The present invention provides compounds useful in treating or preventing inflammation, acne, bacterial conditions and promoting the appearance of healthy skin and compositions including these compounds.

The present invention provides compounds useful in treating or preventing inflammation, acne, bacterial conditions and promoting the appearance of healthy skin and compositions including these compounds.

The present invention provides compounds useful in treating or preventing inflammation, acne, bacterial conditions and promoting the appearance of healthy skin and compositions including these compounds.

The present disclosure relates to a process for the manufacturing of a compound comprising a (meth)acryloyl group, wherein the process comprises the steps of: a) providing a multi-screw extruder comprising a reaction chamber; b) providing reactants and reagents comprising: i. an alcohol or a primary or secondary amine; ii. a base; and iii. a (meth)acryloyl halide or a 3-halopropionyl halide; and c) incorporating the reactants and reagents into the reaction chamber of the multi-screw extruder, thereby forming a reaction product stream comprising the compound comprising a (meth)acryloyl group.

The present disclosure relates to a process for the manufacturing of a compound comprising a (meth)acryloyl group, wherein the process comprises the steps of: a) providing a multi-screw extruder comprising a reaction chamber; b) providing reactants and reagents comprising: i. an alcohol or a primary or secondary amine; ii. a base; and iii. a (meth)acryloyl halide or a 3-halopropionyl halide; and c) incorporating the reactants and reagents into the reaction chamber of the multi-screw extruder, thereby forming a reaction product stream comprising the compound comprising a (meth)acryloyl group.

The present disclosure relates to a process for the manufacturing of a compound comprising a (meth)acryloyl group, wherein the process comprises the steps of: a) providing a multi-screw extruder comprising a reaction chamber; b) providing reactants and reagents comprising: i. an alcohol or a primary or secondary amine; ii. a base; and iii. a (meth)acryloyl halide or a 3-halopropionyl halide; and c) incorporating the reactants and reagents into the reaction chamber of the multi-screw extruder, thereby forming a reaction product stream comprising the compound comprising a (meth)acryloyl group.

The present disclosure relates to a process for the manufacturing of a compound comprising a (meth)acryloyl group, wherein the process comprises the steps of: a) providing a multi-screw extruder comprising a reaction chamber; b) providing reactants and reagents comprising: i. an alcohol or a primary or secondary amine; ii. a base; and iii. a (meth)acryloyl halide or a 3-halopropionyl halide; and c) incorporating the reactants and reagents into the reaction chamber of the multi-screw extruder, thereby forming a reaction product stream comprising the compound comprising a (meth)acryloyl group.

Compositions and methods of using of such compositions to, for example, inhibit of the formation of gas hydrate agglomerates are provided. In one embodiment, the methods comprise: introducing a hydrate inhibitor composition comprising a compound into a fluid, wherein the compound comprises two hydrophobic cation moieties, a lipophilic tail, and two linking moieties.

The present invention relates to a method for producing a specified -amino acid, the method including allowing a specified -amino acid amide and water to react with each other in the presence of a zirconium compound which contains zirconium and at least one metal element selected from the group consisting of lithium, nickel, copper, zinc, cesium, barium, hafnium, tantalum, cerium, and dysprosium.

The present invention relates to a method for producing a specified -amino acid, the method including allowing a specified -amino acid amide and water to react with each other in the presence of a zirconium compound which contains zirconium and at least one metal element selected from the group consisting of lithium, nickel, copper, zinc, cesium, barium, hafnium, tantalum, cerium, and dysprosium.