The present invention provides a preparation method of a gallium nitride single crystal based on a ScAlMgO.sub.4 substrate, comprising following steps: (1) providing a ScAlMgO.sub.4 substrate; (2) growing a buffer layer on a surface of the ScAlMgO.sub.4 substrate; (3) annealing the buffer layer; (4) growing a GaN crystal on the buffer layer; (5) performing cooling, so that the GaN crystal is automatically peeled off from the ScAlMgO.sub.4 substrate. The present invention does not need to use a complex MOCVD process for GaN deposition and preprocessing to make a mask or a separation layer, which effectively reduces production costs; compared with traditional substrates such as sapphire, it has higher quality and a larger radius of curvature, and will not cause a problem of OFFCUT non-uniformity for growing GaN over 4 inches; finally, the present invention can realize continuous growth into a crystal bar with a thickness of more than 5 mm, which further reduces the costs.

A substrate having a multilayer coating system in the form of a surface coating, which has an outer cover layer comprising amorphous carbon, and a coating process for producing a substrate. At least a first Mo.sub.aN.sub.x support layer is provided between the substrate and the cover layer, which support layer has a nitrogen content x, referred to an Mo content a, which is in the range of 25 at %≤x≤55 at %, with x+a=100 at %.

A nuclear fuel cladding tube is described herein that includes a zirconium alloy tube having an outer wear and oxidation resistant ceramic coating selected from the group consisting of CrN, Cr.sub.2N, CrWN, CrZrN, and combinations thereof. The cladding may have an intermediate layer formed between the tube and the outer ceramic coating. The intermediate layer may be selected from the group consisting of Ta, W, Mo, Nb, and combinations thereof. Both the intermediate layer and the outer ceramic coating may be deposited by physical vapor deposition.

A surface-coated cutting tool comprises a tool substrate comprising a cBN sinter and a hard coating layer including a lower sublayer α and an upper sublayer β on the surface of the cutting edge; wherein α satisfies (Al.sub.1-xTi.sub.x)N (0.40≤x≤0.60); β satisfies (Al.sub.1-y-zTi.sub.yB.sub.z)N (0.40≤y≤0.60 and 0.01≤z≤0.10); in the sublayer β, the variation in the concentration of the B component is repeated; the average Bmaxav of the maxima in the concentration of the B component satisfies z<Bmaxav≤2.0×z, and the average Bminav of the minima in the concentration of the B component satisfies 0≤Bminav<z; and the average thickness tα of α and the average thickness tβ of β satisfy expression: 2.0≤<tβ/tα≤6.0; and the residual stress σ of the overall hard coating layer satisfies −2.0 GPa≤σ≤−0.5 GPa.

The present invention relates to a cutting tool consisting of a hard base material, such as cemented carbide, cermet, ceramic, and cubic boron nitride, and a hard coating film formed on the hard base material. In the cutting tool according to the present invention, the hard coating film, which is composed of a monolayer or multilayer structure, is formed on a base material, wherein the hard coating film comprises a layer composed of an oxide, wherein in the layer composed of an oxide, the oxygen content of an edge center of the cutting tool is higher than the oxygen content in an area distanced from the edge center by 50 μm or more.

The present invention provides a UV antireflective coating stack for ophthalmic lenses. The antireflective coating stack is deposited by sputtering, which lowers the reflectivity of the antireflective stack in the UV range and maintains low reflectivity in the visible range. The antireflective coating stack offers improved thermo-mechanical performance as compared to evaporation-based UV antireflective stacks.

Provided is a piezoelectric thin film device in which lattice mismatch between a piezoelectric thin film and a lower electrode layer (first electrode layer) is reduced. A piezoelectric thin film device 10 comprises a first electrode layer 6a and a piezoelectric thin film 2 laminated directly on the first electrode layer 6a; the first electrode layer 6a includes an alloy composed of two or more metal elements; the first electrode layer 6a has a body-centered cubic lattice structure; and the piezoelectric thin film 2 has a wurtzite structure.

A metal foil including on at least one of its sides a layer of a material including: a metal or a metal alloy, carbon, hydrogen, and optionally oxygen, the atomic percentage of the metal or of the metals of the alloy in the material ranging from 10 to 60%, the atomic percentage of carbon in the material ranging from 35 to 70%, the atomic percentage of hydrogen in the material ranging from 2 to 20%, and the atomic percentage of oxygen if present in the material being less than or equal to 10%. The metal foil can be used in the manufacture of a cathode of a lithium-ion electrochemical cell. The deposition of this layer reduces the internal resistance of the cell.

A laminate including a glass plate and a coating layer, wherein the coating layer includes one or more components selected from the group consisting of silicon nitride, titanium oxide, alumina, niobium oxide, zirconia, indium tin oxide, silicon oxide, magnesium fluoride, and calcium fluoride, wherein a ratio (dc/dg) of a thickness dc of the coating layer to a thickness dg of the glass plate is in a range of 0.05×10.sup.−3 to 1.2×10.sup.−3, and wherein a radius of curvature r1 of the laminate with negating of self-weight deflection is 10 m to 150 m.

The present application provides a fabric coloring method and a colored fabric, where the fabric coloring method includes: performing radiation drying on a base cloth; sequentially forming an adhesive layer and at least one color-generating layer on a surface of the base cloth after the radiation drying by vacuum deposition, where the adhesive layer contains at least one of Ti, Cr, Si and Ni, and a thickness of the adhesive layer ranges from 1 nm to 2000 nm; the color-generating layer contains at least one of Al, Ti, Cu, Fe, Mo, Zn, Ag, Au, and Mg, and the total thickness of the color-generating layer ranges from 1 nm to 4000 nm. The fabric coloring method can not only produce rich colors and make the colored fabric have good color fastness, but also reduce the sensitivity of color of the colored fabric to thickness of the film, thus improving the industrial operability.