Patent classifications
B81B2203/0127
CURABLE SILICONE FORMULATIONS AND RELATED CURED PRODUCTS, METHODS, ARTICLES, AND DEVICES
The invention comprises a butyl acetate-silicone formulation comprising (A) an organopolysiloxane containing an average of at least two silicon-bonded alkenyl groups per molecule, (B) an organosilicon compound containing an average of at least two silicon-bonded hydrogen atoms per molecule; (C) a hydrosilylation catalyst; and a coating effective amount of (D) butyl acetate. The invention also comprises related silicone formulations made by removing a portion, or all, of (D) butyl acetate therefrom, and related cured products, methods, articles and devices.
MEMS DEVICE AND PROCESS
The application describes MEMS transducer structures comprising a membrane structure having a flexible membrane layer and at least one electrode layer. The electrode layer is spaced from the flexible membrane layer such that at least one air volume extends between the material of the electrode layer and the membrane layer. The electrode layer is supported relative to the flexible membrane by means of a support structure which extends between the first electrode layer and the flexible membrane layer.
MICROMECHANICAL STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
A micromechanical structure in accordance with various embodiments may include: a substrate; and a functional structure arranged at the substrate; wherein the functional structure includes a functional region which is deflectable with respect to the substrate responsive to a force acting on the functional region; and wherein at least a section of the functional region has an elastic modulus in the range from about 5 GPa to about 70 GPa.
Method for manufacturing a membrane component and a membrane component
The present invention relates to a method for manufacturing a membrane component with a membrane made of a thin film (<1 μm, thin-film membrane). The membrane component can be used in microelectromechanical systems (MEMS). The invention is intended to provide a method for manufacturing a membrane component, the membrane being manufacturable with high-precision membrane dimensions and a freely selectable membrane geometry. This is achieved by a method comprising . . . providing a semiconductor wafer (100) with a first layer (116), a second layer (118) and a third layer (126). Depositing (12) a first masking layer (112) on the first layer (116), the first masking layer (112) defining a first selectively processable area (114) for determining a geometry of the membrane (M.sub.1). Forming (13) a first recess (120) by anisotropic etching (13) of the first layer (116) and removing the first masking layer (112). Introducing (14) a material (122) in the first recess (120) and depositing (15) a membrane layer (124) on the first layer (116) with the introduced material (122). Depositing on the third layer (126) a second masking layer that defines a second selectively processable area. Forming a second recess by anisotropic etching of the third layer (126) and of the second layer (118) up to the first layer (116). Removing the second masking layer; and isotropically etching (18) the first layer (116), the isotropic etching being limited by the membrane layer (124) and by the introduced material (122), so that the membrane (M.sub.1) will be exposed.
ABSOLUTE PRESSURE SENSING MEMS MICROPHONE, MICROPHONE UNIT AND ELECTRONIC DEVICE
Embodiments of the present disclosure provides an absolute pressure sensing MEMS microphone, a microphone unit and an electronic device. The absolute pressure sensing MEMS microphone includes: a diaphragm; a back electrode plate; a spacer between the diaphragm and the back electrode plate, wherein the diaphragm, the back electrode plate and the spacer form a vacuum cavity, an air pressure in the vacuum cavity is a first air pressure, wherein a gap separating the diaphragm from the back electrode plate by the spacer is a fabrication gap, wherein in a state where the air pressure inside and outside the diaphragm are both the first air pressure, an effective vacuum gap between the diaphragm and the back electrode plate is the first vacuum gap, and wherein the first vacuum gap is larger than the fabrication gap.
Membrane Support for Dual Backplate Transducers
A microfabricated structure includes a perforated stator; a first isolation layer on a first surface of the perforated stator; a second isolation layer on a second surface of the perforated stator; a first membrane on the first isolation layer; a second membrane on the second isolation layer; and a pillar coupled between the first membrane and the second membrane, wherein the first isolation layer includes a first tapered edge portion having a common surface with the first membrane, wherein the second isolation layer includes a first tapered edge portion having a common surface with the second membrane, and wherein an endpoint of the first tapered edge portion of the first isolation layer is laterally offset with respect to an endpoint of the first tapered edge portion of the second isolation layer.
MEMS Microphone
The present invention provides a MEMS microphone including a substrate with a back cavity and a capacitive system disposed on the substrate. The capacitive system includes a back plate and a vibration diaphragm arranged opposite to the back plate. The back plate includes a middle part and a fixed part surrounding the middle part and fixed to the substrate. The fixed part is arranged with a thickness greater than that of the middle part, and the fixed part includes a first surface away from the substrate and a second surface opposite to the first surface. The first surface includes a first arc connected to the middle part, and the first arc protrudes away from the substrate. Compared with related technologies, the MEMS microphone provided by the present invention can improve the reliability of the back plate.
MEMS SPEAKER AND MANUFACTURING METHOD FOR SAME
The present invention provides a MEMS speaker including a substrate sidewall enclosing a cavity. The substrate sidewall includes a first surface and a second surface, a sounding assembly that is arranged on the first surface of the substrate sidewall and also seals the cavity at the opening of the first surface, and a bracket disposed in the cavity. The sounding assembly includes a first sounding assembly and the second sounding assembly. Each sounding assembly includes a driving part and a flexible diaphragm. The flexible diaphragm closes the gap formed between the free ends of adjacent driving parts and between the free ends of the driving parts and the substrate sidewall. The present invention also provides a manufacturing method of MEMS speaker. The MEMS speakers provided by the present invention have high-quality acoustic performance.
MEMS Acoustic Sensor
The invention provides a MEMS acoustic sensor, including: a base with a back cavity; a capacitance system fixed to the base, including a diaphragm that reciprocates in a vibration direction, a back plate spaced from the diaphragm; a first capacitor and a second capacitor formed cooperatively by the diaphragm and the back plate; and a number of through holes in the back plate facing the back cavity. The diaphragm includes a main body part opposite to the back plate for forming the first capacitor, and a plurality of combining parts recessed from the main body part. A projection of the combining part along the vibration direction completely falls into the through hole. The combining part is spaced from an inner wall of the through hole for forming the second capacitor. Due to the configuration of the invention, the acoustic sensor has improved capacitor value.
Manufacturing process for at least one diaphragm unit of a MEMS transducer
A process for manufacturing a diaphragm unit of a MEMS transducer that includes multiple piezoelectric transducer units, each of the multiple piezoelectric transducer units including at least one electrode layer and at least one piezoelectric layer formed on a carrier includes the step of removing the transducer units from the carrier. At least one of the transducer units that has been removed from the carrier is arranged on a diaphragm and connected to the diaphragm. Moreover, a diaphragm unit made according to the process includes a diaphragm and multiple piezoelectric transducer units arranged on and connected to the diaphragm. Each of the multiple piezoelectric transducer units includes at least one electrode layer and at least one piezoelectric layer formed on a carrier.