Patent classifications
C08F212/26
NON-THIOL NITROGEN BASED HYDROPHOBIC POLYMER BRUSH MATERIALS AND USE THEREOF FOR MODIFICATION OF SUBSTRATE SURFACES
One aspect of this invention is a novel functional polymer having a polydispersity from 1 to about 1.12 comprising at least one reactive moiety, selected from a moiety comprising at least one N-coordinative functional group having at least one lone pair of electrons, a moiety comprising a dialkylsilyl group, or a mixture of both groups, wherein said reactive moiety is present in said functional styrenic polymer either on a repeat unit, on an end group or on both, and said N-coordinative functional group is either a monodentate N-coordinative functional group, a polydendate N-coordinative group or a mixture of thereof, and said monodentate coordinative functional group is an azide moiety (—N.sub.3) or a cyano moiety (—CN). Another aspect of this invention is the use of these novel polymer to selectively deposit a DSA directing layer on a metallic substrate.
NON-THIOL NITROGEN BASED HYDROPHOBIC POLYMER BRUSH MATERIALS AND USE THEREOF FOR MODIFICATION OF SUBSTRATE SURFACES
One aspect of this invention is a novel functional polymer having a polydispersity from 1 to about 1.12 comprising at least one reactive moiety, selected from a moiety comprising at least one N-coordinative functional group having at least one lone pair of electrons, a moiety comprising a dialkylsilyl group, or a mixture of both groups, wherein said reactive moiety is present in said functional styrenic polymer either on a repeat unit, on an end group or on both, and said N-coordinative functional group is either a monodentate N-coordinative functional group, a polydendate N-coordinative group or a mixture of thereof, and said monodentate coordinative functional group is an azide moiety (—N.sub.3) or a cyano moiety (—CN). Another aspect of this invention is the use of these novel polymer to selectively deposit a DSA directing layer on a metallic substrate.
SEEDED EMULSION POLYMERIZATION PROCESS FOR LATEXES AND AQUEOUS INKJET INK COMPOSITIONS MADE THEREFROM
Methods for forming latexes are provided. In embodiments, such a method comprises adding a first portion of a monomer emulsion comprising water, a monomer, an acidic monomer, a multifunctional monomer, and a first reactive surfactant to a reactive surfactant solution comprising water and a second reactive surfactant to form a reaction mixture, wherein the reactive surfactant solution does not comprise monomers other than the second reactive surfactant; adding a first portion of an initiator solution to the reaction mixture so that monomers undergo polymerization reactions to form resin seeds in the reaction mixture; adding a second portion of the monomer emulsion to the reaction mixture comprising the resin seeds; and adding a second portion of the initiator solution to the reaction mixture to form a latex comprising resin particles.
SEEDED EMULSION POLYMERIZATION PROCESS FOR LATEXES AND AQUEOUS INKJET INK COMPOSITIONS MADE THEREFROM
Methods for forming latexes are provided. In embodiments, such a method comprises adding a first portion of a monomer emulsion comprising water, a monomer, an acidic monomer, a multifunctional monomer, and a first reactive surfactant to a reactive surfactant solution comprising water and a second reactive surfactant to form a reaction mixture, wherein the reactive surfactant solution does not comprise monomers other than the second reactive surfactant; adding a first portion of an initiator solution to the reaction mixture so that monomers undergo polymerization reactions to form resin seeds in the reaction mixture; adding a second portion of the monomer emulsion to the reaction mixture comprising the resin seeds; and adding a second portion of the initiator solution to the reaction mixture to form a latex comprising resin particles.
Positive resist composition and patterning process
A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodized or brominated aromatic ring exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.
Positive resist composition and patterning process
A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodized or brominated aromatic ring exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.
Polymer, coating composition comprising same, and organic light emitting element using same
The present specification relates to a polymer including: a first unit represented by Formula 1; and a second unit represented by Formula 2, a coating composition including the same, and an organic light emitting device formed by using the same.
Polymer, coating composition comprising same, and organic light emitting element using same
The present specification relates to a polymer including: a first unit represented by Formula 1; and a second unit represented by Formula 2, a coating composition including the same, and an organic light emitting device formed by using the same.
Positive electrode and lithium battery including the same
A positive electrode includes a composite material including a positive active material and a coating layer on a surface of the positive active material, wherein the coating layer includes a copolymer including a first repeating unit represented by Formula 1 below and a second repeating unit represented by Formula 2 below: ##STR00001## ##STR00002## wherein Ar.sub.1, R.sub.1 to R.sub.6, A, A.sub.1, ##STR00003##
Y.sup.−, m, and n are the same as defined in the specification.
Positive electrode and lithium battery including the same
A positive electrode includes a composite material including a positive active material and a coating layer on a surface of the positive active material, wherein the coating layer includes a copolymer including a first repeating unit represented by Formula 1 below and a second repeating unit represented by Formula 2 below: ##STR00001## ##STR00002## wherein Ar.sub.1, R.sub.1 to R.sub.6, A, A.sub.1, ##STR00003##
Y.sup.−, m, and n are the same as defined in the specification.