The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×10.sup.7.Math.cm.sup.2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.

A salt of a quinazoline derivative (N-[4-(3-chlorine-4-fluoroanilino)]-7-(3-morpholinepropanol)-6-(2-fluoroacrylamide)-quinazoline, the structure thereof is as represented by formula I). Compared with a known quinazoline derivative, the salt of the quinazoline derivative has one or more improved properties and at least has better water solubility, wherein a citrate, a benzene sulfonate, and an ethanedisulphonate thereof further have better crystallinity and are not easy to absorb moisture. ##STR00001##

A salt of a quinazoline derivative (N-[4-(3-chlorine-4-fluoroanilino)]-7-(3-morpholinepropanol)-6-(2-fluoroacrylamide)-quinazoline, the structure thereof is as represented by formula I). Compared with a known quinazoline derivative, the salt of the quinazoline derivative has one or more improved properties and at least has better water solubility, wherein a citrate, a benzene sulfonate, and an ethanedisulphonate thereof further have better crystallinity and are not easy to absorb moisture. ##STR00001##

Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I):

##STR00001##

wherein: Ar.sup.1 represents an aromatic group; R.sup.1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R.sup.1 groups together optionally form a fused ring structure with Ar.sup.1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar.sup.1, and two or more of R.sup.1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.

The invention provides acid addition salts of a basic therapeutic agent wherein the acid is represented by Formula I or Formula II,

##STR00001##

wherein Ar, R.sub.1, R.sub.2, R.sub.3, R.sub.4, and R.sub.5 are as defined herein. The invention also provides pharmaceutical compositions comprising a pharmaceutically acceptable carrier or excipient and an acid addition salt of the invention and a method of using an acid addition salt of the invention for treating a disease or disorder in a subject in need thereof.

The invention provides hydrohphobic drug salts and pharmaceutical compositions comprising such salts. The invention fourther provides compositions for delivering poorly soluble drugs, including hydrophobic drug salts.

A process for preparing diaryl sulfones, such as 4,4-dichlorodiphenylsulfone is disclosed. The process comprises contacting an aryl compound with sulfur trioxide to provide a benzene sulfonic acid. The benzene sulfonic acid is coupled to additional aryl compound in the presence of a catalyst. During the coupling step, the additional aryl compound is continuously added while water is removed.

A process for preparing diaryl sulfones, such as 4,4-dichlorodiphenylsulfone is disclosed. The process comprises contacting an aryl compound with sulfur trioxide to provide a benzene sulfonic acid. The benzene sulfonic acid is coupled to additional aryl compound in the presence of a catalyst. During the coupling step, the additional aryl compound is continuously added while water is removed.

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating fluorobenzenesulfonic acid bonded to iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating fluorobenzenesulfonic acid bonded to iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.