C08G2261/1414

Polymer and organic solar cell comprising same
11711966 · 2023-07-25 · ·

The present specification relates to a polymer including a first unit of Chemical Formula 1; a second unit of Chemical Formula 2; and a third unit of Chemical Formula 3 or 4, and an organic solar cell including the same.

ELECTROCHROMIC POLYMER AND ELECTROCHROMIC DEVICES CONTAINING THE SAME
20220403100 · 2022-12-22 ·

A method for forming an electrochromic polymer block includes: forming each of reaction units by reacting two or more electron-donor groups, wherein each of the reaction units includes (i) a first backbone formed by the two or more electron-donor groups and (ii) at least one reactive functional group connected to each end of the first backbone; and forming the electrochromic polymer block by reacting at least two of the reaction units with acid-catalyzed cationic polymerization, wherein the electrochromic polymer block includes a second backbone formed by two or more of the first backbones.

Composition and light emitting device using the same

A composition which is useful for producing a light emitting device having excellent external quantum efficiency contains two or more compounds represented by the formula (C-1) and a phosphorescent compound, in which at least one of the compounds represented by the formula (C-1) is a compound in which R.sup.C is a group represented by the formula (C′-1). ##STR00001##
Ring R.sup.1C and Ring R.sup.2C represent an aromatic hydrocarbon ring or an aromatic hetero ring. R.sup.C represents an oxygen atom, a sulfur atom or a group represented by the formula (C′-1). ##STR00002##
Ring R.sup.3C and Ring R.sup.4C represent an aromatic hydrocarbon ring or an aromatic hetero ring. R.sup.C′ represents a carbon atom, a silicon atom, a germanium atom, a tin atom or a lead atom.

POLYMER, QUANTUM DOT COMPOSITION AND LIGHT-EMITTING DEVICE EMPLOYING THE SAME

A polymer, a quantum dot composition, and a light-emitting device employing the same are provided. The polymer includes a first repeat unit that has a structure represented by Formula (I):

##STR00001##

wherein the definitions of R.sup.1, R.sup.2, A.sup.1, A.sup.2, A.sup.3, and Z.sup.1 and n are as defined in the specification.

POLYMER AND LIGHT-EMITTING DEVICE

A polymer and a light-emitting device employing the same are provided. The polymer includes a first repeat unit with a structure represented by Formula (I):

##STR00001##

wherein the definitions of R.sup.1, R.sup.2, A.sup.1, A.sup.2, A.sup.3, and Z.sup.1 and n are as defined in the specification. At least one of A.sup.1, A.sup.2, and A.sup.3 is not hydrogen.

Light emitting device

A light emitting device having excellent luminance life contains an anode, a cathode, a first organic layer disposed between the anode and the cathode and a second organic layer disposed between the anode and the cathode. The first organic layer contains a compound represented by the formula (C-1), and the second organic layer contains a compound represented by the formula (C-1) and a cross-linked body of a crosslinkable material. ##STR00001##
Ring R.sup.1C and Ring R.sup.2C represent an aromatic hydrocarbon ring or an aromatic hetero ring and R.sup.C represents an oxygen atom, a sulfur atom or a group represented by the formula (C′-1). ##STR00002##
Ring R.sup.3C and Ring R.sup.4C represent an aromatic hydrocarbon ring or an aromatic hetero ring and R.sup.C′ represents a carbon atom, a silicon atom, a germanium atom, a tin atom or a lead atom.

Resist composition and method of forming resist pattern

A resist composition including a compound (D0) represented by general formula (d0) and a resin component (A1) has a structural unit (a0) in which a compound represented by general formula (a0-1) has a polymerizable group within the W.sup.1 portion converted into a main chain (in formula (d0), Rd.sup.01 represents a fluorine atom or a fluorinated alkyl group; In formula (a0-1), W.sup.1 represents a polymerizable group-containing group; C.sup.t represents a tertiary carbon atom, and the α-position of C.sup.t is a carbon atom which constitutes a carbon-carbon unsaturated bond; R.sup.11 represents an aromatic hydrocarbon group; or a chain hydrocarbon group; R.sup.12 and R.sup.13 each independently represents a chain hydrocarbon group, or R.sup.12 and R.sup.13 are mutually bonded to form a cyclic group). ##STR00001##

CYCLOALKANE-FUSED POLYCYCLIC AROMATIC COMPOUND

According to the present invention, options for materials for organic devices such as materials for organic EL elements are increased by addition of a cycloalkane, by condensation, to a polycyclic aromatic compound in which a plurality of aromatic rings are linked together by boron atoms, oxygen atoms, and the like. By using a novel cycloalkane-condensed polycyclic aromatic compound as a material for an organic EL element, for example, an organic EL element having excellent emission efficiency and element life is provided.

Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate

Provided is a resin material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the resin material including a cyclic olefin polymer (I), in which a temperature at an intersection between a storage modulus (G′) curve and a loss modulus (G″) curve in a solid viscoelasticity of the resin material for forming an underlayer film which is as measured under conditions of a measurement temperature range of 30° C. to 300° C., a heating rate of 3° C./min, and a frequency of 1 Hz in a nitrogen atmosphere in a shear mode using a rheometer is higher than or equal to 40° C. and lower than or equal to 200°.

Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer

A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1) as a repeating unit, and an organic solvent. Each of AR1 and AR2 represents a benzene ring or naphthalene ring which optionally have a substituent; W.sub.1 represents a particular partial structure having a triple bond, and the polymer optionally contains two or more kinds of W.sub.1; and W.sub.2 represents a divalent organic group having 6 to 80 carbon atoms and at least one aromatic ring. This invention provides: a polymer curable even under film formation conditions in an inert gas and capable of forming an organic film which has not only excellent heat resistance and properties of filling and planarizing a pattern formed in a substrate, but also favorable film formability onto a substrate with less sublimation product; and a composition for forming an organic film, containing the polymer. ##STR00001##