Patent classifications
C07C305/14
PROCESS FOR THE PREPARATION OF A POLYUNSATURATED KETONE COMPOUND
A process for the preparation of a polyunsaturated thiol comprising: (1) reacting a polyunsaturated alcohol in the presence of a compound of formula R.sub.2—SO.sub.2Hal wherein R.sub.2 is a C.sub.1-20 hydrocarbyl group, such an C.sub.1-10 alkyl group, to form a polyunsaturated sulphonyl ester; (2) converting the polyunsaturated sulphonyl ester to a polyunsaturated thioester by reacting with an anion of formula .sup.−SC(═O)R.sub.4 wherein R.sub.4 is a C.sub.1-20 hydrocarbyl group; (3) converting the polyunsaturated thioester to form a polyunsaturated thiol optionally in the presence of an antioxidant, e.g. using a metal carbonate. (4) reacting said polyunsaturated thiol with a compound (LG)R.sup.3COX wherein X is an electron withdrawing group and R.sup.3 is an alkylene group carrying a leaving group (LG), such as LG-CH.sub.2— forming
##STR00001## where X is an electron withdrawing group and LG is a leaving group; optionally in the presence of an antioxidant, so as to form a polyunsaturated ketone compound.
PROCESS FOR THE PREPARATION OF A POLYUNSATURATED KETONE COMPOUND
A process for the preparation of a polyunsaturated thiol comprising: (1) reacting a polyunsaturated alcohol in the presence of a compound of formula R.sub.2—SO.sub.2Hal wherein R.sub.2 is a C.sub.1-20 hydrocarbyl group, such an C.sub.1-10 alkyl group, to form a polyunsaturated sulphonyl ester; (2) converting the polyunsaturated sulphonyl ester to a polyunsaturated thioester by reacting with an anion of formula .sup.−SC(═O)R.sub.4 wherein R.sub.4 is a C.sub.1-20 hydrocarbyl group; (3) converting the polyunsaturated thioester to form a polyunsaturated thiol optionally in the presence of an antioxidant, e.g. using a metal carbonate. (4) reacting said polyunsaturated thiol with a compound (LG)R.sup.3COX wherein X is an electron withdrawing group and R.sup.3 is an alkylene group carrying a leaving group (LG), such as LG-CH.sub.2— forming
##STR00001## where X is an electron withdrawing group and LG is a leaving group; optionally in the presence of an antioxidant, so as to form a polyunsaturated ketone compound.
METHOD OF PRODUCING CARBONYL SULFIDE
Provided is a production method that enables production of carbonyl sulfide by a gas phase flow method without using a catalyst. The method of producing carbonyl sulfide includes causing electrical discharge of a feedstock gas containing starting substances that include CS.sub.2 and one or more selected from the group consisting of CO.sub.2, CO, O.sub.2, and O.sub.3 while in a continuous flow state and then causing release to outside of an electrical discharge zone.
METHOD OF PRODUCING CARBONYL SULFIDE
Provided is a production method that enables production of carbonyl sulfide by a gas phase flow method without using a catalyst. The method of producing carbonyl sulfide includes causing electrical discharge of a feedstock gas containing starting substances that include CS.sub.2 and one or more selected from the group consisting of CO.sub.2, CO, O.sub.2, and O.sub.3 while in a continuous flow state and then causing release to outside of an electrical discharge zone.
Hair restructuring association comprising a quaternary ammonium salt and a sulpho-derivative of vegetable fatty acids
The object of the present invention concerns a hair restructuring association comprising or alternatively consisting of: (a) a quaternary ammonium salt of formula (I) and (b) at least one sulpho-derivative of vegetable fatty acids, wherein R.sub.5, R.sub.6 are independently chosen between hydrogen and a radical R.sub.0, R.sub.0 consists of the following structure of formula (II), R.sub.1 is chosen from the group consisting of: hydrogen, methyl, isopropyl, sec-butyl, isobutyl, ethylenemethylthio, benzyl, para-hydroxybenzyl and 3-methylene-1H-indole, R.sub.2, R.sub.3, R.sub.4 are independently chosen from the group consisting of: methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl and tert-butyl, mX.sup.− is chosen from the group consisting of: formic acid, acetic acid, unsaturated monocarboxylic acids, adipic acid, aldaric acid, oxalic acid, phthalic acid, azelaic acid, sebacic acid, malonic acid, succinic acid, tartaric acid, glutaric acid, pimelic acid, maleic acid, malic acid, fumaric acid and suberic acid, isocitric acid, citric acid, fatty acids, acidic amino acids, keto acids and aromatic carboxylic acids, m is an integer number comprised between 1 and 22, n is comprised between 2 and 20.
Water-soluble diacetylene, photolithography composition comprising water-soluble diacetylene monomer and conductive polymer, and fine pattern preparation method using same
Provided are a novel water-soluble diacetylene monomer, a composition for photolithography including the novel water-soluble diacetylene monomer and a conductive polymer, and a method of forming micropatterns using the composition. The water-soluble diacetylene monomer may not aggregate even when mixed with a water-soluble conductive polymer. Accordingly, a uniform composition for photolithography can be prepared by mixing a water-soluble conductive polymer with the diacetylene monomer, and micropatterns can be formed using the composition. More particularly, when the composition is formed into a thin film and then is irradiated with light, only light-irradiated portions of the diacetylene monomer are selectively crosslinked due to photopolymerization, thereby resulting in insoluble negative-type micropatterns.
Water-soluble diacetylene, photolithography composition comprising water-soluble diacetylene monomer and conductive polymer, and fine pattern preparation method using same
Provided are a novel water-soluble diacetylene monomer, a composition for photolithography including the novel water-soluble diacetylene monomer and a conductive polymer, and a method of forming micropatterns using the composition. The water-soluble diacetylene monomer may not aggregate even when mixed with a water-soluble conductive polymer. Accordingly, a uniform composition for photolithography can be prepared by mixing a water-soluble conductive polymer with the diacetylene monomer, and micropatterns can be formed using the composition. More particularly, when the composition is formed into a thin film and then is irradiated with light, only light-irradiated portions of the diacetylene monomer are selectively crosslinked due to photopolymerization, thereby resulting in insoluble negative-type micropatterns.
Hydroxyeicosatrienoic acid compounds and their use as therapeutic agents
12(S)-hydroxyeicosatrienoic acid (12(S)-HETrE) compounds and compositions comprising the same are disclosed. Methods of using the compounds in the prevention and treatment of thrombosis and thrombotic disorders are also disclosed.
Hydroxyeicosatrienoic acid compounds and their use as therapeutic agents
12(S)-hydroxyeicosatrienoic acid (12(S)-HETrE) compounds and compositions comprising the same are disclosed. Methods of using the compounds in the prevention and treatment of thrombosis and thrombotic disorders are also disclosed.
Non-Aqueous Electrolyte Solution for Lithium Secondary Battery and Lithium Secondary Battery Including the Same
A non-aqueous electrolyte solution for a lithium secondary battery and a lithium secondary battery including the same are disclosed herein. In some embodiments, a non-aqueous electrolyte solution for a lithium secondary battery, includes an additive having metal ion adsorbability and capable of forming a stable ion conductive film on the surface of an electrode. In some embodiments, a lithium secondary battery including the same has an improved an abnormal voltage drop phenomenon.