring shape; and a first deep well region encircling the high-side region. The first deep well region includes: a first segment disposed in the high-voltage junction termination element; and a second segment disposed in the junction field-effect transistor. The first segment includes a well region and a doped region in the well region. The second segment includes only the well region.

A semiconductor device including: a first level including a first single crystal silicon layer, a plurality of first transistors, and input/output circuits; a first metal layer; a second metal layer which includes a power delivery network; where interconnection of the plurality of first transistors includes the first and second metal layers; a second level including a plurality of metal gate second transistors and first array of memory cells, disposed over the first level; a third level including a plurality of metal gate third transistors and a second array of memory cells, disposed over the second level; a via disposed through the second and third levels; a third metal layer disposed over the third level; a fourth metal layer disposed over the third metal layer; and a fourth level disposed over the fourth metal layer and including a second single crystal silicon layer.

Methods and semiconductor devices are provided. A vertical junction field effect transistor (JFET) includes a substrate, an active region having a plurality of semiconductor fins, a source metal layer on an upper surface of the fins, a source metal pad layer coupled to the semiconductor fins through the source metal layer, a gate region surrounding the semiconductor fins, and a body diode surrounding the gate region.

A gallium nitride-based semiconductor device includes an amorphous glass substrate having a first surface and a second surface opposite to the first surface; a gallium nitride-based semiconductor layer on the first surface of the amorphous glass substrate, and a compensation layer on the second surface of the amorphous glass substrate. A thermal expansion coefficient of the compensation layer is more than a thermal expansion coefficient of the amorphous glass substrate and less than a thermal expansion coefficient of the gallium nitride-based semiconductor layer.

One embodiment according to the present disclosure is an imaging apparatus including pixels. The pixel includes a junction type field effect transistor (JFET) provided in a semiconductor substrate. The JFET includes a gate region and a channel region. An orthogonal projection of the gate region onto a plane parallel to a surface of the semiconductor substrate intersects an orthogonal projection of the channel region onto the plane. Each of a source-side portion of the orthogonal projection of the channel region and a drain-side portion of the orthogonal projection of the channel region protrudes out of the orthogonal projection of the gate region.

The characteristics of a semiconductor device are improved. A semiconductor device has an impurity-containing potential fixed layer, and a gate electrode. A drain electrode and a source electrode are formed on the opposite sides of the gate electrode. An interlayer insulation film is formed between the gate electrode and the drain electrode, and between the gate electrode and the source electrode. The concentration of the inactivating element in the portion of the potential fixed layer under the drain electrode is higher than the concentration of the inactivating element in the portion of the potential fixed layer under the source electrode. The film thickness of the portion of the interlayer insulation film between the gate electrode and the drain electrode is different from the film thickness of the portion of the interlayer insulation film between the gate electrode and the source electrode.