C04B41/5028

SYSTEMS AND METHODS FOR ADHERING COPPER INTERCONNECTS IN A DISPLAY DEVICE

Embodiments are related generally to conductive interconnects formed on substrates, and more particularly to a glass ceramic, or glass-ceramic substrate having copper interconnects disposed thereon.

SYSTEMS AND METHODS FOR ADHERING COPPER INTERCONNECTS IN A DISPLAY DEVICE

Embodiments are related generally to conductive interconnects formed on substrates, and more particularly to a glass ceramic, or glass-ceramic substrate having copper interconnects disposed thereon.

Environmental barrier for a refractory substrate containing silicon

A part including a substrate in which at least a portion adjacent to a surface of the substrate is made of a refractory material containing silicon, is protected by an environmental barrier formed on the surface of the substrate and having at least a self-healing layer containing a rare earth silicate. The self-healing layer is formed: for at least 90 mol %, by a system constituted by 30 mol % to at most 80 mol % of at least one rare earth silicate RE.sub.2Si.sub.2O.sub.7, RE being a rare earth, and at least 20 mol % to 70 mol % of manganese oxide MnO; and for at most 10 mol %, by one or more oxides other than MnO, having a eutectic point with SiO2 less than or equal to 1595? C.; the self-healing layer presenting a liquid phase having a self-healing function at least throughout the temperature range 1200? C. to 1400? C., while conserving a majority solid phase.

Environmental barrier for a refractory substrate containing silicon

A part including a substrate in which at least a portion adjacent to a surface of the substrate is made of a refractory material containing silicon, is protected by an environmental barrier formed on the surface of the substrate and having at least a self-healing layer containing a rare earth silicate. The self-healing layer is formed: for at least 90 mol %, by a system constituted by 30 mol % to at most 80 mol % of at least one rare earth silicate RE.sub.2Si.sub.2O.sub.7, RE being a rare earth, and at least 20 mol % to 70 mol % of manganese oxide MnO; and for at most 10 mol %, by one or more oxides other than MnO, having a eutectic point with SiO2 less than or equal to 1595? C.; the self-healing layer presenting a liquid phase having a self-healing function at least throughout the temperature range 1200? C. to 1400? C., while conserving a majority solid phase.