The invention provides a novel hydrocarbon-containing carboxylic acid, hydrocarbon-containing sulfonic acid, hydrocarbon-containing sulfuric acid ester, or a salt thereof, and a surfactant. Each of them is a compound represented by the following formula (1):
CR.sup.1R.sup.2R.sup.4—CR.sup.3R.sup.5—X-A
wherein R.sup.1 to R.sup.5 are each H or a monovalent substituent; at least one of R.sup.1 or R.sup.3 is a group represented by the formula: —Y—R.sup.6; at least one of R.sup.2 or R.sup.5 is a group represented by the formula: —X-A or a group represented by the formula: —Y—R.sup.6; and As at the respective appearances are the same as or different from each other, and are each —COOM, —SO.sub.3M, or —OSO.sub.3M.

The invention provides a novel hydrocarbon-containing carboxylic acid, hydrocarbon-containing sulfonic acid, hydrocarbon-containing sulfuric acid ester, or a salt thereof, and a surfactant. Each of them is a compound represented by the following formula (1):
CR.sup.1R.sup.2R.sup.4—CR.sup.3R.sup.5—X-A
wherein R.sup.1 to R.sup.5 are each H or a monovalent substituent; at least one of R.sup.1 or R.sup.3 is a group represented by the formula: —Y—R.sup.6; at least one of R.sup.2 or R.sup.5 is a group represented by the formula: —X-A or a group represented by the formula: —Y—R.sup.6; and As at the respective appearances are the same as or different from each other, and are each —COOM, —SO.sub.3M, or —OSO.sub.3M.

A novel onium salt and a resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition is reduced in acid diffusion and improved in exposure latitude, MEF, and LWR.

A novel onium salt and a resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition is reduced in acid diffusion and improved in exposure latitude, MEF, and LWR.

Materials and methods for preparing reactive lignin and for preparing a bio-based adhesive are described herein.

Materials and methods for preparing reactive lignin and for preparing a bio-based adhesive are described herein.

The present invention relates to the field of organic chemistry and pharmacology and describes novel asymmetric derivatives of polyphenols of the dinaphthalene series of general Formula (I) or general Formula (II), a process of preparing thereof and use thereof as antiviral agents.

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The present invention relates to the field of organic chemistry and pharmacology and describes novel asymmetric derivatives of polyphenols of the dinaphthalene series of general Formula (I) or general Formula (II), a process of preparing thereof and use thereof as antiviral agents.

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A novel onium salt and a resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition is reduced in acid diffusion and improved in exposure latitude, MEF, and LWR.

A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a morpholino group offers dimensional stability on PPD and a satisfactory resolution.