A formed or non-flat formed glass is provided that exhibits high transmittance to electromagnetic radiation in a range of wavelengths from 200 nm to 1500 nm. The transmittance for the formed or non-flat formed glass having a thickness of 1 mm is 20% or more at a wavelength of 254 nm, 82% or more at a wavelength of 300 nm, 90% or more at a wavelength of 350 nm, 92% or more at a wavelength of 546 nm, 92.5% or more at a wavelength of 1400 nm, 91.5% or more in a wavelength range from 380 nm to 780 nm, and 92.5% or more in a wavelength range from 780 nm to 1500 nm.

A UV transmitting glass of the present invention is characterized by including as a glass composition, in terms of mass %, 60% to 78% of SiO.sub.2, 1% to 25% of Al.sub.2O.sub.3, 10.8% to 30% of B.sub.2O.sub.3, 0% to less than 1.9% of Li.sub.2O, 0% to 8% of Na.sub.2O, 1.6% to 8% of K.sub.2O, 1.6% to 10% of Li.sub.2O+Na.sub.2O+K.sub.2O, 0% to less than 1.9% of BaO, 0% to less than 1.9% of Li.sub.2O+BaO, and 0% to 1% of Cl, and having an external transmittance at a thickness of 0.5 mm and a wavelength of 200 nm of 40% or more.

Devised is a UV transmitting glass having a high transmittance in a deep UV region, and also having high weather resistance. The UV transmitting glass of the present invention is characterized by including as a glass composition, in terms of mass %, 55% to 80% of SiO.sub.2, 1% to 25% of Al.sub.2O.sub.3, 10.8% to 30% of B.sub.2O.sub.3, 0% to 10% of Na.sub.2O, 0% to less than 1.6% of K.sub.2O, 0.1% to 10% of Li.sub.2O+Na.sub.2O+K.sub.2O, 0% to 5% of BaO, and 0% to 1% of Cl, and having an external transmittance at a thickness of 0.5 mm and a wavelength of 200 nm of 38% or more.

A glass includes SiO.sub.2 in an amount of at least 60.0 wt.-% and an amount of WO.sub.3 from 0.1 ppm to 60.0 ppm. Tungsten is present in such oxidation states that a transmittance of the glass at a wavelength of 260 nm is at least 75.0%.

A flat glass is provided that exhibits high transmittance to electromagnetic radiation in a range of wavelengths from 200 nm to 1500 nm. The transmittance for the flat glass having a thickness of 1 mm is 20% or more at a wavelength of 254 nm, 82% or more at a wavelength of 300 nm, 90% or more at a wavelength of 350 nm, 92% or more at a wavelength of 546 nm, 92.5% or more at a wavelength of 1400 nm, 91.5% or more in a wavelength range from 380 nm to 780 nm, and 92.5% or more in a wavelength range from 780 nm to 1500 nm.

A glass article has a refractive index n.sub.G≥1.95 and an R-number in a range of from 0.900 to 1.050. The R-number is calculated according to the following formula:

[00001]$R=\left(n_G-1\right)\left(\frac{\ln \left[\frac{{\lambda }_G^2-{\lambda }_{\min }^2}{{\lambda }_G^2-{\lambda }_{\max }^2}.Math.\frac{{\lambda }_{\max }^2}{{\lambda }_{\min }^2}\right]}{42\ln \left[\frac{{\lambda }_B^2-{\lambda }_{\min }^2}{{\lambda }_B^2-{\lambda }_{\max }^2}.Math.\frac{{\lambda }_R^2-{\lambda }_{\max }^2}{{\lambda }_R^2-{\lambda }_{\min }^2}\right]}+\frac{1}{2.8}\right).$

λ.sub.R=656 nm, λ.sub.G=587 nm and λ.sub.B=486 nm, λ.sub.min=33 nm, and n.sub.G is a refractive index of the glass article at a wavelength of 587 nm.

Provided is a silica glass member which exhibits high optical transparency to vacuum ultraviolet light and has a low thermal expansion coefficient of 4.0−10.sup.−7/K or less at near room temperature, particularly a silica glass member which is suitable as a photomask substrate to be used in a double patterning exposure process using an ArF excimer laser (193 nm) as a light source. The silica glass member is used in a photolithography process using a vacuum ultraviolet light source, in which the fluorine concentration is 1 wt % or more and 5 wt % or less, and the thermal expansion coefficient at from 20° C. to 50° C. is 4.0×10.sup.−7/K or less.

An energy-saving glass includes a glass substrate, and a periodic metal layer deposited on the glass substrate and having a honeycomb array of round holes. A method of manufacturing the energy-saving glass includes: providing a template having multiple template spots arranged in a honeycomb array; forming on the template a transfer metal layer having multiple metal spots disposed respectively on the template spots; transferring the metal spots onto a photoresist layer on a glass substrate; etching the photoresist layer exposed from the metal spots to leave photoresist spots underlying the metal spots on the glass substrate; forming a periodic metal layer around the photoresist spots; and removing the photoresist spots.

One or more glass articles include an aluminum oxide containing silicate glass matrix. The glass matrix has less than 1 SiO.sub.2-enriched glassy sphere of compositional inhomogeneities per 15 g of glass.

A method for producing a blank from titanium-doped, highly silicic-acidic glass having a specified fluorine content for use in EUV lithography is described, in which the thermal expansion coefficient over the operating temperature remains at zero as stably as possible. The course of the thermal expansion coefficient of Ti-doped silica glass depends on a plurality of influencing factors. In addition to the absolute titanium content, the distribution of the titanium is of significant importance, as is the ratio and distribution of additional doping elements, such as fluorine. In the method, fluorine-doped TiO.sub.2—SiO.sub.2 soot particles are generated and processed further via consolidation and vitrifying into the blank, and, by flame hydrolysis of input substances containing silicon and titanium, TiO.sub.2—SiO.sub.2-soot particles are formed, exposed to a reagent containing fluorine in a moving powder bed, and converted to the fluorine-doped TiO.sub.2—SiO.sub.2-soot particles.