Patent classifications
B81C99/0025
ADDITIVE MANUFACTURING PROCESSES AND MANUFACTURED ARTICLE
An additive manufacturing process includes forming an object material stack using sheet materials without use of binder material between the sheet materials and forming features of the cross-sectional layers of a 3D object in the corresponding sheet materials. Another process involves forming features of the cross-sectional layers of a 3D object in soot layers of a laminated soot sheet. A manufactured article includes three or more glass layers laminated together without any binder material between the glass layers. At least one of the glass layers is composed of silica or doped silica, and at least one feature is formed in at least one of the glass layers.
System for manufacturing microneedle preparation, and air-conditioning method
The present invention provides a system for manufacturing a therapeutic microneedle configured to regulate an air environment within a coating chamber for manufacturing a therapeutic microneedle by coating a microneedle with a coating liquid containing a drug, the system for manufacturing a therapeutic microneedle comprising an air compressor, a humidity regulator configured to regulate humidity of air supplied from the air compressor, and an air filter configured to eliminate microorganisms from air to be supplied to the inside of the coating chamber.
Methods, apparatus, and systems for fabricating solution-based conductive 2D and 3D electronic circuits
This work develops a novel microfluidic method to fabricate conductive graphene-based 3D micro-electronic circuits on any solid substrate including, Teflon, Delrin, silicon wafer, glass, metal or biodegradable/non-biodegradable polymer-based, 3D microstructured, flexible films. It was demonstrated that this novel method can be universally applied to many different natural or synthetic polymer-based films or any other solid substrates with proper pattern to create graphene-based conductive electronic circuits. This approach also enables fabrication of 3D circuits of flexible electronic films or solid substrates. It is a green process preventing the need for expensive and harsh postprocessing requirements for other fabrication methods such as ink-jet printing or photolithography. We reported that it is possible to fill the pattern channels with different dimensions as low as 10×10 μm. The graphene nanoplatelet solution with a concentration of 60 mg/mL in 70% ethanol, pre-annealed at 75° C. for 3 h, provided ˜0.5-2 kOhm resistance. The filling of the pattern channels with this solution at a flow rate of 100 μL/min created a continuous conductive graphene pattern on flexible polymeric films. The amount of graphene used to coat 1 cm.sup.2 of area is estimated as ˜10 μg. A second method regarding the transfer of graphene material-based circuits with small features size (5 μm depth, 10 μm width) from any solid surface to flexible polymeric films via polymer solvent casting approach was demonstrated. This method is applicable to any natural/synthetic polymer and their respective organic/inorganic solvents.
TRANSPARENT MATERIAL PROCESSING METHOD, TRANSPARENT MATERIAL PROCESSING DEVICE, AND TRANSPARENT MATERIAL
An object of one embodiment of the invention is to process a material simply and high efficiently.
A fabrication method of transparent material is a method of processing a thermosetting transparent material. The fabrication method of transparent material includes a disposing step (S01) of disposing an uncured thermosetting transparent material, a laser beam irradiation step (S02) of irradiating the disposed uncured thermosetting transparent material with a laser beam so that cavitation bubbles are generated in the uncured thermosetting transparent material, and a curing step (S03) of performing a curing process on the uncured thermosetting transparent material in which the cavitation bubbles are generated.
Additive manufacturing processes and manufactured article
An additive manufacturing process includes forming an object material stack using sheet materials without use of binder material between the sheet materials and forming features of the cross-sectional layers of a 3D object in the corresponding sheet materials. Another process involves forming features of the cross-sectional layers of a 3D object in soot layers of a laminated soot sheet. A manufactured article includes three or more glass layers laminated together without any binder material between the glass layers. At least one of the glass layers is composed of silica or doped silica, and at least one feature is formed in at least one of the glass layers.
SELF-PACKING THREE-ARM THERMAL SCANNING PROBE FOR MICRO-NANO MANUFACTURING
The present disclosure discloses a self-packing three-arm thermal scanning probe for micro-nano manufacturing, comprising: a three-arm cantilever beam, metal contact pads, a nichrome heating electrode for printing, a nichrome heating electrode for transportation, and a polymer storage area. The present disclosure is manufactured by conventional micro-nano machining processes such as lithography and wet etching. In the present disclosure, a gradient density design of heating electrodes is used to generated continuous change of temperature gradients, thus realizing continuous transportation of a printing material from a storage area to a tip area, which realizes self-packing. The present disclosure can be seamlessly integrated with a CMOS process, and a printed material can be completely eliminated by means of commonly used acetone or oxygen plasma in the CMOS process, without contamination; furthermore, the micro-nano machining method of the present disclosure only requires an atomic force microscope whose cost is very low.
Deposition Apparatus
A magnetron sputtering apparatus for depositing material onto a substrate, comprises: a chamber comprising a substrate support and a target; a plasma production device configured to produce a plasma within the chamber suitable for sputtering material from the target onto the substrate; and a thermally conductive grid comprising a plurality of cells. Each cell comprises an aperture and the ratio of the height of the cells to the width of the apertures is less than 1.0. The grid is disposed between the substrate support and the target and is substantially parallel to the target. The upper surface of the substrate support is positioned at a distance of 75 mm or less from the lower surface of the target.
Methods and systems for fast imprinting of nanometer scale features in a workpiece
The subject matter described herein relates to methods and systems for fast imprinting of nanometer scale features in a workpiece. According to one aspect, a system for producing nanometer scale features in a workpiece is disclosed. The system includes a die having a surface with at least one nanometer scale feature located thereon. A first actuator moves the die with respect to the workpiece such that the at least one nanometer scale feature impacts the workpiece and imprints a corresponding at least one nanometer scale feature in the workpiece.
Microelectro-mechanical system device and method for electrostatic bonding the same
A microelectro-mechanical system (MEMS) device includes a substrate of a semiconductor material having thereon a movable component, a glass substrate bonded to the substrate, an electrostatic biasing layer disposed between the movable component and the glass substrate. A cavity is defined between the movable component and a top surface of the glass substrate. The electrostatic biasing layer completely overlaps with the movable component.
Micro-electro-mechanical-systems processing method, and micro-electro-mechanical-systems processing apparatus
The invention is to reduce non-uniformity of a processing shape over a wide range of a single field-of-view. The invention is directed to a method of processing micro electro mechanical systems with a first step and a second step in a processing apparatus including an irradiation unit that irradiates a sample with a charged particle beam, a shape measuring unit that measures a shape of the sample, and a control unit. In the first step, the irradiation unit irradiates a plurality of single field-of-view points with the charged particle beam in a first region of the sample, the shape measuring unit measures the shape of a spot hole formed in the first region of the sample, and the control unit sets, based on measurement results of the shape of the spot hole, a scan condition of the charged particle beam or a forming mask of the charged particle beam at each of the single field-of-view points. In the second step, the irradiation unit irradiates, based on the scan condition or the forming mask set in the first step, a second region of the sample with the charged particle beam.