Patent classifications
C
CHEMISTRY; METALLURGY
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C07
ORGANIC CHEMISTRY
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C07C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
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309/00
Sulfonic acids; Halides, esters, or anhydrides thereof
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C07C309/28
having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
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C07C309/45
containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
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C07C309/52
the carbon skeleton being further substituted by doubly-bound oxygen atoms
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C07C309/53
the carbon skeleton containing carbon atoms of quinone rings
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C07C309/54
at least one of the nitrogen atoms being part of any of the groups , X being a hetero atom, Y being any atom
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C07C309/56
Y being a hetero atom
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C07C309/56

Resist composition and patterning process
10613436 · 2020-04-07 · ·

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating fluorobenzenesulfonic acid bonded to iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

Resist composition and patterning process
10613436 · 2020-04-07 · ·

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating fluorobenzenesulfonic acid bonded to iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

Resist composition and patterning process
10613437 · 2020-04-07 · ·

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating sulfonic acid bonded to iodized benzene ring offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

Resist composition and patterning process
10613437 · 2020-04-07 · ·

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating sulfonic acid bonded to iodized benzene ring offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

RESIST COMPOSITION AND PATTERNING PROCESS
20180275512 · 2018-09-27 · ·

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating fluorobenzenesulfonic acid bonded to iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

RESIST COMPOSITION AND PATTERNING PROCESS
20180267402 · 2018-09-20 · ·

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating sulfonic acid bonded to iodized benzene ring offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.