Provided is a novel compound having a selective activating effect on ERβ. The present invention provides a compound represented by the following formula (1) wherein R.sup.1 represents a cycloalkyl group having 3 to 8 carbon atoms, an alkenyl group having 2 to 6 carbon atoms and optionally substituted with a halogen atom, a 5-membered nitrogen-containing heteroaryl group, a 4- to 6-membered cyclic amino group, an alkanoylamino group having 2 to 6 carbon atoms and optionally substituted with a halogen atom, a 1-trifluoromethyl-1-hydroxymethyl group, or a 1-methylpropyl group; R.sup.2 to R.sup.5 are the same or different and each represent a hydrogen atom or a fluorine atom; and R.sup.6 represents a hydrogen atom or an alkanoyl group having 2 to 5 carbon atoms, or a salt thereof. ##STR00001##

The present invention relates to novel herbicidally active compounds, agrochemical composition thereof, methods of preparation thereof, and uses thereof for controlling the growth of undesirable plants (e.g., weeds), for example in crop fields.

The present invention relates to novel herbicidally active compounds, agrochemical composition thereof, methods of preparation thereof, and uses thereof for controlling the growth of undesirable plants (e.g., weeds), for example in crop fields.

Disclosed herein is a process for making a compound of formula (2) by (hetero)aromatic CH hydroxylation of a compound of formula (1): catalyzed by palladium(II) and a bidentate ligand in the presence of O.sub.2. The process is useful for instance, in the late-stage modification of medicinally important heterocycles.

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Sulfonium and iodonium salts of nitrogen-containing carboxylic acids are novel. The onium salt functions as an acid diffusion controlling agent in a resist composition, enabling to form a pattern of good profile with high resolution, improved MEF, LWR and DOF.

Sulfonium and iodonium salts of nitrogen-containing carboxylic acids are novel. The onium salt functions as an acid diffusion controlling agent in a resist composition, enabling to form a pattern of good profile with high resolution, improved MEF, LWR and DOF.