A corrosion inhibiting additive and methods of making the corrosion inhibiting additive are described. The corrosion inhibiting additive comprises a metal appended deactivated aromatic compound. The method includes reacting a metal salt with a deactivated aromatic compound to form a metal appended dichloro-diphenyl sulfone. Corrosion inhibiting coating compositions including the metal appended deactivated aromatic compound are also described.

A corrosion inhibiting additive and methods of making the corrosion inhibiting additive are described. The corrosion inhibiting additive comprises a metal appended deactivated aromatic compound. The method includes reacting a metal salt with a deactivated aromatic compound to form a metal appended dichloro-diphenyl sulfone. Corrosion inhibiting coating compositions including the metal appended deactivated aromatic compound are also described.

The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×10.sup.7.Math.cm.sup.2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.

The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×10.sup.7.Math.cm.sup.2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.

Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I): ##STR00001##
wherein: Ar.sup.1 represents an aromatic group; R.sup.1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R.sup.1 groups together optionally form a fused ring structure with Ar.sup.1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar.sup.1, and two or more of R.sup.1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.

Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I): ##STR00001##
wherein: Ar.sup.1 represents an aromatic group; R.sup.1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R.sup.1 groups together optionally form a fused ring structure with Ar.sup.1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar.sup.1, and two or more of R.sup.1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.

A process for preparing diaryl sulfones, such as 4,4′-dichlorodiphenylsulfone is disclosed. The process comprises contacting an aryl compound with sulfur trioxide to provide a benzene sulfonic acid. The benzene sulfonic acid is coupled to additional aryl compound in the presence of a catalyst. During the coupling step, the additional aryl compound is continuously added while water is removed.

A process for preparing diaryl sulfones, such as 4,4′-dichlorodiphenylsulfone is disclosed. The process comprises contacting an aryl compound with sulfur trioxide to provide a benzene sulfonic acid. The benzene sulfonic acid is coupled to additional aryl compound in the presence of a catalyst. During the coupling step, the additional aryl compound is continuously added while water is removed.

A photoacid generator (PAG) and a photoresist composition, the PAG being represented by the following Chemical Formula (I): ##STR00001## wherein, in Chemical Formula (I), L is sulfur (S) or iodine (I), R.sub.3 being omitted when L is I; R.sub.1, R.sub.2, and R.sub.3 are each independently a C1 to C10 alkyl, alkenyl, alkynyl, or alkoxy group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and L, or a C6 to C18 aryl, arylalkyl, or alkylaryl group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and L; AL is an acid-labile group; m is 1 to 4; and M is a C1 to C30 hydrocarbon group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and a sulfur atom.

The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×10.sup.7.Math.cm.sup.2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.