The present invention provides a titanium ligand-modified black phosphorus and the preparation method and use thereof. The titanium ligand-modified black phosphorus is a complex of black phosphorus and a titanium ligand having a structure represented by formula (I): ##STR00001##
wherein in the formula (I), R.sub.1 comprises C.sub.1-C.sub.6 alkyl, or phenyl optionally further substituted with 0 to 5 groups each independently selected from halogen atom, C.sub.1-C.sub.6 alkyl, nitro, hydroxy, amino or C.sub.1-C.sub.3 alkoxy; the C.sub.1-C.sub.6 alkyl or C.sub.1-C.sub.3 alkoxy is optionally further substituted with 0 to 3 groups each independently selected from halogen atom, nitro, hydroxy, amino, methyl, ethyl or n-propyl. The titanium ligand-modified black phosphorus of the present invention is not likely oxidized without changing inherent properties of the black phosphorus, and the antioxidant capacity is greatly enhanced.

The present invention provides a titanium ligand-modified black phosphorus and the preparation method and use thereof. The titanium ligand-modified black phosphorus is a complex of black phosphorus and a titanium ligand having a structure represented by formula (I): ##STR00001##
wherein in the formula (I), R.sub.1 comprises C.sub.1-C.sub.6 alkyl, or phenyl optionally further substituted with 0 to 5 groups each independently selected from halogen atom, C.sub.1-C.sub.6 alkyl, nitro, hydroxy, amino or C.sub.1-C.sub.3 alkoxy; the C.sub.1-C.sub.6 alkyl or C.sub.1-C.sub.3 alkoxy is optionally further substituted with 0 to 3 groups each independently selected from halogen atom, nitro, hydroxy, amino, methyl, ethyl or n-propyl. The titanium ligand-modified black phosphorus of the present invention is not likely oxidized without changing inherent properties of the black phosphorus, and the antioxidant capacity is greatly enhanced.

Provided are ionic thermal acid generators comprising an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group and a cation. Also provided are photoresist pattern trimming compositions that include an ionic thermal acid generator, a matrix polymer and a solvent, and methods of trimming a photoresist pattern using the trimming compositions. The thermal acid generators, compositions and methods find particular applicability in the manufacture of semiconductor devices.

Photoresist pattern trimming compositions are provided. The compositions comprise: a matrix polymer, an aromatic sulfonic acid and a solvent, wherein the aromatic sulfonic acid comprises one or more fluorinated alcohol group. Also provided are methods of trimming a photoresist pattern using the trimming compositions. The compositions and methods find particular applicability in the manufacture of semiconductor devices.

Photoresist pattern trimming compositions are provided. The compositions comprise: a matrix polymer, an aromatic sulfonic acid and a solvent, wherein the aromatic sulfonic acid comprises one or more fluorinated alcohol group. Also provided are methods of trimming a photoresist pattern using the trimming compositions. The compositions and methods find particular applicability in the manufacture of semiconductor devices.

The present invention provides a titanium ligand-modified black phosphorus and the preparation method and use thereof. The titanium ligand-modified black phosphorus is a complex of black phosphorus and a titanium ligand having a structure represented by formula (I):

##STR00001##

wherein in the formula (I), R.sub.1 comprises C.sub.1-C.sub.6 alkyl, or phenyl optionally further substituted with 0 to 5 groups each independently selected from halogen atom, C.sub.1-C.sub.6 alkyl, nitro, hydroxy, amino or C.sub.1-C.sub.3 alkoxy; the C.sub.1-C.sub.6 alkyl or C.sub.1-C.sub.3 alkoxy is optionally further substituted with 0 to 3 groups each independently selected from halogen atom, nitro, hydroxy, amino, methyl, ethyl or n-propyl. The titanium ligand-modified black phosphorus of the present invention is not likely oxidized without changing inherent properties of the black phosphorus, and the antioxidant capacity is greatly enhanced.

Provided are ionic thermal acid generators comprising an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group and a cation. Also provided are photoresist pattern trimming compositions that include an ionic thermal acid generator, a matrix polymer and a solvent, and methods of trimming a photoresist pattern using the trimming compositions. The thermal acid generators, compositions and methods find particular applicability in the manufacture of semiconductor devices.