Patent classifications
C08G65/4043
PHOTORESIST UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
A method of forming a pattern on a substrate, the method including: forming a photoresist underlayer over a surface of the substrate, wherein the photoresist underlayer is formed from a composition comprising a polymer and a solvent, and the photoresist underlayer has a carbon content of greater than 47 at %; subjecting the photoresist underlayer to a a metal precursor, where the metal precursor infiltrates a free volume of the photoresist underlayer; and exposing the metal precursor-treated photoresist underlayer to an oxidizing agent to provide a metallized photoresist underlayer.
PROCESS FOR SYNTHESISING SEMI-AROMATIC POLYETHERS
The invention relates to a process for producing semi-aromatic polyethers based on an aliphatic diol, to semi-aromatic polyethers based on an aliphatic diol obtained by said process, and to the use of said semi-aromatic polyethers based on an aliphatic diol for manufacturing membranes, manufactured parts and coatings.
Polycyclocarbonate compounds and polymers formed therefrom
Polycyclocarbonate compounds and upgraded molecular weight polymers made from such compounds are provided. The polymers have particular utility in coating compositions, especially for use on food and beverage contact substrates that are formed into or will be formed into containers or container components.
Cell culture substrate comprising fluorine-containing polymer on its surface
This invention provides a cell culture substrate comprising on its surface a fluorine-containing polymer that enables three-dimensional tissue culture. The cell culture substrate of the invention has a surface at least a part of which is composed of a resin composition comprising a fluorine-containing polymer having one or more fluorine atoms in a repeating unit and exhibits the oxygen gas permeability of 219 cm.sup.3 (STP)/(m.sup.2.Math.24 h.Math.atm) or higher. Three-dimensional tissue can be formed via cell culture with the use of the cell culture substrate of the invention.
ELECTROLYTE MEMBRANE FOR LITHIUM SECONDARY BATTERY AND MEMBRANE-ELECTRODE STRUCTURE FOR LITHIUM SECONDARY BATTERY HAVING THE SAME
Disclosed is an electrolyte membrane for a lithium secondary battery including a compound in which PEG is grafted to PAES or PAEK as a main chain or a block copolymer between PAES or PAEK and PEG, thereby to have excellent ionic conductivity and adhering property. Disclosed is a binder for a lithium secondary battery including a compound in which PEG is grafted to PAES or PAEK as a main chain or a block copolymer between PAES or PAEK and PEG, thereby to have excellent ionic conductivity and adhering property. Further, disclosed is a membrane-electrode structure for lithium secondary batteries having the electrolyte membrane and the binder. Further, disclosed is a manufacturing method of each of the electrolyte membrane, the binder, and the structure.
POLYISOINDOLINONES, METHODS OF MANUFACTURE, AND COMPOSITIONS AND ARTICLES FORMED THEREFROM
A polyisoindolinone includes 1-100 mole percent of isoindolinone ether ketone units of the formula A; and 0-99 mole percent of arylene ether ketone units of the formula B wherein the variables are as defined herein; and wherein when the polyisoindolinone is a poly(isoindolinone ether ether ketone), it has a least one, preferably at least two, preferably all of the following properties: a glass transition temperature greater than 150° C., or 150-270° C. as determined by differential scanning calorimetry, less than 25 weight percent solubility at 23° C. in dichloromethane, orthodichlorobenzene, or chloroform, or substantially no blue phosphorescence in response to irradiation with ultraviolet light of 320-400 nm.
##STR00001##
MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
The present invention provides a material for forming an organic film, containing a compound shown by the following general formula (1), and an organic solvent. In the formula (1), X represents an organic group having a valency of n1 and 2 to 50 carbon atoms, n1 represents an integer of 2 to 10, R.sub.1 represents at least one or more of the following formulae (2) to (4), where l1 represents 0 or 1, and l2 represents 0 or 1. Thus, provided is an organic film material for forming an organic film that has all of high filling property, high planarizing property, and excellent adhesive force to a substrate.
##STR00001##
RIPENING OF 1,4-BIS (4-PHENOXYBENZOYL)BENZENE
A method for manufacturing 1,4-bis(4-phenoxybenzoyl)benzene, including: reacting terephthaloyl chloride with diphenyl ether in a reaction solvent and in the presence of a Lewis acid, so as to obtain a product mixture comprising a 1,4-bis(4-phenoxybenzoyl)benzene-Lewis acid complex; putting the product mixture in contact with a protic solvent, so as to obtain a first phase containing the Lewis acid and a second phase containing 1,4-bis(4-phenoxybenzoyl)benzene; heating at least the second phase up to a maximum temperature, followed by cooling the second phase down to a separation temperature; subjecting at least the second phase to a solid/liquid separation step at the separation temperature, so as to recover solid 1,4-bis(4-phenoxybenzoyl)benzene.
Ripening of 1,4-bis (4-phenoxybenzoyl)benzene
A method for manufacturing 1,4-bis(4-phenoxybenzoyl)benzene, including: reacting terephthaloyl chloride with diphenyl ether in a reaction solvent and in the presence of a Lewis acid, so as to obtain a product mixture including a 1,4-bis(4-phenoxybenzoyl)benzene-Lewis acid complex; contacting the product mixture with a protic solvent, so as to obtain a first phase containing the Lewis acid and a second phase containing 1,4-bis(4-phenoxybenzoyl)benzene; heating at least the second phase up to a maximum temperature, followed by cooling the second phase down to a separation temperature; subjecting at least the second phase to a solid/liquid separation step at the separation temperature, so as to recover solid 1,4-bis(4-phenoxybenzoyl)benzene.
Stepped substrate-coating composition containing polyether resin having photocrosslinkable group
A stepped substrate-coating composition having high properties of filling a pattern and capable of forming on a substrate a coating film that can be formed by photocuring, has flattening properties, and has high heat resistance after irradiation with light. A photocurable composition for coating a stepped substrate, the photocurable composition containing a polymer containing a unit structure of Formula (1): ##STR00001##
wherein A.sup.1, A.sup.2, and A.sup.3 are each independently an aromatic C.sub.6-100 ring optionally containing a heteroatom or a hydrocarbon group containing an aromatic C.sub.6-100 ring optionally containing a heteroatom, B.sup.1, B.sup.2, and B.sup.3 are each independently Formula (2): ##STR00002##
wherein R.sup.1 is a C.sub.1-10 alkylene group, a C.sub.1-10 alkenylene group, a C.sub.1-10 alkynylene group, a C.sub.6-40 arylene group, an oxygen atom, a carbonyl group, a sulfur atom, C(O)O, C(O)NR.sup.a, NR.sup.b, or a group including a combination thereof, R.sup.2 is a hydrogen atom or a C.sub.1-10 alkyl group.