Provided is a positive electrode slurry comprising a polyether phosphate, wherein the polyether phosphate may comprise at least the following structural units:

##STR00001##

and a structural unit (IV) that is a phosphate group, A being hydrogen, halogen or haloalkyl; B is hydroxyl, R, OR, or ROR′, the R and R′ being each independently a linear or branched alkyl group containing 1 to 8 carbons; and E is phenyl, alkyl-substituted phenyl, ether-substituted phenyl, or halophenyl.

Provided is a positive electrode slurry comprising a polyether phosphate, wherein the polyether phosphate may comprise at least the following structural units:

##STR00001##

and a structural unit (IV) that is a phosphate group, A being hydrogen, halogen or haloalkyl; B is hydroxyl, R, OR, or ROR′, the R and R′ being each independently a linear or branched alkyl group containing 1 to 8 carbons; and E is phenyl, alkyl-substituted phenyl, ether-substituted phenyl, or halophenyl.

Provided is a surfactant composition that can impart good polymerization stability, that can yield an aqueous resin dispersion having good wettability, and that can improve water resistance and water-resistant adhesive strength of a resin film formed from the aqueous resin dispersion. The surfactant composition according to the present invention includes a compound C1 represented by formula (1):

##STR00001##

(in formula (1), A.sup.1 represents an alkylene group having 10 to 14 carbon atoms, A.sup.2 represents an alkylene group having 2 to 4 carbon atoms, n is an average number of moles of an oxyalkylene group A.sup.2O added and is a number of 1 to 100, and X represents a hydrogen atom, a sulfate ester or a salt thereof, a phosphate ester or a salt thereof, or methylcarboxylic acid or a salt thereof); and a compound C2 represented by formula (2):

##STR00002##

(in formula (2), A.sup.1, A.sup.2, n, and X are as defined in formula (1)). A molar ratio C1/C2 of the compound C1 to the compound C2 is 99/1 to 84/16.

Provided is a surfactant composition that can impart good polymerization stability, that can yield an aqueous resin dispersion having good wettability, and that can improve water resistance and water-resistant adhesive strength of a resin film formed from the aqueous resin dispersion. The surfactant composition according to the present invention includes a compound C1 represented by formula (1):

##STR00001##

(in formula (1), A.sup.1 represents an alkylene group having 10 to 14 carbon atoms, A.sup.2 represents an alkylene group having 2 to 4 carbon atoms, n is an average number of moles of an oxyalkylene group A.sup.2O added and is a number of 1 to 100, and X represents a hydrogen atom, a sulfate ester or a salt thereof, a phosphate ester or a salt thereof, or methylcarboxylic acid or a salt thereof); and a compound C2 represented by formula (2):

##STR00002##

(in formula (2), A.sup.1, A.sup.2, n, and X are as defined in formula (1)). A molar ratio C1/C2 of the compound C1 to the compound C2 is 99/1 to 84/16.

A method of enhancing soil water infiltration (SWI) and/or reducing soil water repellency (SWR) comprising: treating an area of groundcover with a composition A comprising A1) a block polymer (P) comprising at least one polyethyleneoxide moiety and at least one polypropyleneoxide moiety, and A2) an alcohol alkoxylate (E), wherein the SWI of the area of groundcover is enhanced and/or the SWR of the area of groundcover is reduced after treatment with the composition A.

A method of enhancing soil water infiltration (SWI) and/or reducing soil water repellency (SWR) comprising: treating an area of groundcover with a composition A comprising A1) a block polymer (P) comprising at least one polyethyleneoxide moiety and at least one polypropyleneoxide moiety, and A2) an alcohol alkoxylate (E), wherein the SWI of the area of groundcover is enhanced and/or the SWR of the area of groundcover is reduced after treatment with the composition A.

There is provided a fluorine-containing ether compound represented by the following formula. R.sup.1—R.sup.2—CH.sub.2—R.sup.3—CH.sub.2—OCH.sub.2CH(OH)CH.sub.2O—CH.sub.2—R.sup.3—CH.sub.2—R.sup.4—R.sup.5 (in the formula. R.sup.3 represents a perfluoropolyether chain; R.sup.2 and R.sup.4 represent a divalent linking group having a polar group; R.sup.1 and R.sup.5 represent a terminal group bonded to an oxygen atom of R.sup.2 or R.sup.4; and at least one of R.sup.1 and R.sup.5 is any one selected from the group consisting of an alkenyl group having 2 to 8 carbon atoms, an alkynyl group having 3 to 8 carbon atoms, an aromatic hydrocarbon-containing group, and an aromatic heterocycle-containing group).

The invention relates to vicinal diol ether derivatives of certain polyether polymers, compositions comprising the same, and methods of making the same via reaction with substituted or unsubstituted epoxides, and methods of using the same.

A curable composition includes, per 100 parts by mass of a curable compound, 0.1 to 10.0 parts by mass of a compound (A) including a structure represented by the following general formula (I), and 0.01 to 10.0 parts by mass of a base (B):

##STR00001##

where X represents a chalcogen atom, R.sup.1 and R.sup.2 each independently represent an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, or an aralkyl group, and R.sup.3 and R.sup.4 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, or an aralkyl group.

A photocurable liquid silicone composition, that has low viscosity that facilitates injection into a small gap, cures quickly by irradiating with a high energy beam such as ultraviolet light or the like, has a refractive index after curing that is high not only in a visible region but also in an infrared region, in which composition design is possible to provide an arbitrarily low dielectric constant, and is particularly useful as a material for a device using an infrared LED light source, is provided. The composition comprises: (A) one or more type of an organosilane or organopolysiloxane having on average one or more photoreactive functional groups and two or more monovalent functional groups selected from aromatic groups with 6 to 12 carbon atoms and aralkyl groups with 7 to 12 carbon atoms in a molecule and having 1 to 5 silicon atoms, and optionally further comprising (C) a curing catalyst.