The present disclosure relates a method for removing by-products from a gas comprising such by-products, the by-products comprising fluoronitrile compounds and/or fluorocarbon compounds. This method includes contacting the gas with a solid adsorbent phase that comprises a molecular sieve and further comprises at least one transition metal oxide. The present disclosure also relates to a device for removing fluorinated by-products from a gas comprising such fluorinated by-products and to the use of at least one transition metal oxide in a solid adsorbent phase including a molecular sieve for removing by-products from a gas comprising such by-products, the by-products comprising fluoronitrile compounds and/or fluorocarbon compounds.

A desulfurization wastewater zero discharge treatment method and system suitable for multiple working conditions. A tail flue of a boiler and a bottom outlet of a wastewater drying tower are both communicated with an inlet of a dust collector; an outlet of the dust collector is communicated with flue gas inlets of a wastewater concentration tower and a desulfurization absorption tower; the wastewater concentration tower is communicated with the desulfurization absorption tower; the desulfurization absorption tower is communicated with a chimney; the desulfurization absorption tower is communicated with a gypsum cyclone; the gypsum cyclone is communicated with a filtrate water tank; the gypsum cyclone is communicated with a gypsum dewatering machine; the gypsum dewatering machine is communicated with a gas liquid separating tank; and a flue gas port of the tail flue of the boiler is communicated with the flue gas inlet of the wastewater drying tower.

A desulfurization wastewater zero discharge treatment method and system suitable for multiple working conditions. A tail flue of a boiler and a bottom outlet of a wastewater drying tower are both communicated with an inlet of a dust collector; an outlet of the dust collector is communicated with flue gas inlets of a wastewater concentration tower and a desulfurization absorption tower; the wastewater concentration tower is communicated with the desulfurization absorption tower; the desulfurization absorption tower is communicated with a chimney; the desulfurization absorption tower is communicated with a gypsum cyclone; the gypsum cyclone is communicated with a filtrate water tank; the gypsum cyclone is communicated with a gypsum dewatering machine; the gypsum dewatering machine is communicated with a gas liquid separating tank; and a flue gas port of the tail flue of the boiler is communicated with the flue gas inlet of the wastewater drying tower.

A method for producing a high-purity hydrogen chloride gas comprises performing a purification process that includes the steps 1) to 3) below on a byproduct hydrogen chloride gas: 1) a crude hydrochloric acid generation step of allowing water to absorb the byproduct hydrogen chloride gas; 2) a volatile organic impurity-removed hydrochloric acid generation step of bringing the crude hydrochloric acid obtained in the step 1) into contact with an inert gas at a liquid temperature of 20 to 45° C. to dissipate volatile organic impurities; and 3) a high-purity hydrogen chloride gas generation step of supplying the volatile organic impurity-removed hydrochloric acid obtained in the step 2) to a distillation column and performing distillation under conditions of a column bottom temperature of higher than 60° C. and 108° C. or lower and a column top temperature of 60° C. or lower to distill out a high-purity hydrogen chloride gas.

A pyrolysis method and system are provided that utilizes a multistage dehalogenation method to effectively remove halogen-containing compounds that are present in an initial recycled plastic feedstock. More particularly, the multistage dehalogenation system and process may involve physical sorting the plastic feedstock, melting and separating the feedstock, and subjecting the feedstock a two-stage pyrolysis with intermediate HCl removal.

A gas processing apparatus includes a duct, a partition plate and a liquid supply. The duct has therein a flow path through which a gas passes. The partition plate is configured to divide the flow path into multiple spaces, and is formed of a porous material, through which the gas passes, configured to retain a liquid. The liquid supply is configured to supply a dissolving liquid configured to dissolve a target component contained in the gas to the partition plate. The gas passing through the flow path is brought into contact with the dissolving liquid retained in the partition plate.

There is provided an exhaust gas processing apparatus configured to cause a processing gas to be exposed to or come into contact with a liquid and thereby detoxify the processing gas. The exhaust gas processing apparatus comprises a suction casing provided with an inlet which the processing gas is sucked into and with an outlet which the processing gas is flowed out from; a liquid tank configured to receive an outlet-side part of the suction casing and store the liquid therein; and one or multiple spray nozzles placed in the liquid tank. The outlet of the suction casing is arranged to be located above a liquid surface of the liquid stored in the liquid tank. The one or multiple spray nozzles are configured to spray the liquid from around the outlet of the suction casing to a peripheral part of the outlet.

There is provided an exhaust gas processing apparatus configured to cause a processing gas to be exposed to or come into contact with a liquid and thereby detoxify the processing gas. The exhaust gas processing apparatus comprises a suction casing provided with an inlet which the processing gas is sucked into and with an outlet which the processing gas is flowed out from; a liquid tank configured to receive an outlet-side part of the suction casing and store the liquid therein; and one or multiple spray nozzles placed in the liquid tank. The outlet of the suction casing is arranged to be located above a liquid surface of the liquid stored in the liquid tank. The one or multiple spray nozzles are configured to spray the liquid from around the outlet of the suction casing to a peripheral part of the outlet.

Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

An organic iodine remover is a remover for removing organic iodine and is a substance composed of a cation and an anion, and the cation (for example, a phosphonium cation, an ammonium cation, or a sulfonium cation) has a molecular structure in which an electron donating group (for example, a phosphino group, an amino group, a sulfanyl group, a hydroxy group, or an alkoxy group) is bonded to a phosphorus atom, a nitrogen atom or a sulfur atom. An organic iodine removing apparatus includes: a vessel into which the organic iodine remover for removing the organic iodine is charged; and introduction pipes through which a fluid containing organic iodine is introduced into the organic iodine remover.