Patent classifications
C04B41/5032
ION BEAM SPUTTERING WITH ION ASSISTED DEPOSITION FOR COATINGS ON CHAMBER COMPONENTS
An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film is selected from a group consisting of an Er—Y composition, an Er—Al—Y composition, an Er—Y—Zr composition, and an Er—Al composition.
ION BEAM SPUTTERING WITH ION ASSISTED DEPOSITION FOR COATINGS ON CHAMBER COMPONENTS
An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film is selected from a group consisting of an Er—Y composition, an Er—Al—Y composition, an Er—Y—Zr composition, and an Er—Al composition.
Ion beam sputtering with ion assisted deposition for coatings on chamber components
An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film consists essentially of 40 mol % to less than 100 mol % of Y.sub.2O.sub.3, over 0 mol % to 60 mol % of ZrO.sub.2, and 0 mol % to 9 mol % of Al.sub.2O.sub.3.
Ion beam sputtering with ion assisted deposition for coatings on chamber components
An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film consists essentially of 40 mol % to less than 100 mol % of Y.sub.2O.sub.3, over 0 mol % to 60 mol % of ZrO.sub.2, and 0 mol % to 9 mol % of Al.sub.2O.sub.3.
Method for Producing a Gas Separation Membrane
The present invention relates to a method for producing ceramic gas-separation membranes, which comprises depositing, by means of inkjet printing, water-based inks that form layers of a gas separation membrane. More specifically, the method comprises at least the following steps forming a porous support (i) compatible with a functional separation layer; depositing on the support (i), by means of inkjet printing, at least one functional separation layer (ii) formed by at least two inks, and depositing at least one porous catalytic activation layer (iii) on the functional separation layer (ii); and performing at least one heat treatment, which produces sintering. The functional separation layer (ii) is deposited in a manner to produce a surface with fadings, patterns, or combinations thereof he invention also relates to a gas separation membrane produced using the described method.
Method for Producing a Gas Separation Membrane
The present invention relates to a method for producing ceramic gas-separation membranes, which comprises depositing, by means of inkjet printing, water-based inks that form layers of a gas separation membrane. More specifically, the method comprises at least the following steps forming a porous support (i) compatible with a functional separation layer; depositing on the support (i), by means of inkjet printing, at least one functional separation layer (ii) formed by at least two inks, and depositing at least one porous catalytic activation layer (iii) on the functional separation layer (ii); and performing at least one heat treatment, which produces sintering. The functional separation layer (ii) is deposited in a manner to produce a surface with fadings, patterns, or combinations thereof he invention also relates to a gas separation membrane produced using the described method.
Chemistry compatible coating material for advanced device on-wafer particle performance
A chamber component comprises a body and a plasma sprayed ceramic coating on the body. The plasma sprayed ceramic coating is applied using a method that includes feeding powder comprising a yttrium oxide containing solid solution into a plasma spraying system, wherein the powder comprises a majority of donut-shaped particles, each of the donut-shaped particles having a spherical body with indentations on opposite sides of the spherical body. The method further includes plasma spray coating the body to apply a ceramic coating onto the body, wherein the ceramic coating comprises the yttrium oxide containing solid solution, wherein the donut-shaped particles cause the ceramic coating to have an improved morphology and a decreased porosity as compared to powder particles of other shapes, wherein the improved surface morphology comprises a reduced amount of surface nodules.
Chemistry compatible coating material for advanced device on-wafer particle performance
A chamber component comprises a body and a plasma sprayed ceramic coating on the body. The plasma sprayed ceramic coating is applied using a method that includes feeding powder comprising a yttrium oxide containing solid solution into a plasma spraying system, wherein the powder comprises a majority of donut-shaped particles, each of the donut-shaped particles having a spherical body with indentations on opposite sides of the spherical body. The method further includes plasma spray coating the body to apply a ceramic coating onto the body, wherein the ceramic coating comprises the yttrium oxide containing solid solution, wherein the donut-shaped particles cause the ceramic coating to have an improved morphology and a decreased porosity as compared to powder particles of other shapes, wherein the improved surface morphology comprises a reduced amount of surface nodules.
METHOD FOR FABRICATING MULTILAYER CERAMIC STRUCTURES BY THERMAL SPRAYING
A method for fabricating multi-layer ceramic broadband radome includes thermal-spraying layers of coating materials on the radome. The assembled structure exhibits tuned RF transparency response depending on the thickness and the dielectric constant of the deposited layers. Sub-micron thick ceramic layers, which are essential for broadband performance and hard to produce due to their fragile nature, can be deposited on big and complex objects by a fast and automated process.
METHOD FOR FABRICATING MULTILAYER CERAMIC STRUCTURES BY THERMAL SPRAYING
A method for fabricating multi-layer ceramic broadband radome includes thermal-spraying layers of coating materials on the radome. The assembled structure exhibits tuned RF transparency response depending on the thickness and the dielectric constant of the deposited layers. Sub-micron thick ceramic layers, which are essential for broadband performance and hard to produce due to their fragile nature, can be deposited on big and complex objects by a fast and automated process.