Patent classifications
C08G10/04
Aromatic hydrocarbon formaldehyde resin, modified aromatic hydrocarbon formaldehyde resin and epoxy resin, and method for producing these
There is provided an aromatic hydrocarbon formaldehyde resin obtained by reacting an aromatic hydrocarbon compound (A) represented by the following formula (1) with formaldehyde (B) in the presence of an acidic catalyst. ##STR00001##
wherein R represents an organic group having 1 to 10 carbon atoms; l represents an integer of 0 to 2, and m and n represent integers satisfying 1≦m+n≦10, m≧0 and n≧1.
Aromatic hydrocarbon formaldehyde resin, modified aromatic hydrocarbon formaldehyde resin and epoxy resin, and method for producing these
There is provided an aromatic hydrocarbon formaldehyde resin obtained by reacting an aromatic hydrocarbon compound (A) represented by the following formula (1) with formaldehyde (B) in the presence of an acidic catalyst. ##STR00001##
wherein R represents an organic group having 1 to 10 carbon atoms; l represents an integer of 0 to 2, and m and n represent integers satisfying 1≦m+n≦10, m≧0 and n≧1.
Anion Exchange Ionomer With A Poyarylene Backbone and Anion Exchange Membrane Incorporating Same
An anion exchange ionomer is disclosed that contains a fluorinated, ether-free backbone, and a fluorinated ether based quaternary ammonium functional group. The novel polymer has improved chemical and mechanical stability as compared to the state-of-the-art materials for incorporation in anion exchange membrane. The disclosed anion exchange ionomer may be incorporated into an anion exchange membrane and used in electrochemical applications.
URETHANE RESIN
There is provided a urethane resin that is excellent in adhesive strength, and maintains high adhesive strength even after exposure to high temperature and humidity. A urethane resin obtained by reacting a glycol-modified aromatic hydrocarbon-formaldehyde resin (A) modified with a glycol with a polyisocyanate (B) having two or more free isocyanate groups in a molecule.
Method for producing dihydroxynaphthalene condensate and dihydroxynaphthalene condensate
The invention provides: a dihydroxynaphthalene condensate which suppresses soft particle generation and is suitably usable for a composition excellent in filterability; and a method for producing the dihydroxynaphthalene condensate. In the method for producing a dihydroxynaphthalene condensate, dihydroxynaphthalene to be used has a sulfur element content of 100 ppm or less in terms of mass among constituent elements. The dihydroxynaphthalene and a condensation agent are condensed in presence of an acid or a base to produce the dihydroxynaphthalene condensate.
COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
An object of the present invention is to provide a compound and the like that are applicable to a wet process and are useful for forming a photoresist and an underlayer film for photoresists excellent in heat resistance, solubility, and etching resistance. A compound represented by the following formula (1) can solve the problem described above.
##STR00001##
COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
An object of the present invention is to provide a compound and the like that are applicable to a wet process and are useful for forming a photoresist and an underlayer film for photoresists excellent in heat resistance, solubility, and etching resistance. A compound represented by the following formula (1) can solve the problem described above.
##STR00001##
COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, FILM FOR LITHOGRAPHY, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CIRCUIT PATTERN
A composition for film formation for lithography of the present invention comprises at least one selected from the group consisting of an aromatic hydrocarbon formaldehyde resin and a modified aromatic hydrocarbon formaldehyde resin, wherein the aromatic hydrocarbon formaldehyde resin is a product of condensation reaction between an aromatic hydrocarbon having a substituted or unsubstituted benzene ring and formaldehyde, and the modified aromatic hydrocarbon formaldehyde resin is formed by modifying the aromatic hydrocarbon formaldehyde resin.
COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, FILM FOR LITHOGRAPHY, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CIRCUIT PATTERN
A composition for film formation for lithography of the present invention comprises at least one selected from the group consisting of an aromatic hydrocarbon formaldehyde resin and a modified aromatic hydrocarbon formaldehyde resin, wherein the aromatic hydrocarbon formaldehyde resin is a product of condensation reaction between an aromatic hydrocarbon having a substituted or unsubstituted benzene ring and formaldehyde, and the modified aromatic hydrocarbon formaldehyde resin is formed by modifying the aromatic hydrocarbon formaldehyde resin.
Sequential treatment with aqueous sulfonated aromatic polymer and aqueous polyethylene oxide for enhanced water retention
Treat an aggregation of particulates with two different aqueous mixtures, first with an aqueous mixture containing a sulfonated aromatic polymer component and then with an aqueous mixture containing polyethylene oxide.